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Patent # Description
2016/0111285 LATTICE-MISMATCHED SEMICONDUCTOR STRUCTURES WITH REDUCED DISLOCATION DEFECT DENSITIES AND RELATED METHODS FOR...
Fabrication of monolithic lattice-mismatched semiconductor heterostructures with limited area regions having upper portions substantially exhausted of...
2016/0111284 STRAINED STACKED NANOSHEET FETS AND/OR QUANTUM WELL STACKED NANOSHEET
Exemplary embodiments provide for fabricating a nanosheet stack structure having one or more sub-stacks. Aspects of the exemplary embodiments include: growing...
2016/0111283 METHOD FOR DISSOLVING CHALCOGEN ELEMENTS AND METAL CHALCOGENIDES IN NON-HAZARDOUS SOLVENTS
The present disclosure provides a method of preparing a chalcogen containing solution that is hydrazine free and hydrazinium free, wherein the method...
2016/0111282 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
It is an object to provide an oxide semiconductor which is suitable for use in a semiconductor device. Alternatively, it is another object to provide a...
2016/0111281 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
One object is to have stable electrical characteristics and high reliability and to manufacture a semiconductor device including a semi-conductive oxide film....
2016/0111280 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Electrical characteristics of transistors using an oxide semiconductor are greatly varied in a substrate, between substrates, and between lots, and the...
2016/0111279 METHOD FOR MANUFACTURING SILICON-CARBIDE SEMICONDUCTOR ELEMENT
In this method for manufacturing a semiconductor element, a modified layer produced by subjecting a substrate (70) to mechanical polishing is removed by...
2016/0111278 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
A substrate processing method is provided. In the method, a plurality of substrates is placed on a plurality of substrate holding areas provided in a surface...
2016/0111277 COMPOSITION FOR FORMING FERROELECTRIC THIN FILM, AND METHOD FOR MANUFACTURING SAME
A composition containing a precursor of a ferroelectric thin film, a solvent, and a reaction control substance, can form a ferroelectric thin film by temporary...
2016/0111276 VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE
Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal...
2016/0111275 COMPOSITIONS OF LOW-K DIELECTRIC SOLS CONTAINING NONMETALLIC CATALYSTS
A sol composition for producing a porous low-k dielectric material is provided. The composition can include at least one silicate ester, a polar solvent,...
2016/0111274 METHOD FOR FORMING NITRIDE SEMICONDUCTOR DEVICE
A method for producing a nitride semiconductor device is disclosed. The method includes steps of: forming a channel layer, an InAlN doped layer sequentially on...
2016/0111273 SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
A semiconductor substrate having a silicon-based substrate, a buffer layer provided on the silicon-based substrate and made of a nitride semiconductor...
2016/0111272 VAPOR DEPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES
Disclosed are methods of depositing silicon-containing films on one or more substrates via vapor deposition processes using penta-substituted disilanes, such...
2016/0111271 TIME-OF-FLIGHT MASS SPECTROMETER WITH SPATIAL FOCUSING OF A BROAD MASS RANGE
The invention relates to time-of-flight mass spectrometers which operate with pulsed ionization of superficially adsorbed analyte substances and with an...
2016/0111270 GLOW DISCHARGE MASS SPECTROMETRY METHOD AND DEVICE
A glow discharge mass spectrometry device and method, the device including a glow discharge lamp (1), gas flow-injection elements, the glow discharge lamp...
2016/0111269 MASS SPECTROMETER, USE THEREOF, AND METHOD FOR THE MASS SPECTROMETRIC EXAMINATION OF A GAS MIXTURE
The disclosure relates to a mass spectrometer for mass spectrometric examination of gas mixtures, including: an ionization device and an ion trap for storage...
2016/0111268 MASS ANALYSIS DEVICE
A mass analysis device capable of reliably detecting the peak in a mass chromatogram of a given m/z is equipped with a control unit, which generates a mass...
2016/0111267 Ion Detection System and Method
A detection system and a method for detecting ions which have been separated in a time-of-flight (TOF) mass analyzer, comprising an amplifying arrangement for...
2016/0111266 Compact Mass Spectrometer
A miniature mass spectrometer is disclosed comprising an atmospheric pressure ionisation source, a first vacuum chamber having an atmospheric pressure sampling...
2016/0111265 END BLOCK ARRANGEMENT AND SOCKET ARRANGEMENT
According to various embodiments, a socket arrangement for holding an end block on a process chamber may include the following: a first socket element with a...
2016/0111264 OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR PRODUCING SAME
An oxide sintered body is obtained by sintering indium oxide, gallium oxide and tin oxide. The oxide sintered body has a relative density of 90% or more and an...
2016/0111263 SPUTTERING TARGET AND METHOD OF PRODUCING THIN FILM BY USING SPUTTERING TARGET
There is provided a sputtering target for forming an amorphous film, the sputtering target including an electrically conductive mayenite compound, wherein...
2016/0111262 Nanocluster Production Device
Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of...
2016/0111261 System and Method for Detecting a Process Point in Multi-Mode Pulse Processes
A system and method of identifying a selected process point in a multi-mode pulsing process includes applying a multi-mode pulsing process to a selected wafer...
2016/0111260 GLASS PALLET FOR SPUTTERING SYSTEMS
Pallets for transporting one or more glass substrates in a substantially vertical orientation through a sputtering system. In some cases, a pallet comprising a...
2016/0111259 NOISE BASED FREQUENCY TUNING AND IDENTIFICATION OF PLASMA CHARACTERISTICS
This disclosure describes systems, methods, and apparatus for frequency tuning a power source so as to optimize power delivery to a plasma load as well as...
2016/0111258 GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL
A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas...
2016/0111257 SUBSTRATE FOR MOUNTING GAS SUPPLY COMPONENTS AND METHODS THEREOF
A gas delivery substrate for mounting gas supply components of a gas delivery system for a semiconductor processing apparatus. The substrate includes a...
2016/0111256 PLASMA REACTOR WITH NON-POWER-ABSORBING DIELECTRIC GAS SHOWER PLATE ASSEMBLY
A gas distribution plate for a plasma reactor has a dielectric front plate and a dielectric back plate bonded together, with gas injection orifices extending...
2016/0111255 Separation of Chips on a Substrate
Various methods and apparatuses are provided relating to separation of a substrate into a plurality of parts. For example, first a partial separation is...
2016/0111254 Workpiece Processing Method And Apparatus
A system and method for processing a workpiece is disclosed. A plasma chamber is used to create a ribbon ion beam, extracted through an extraction aperture. A...
2016/0111253 METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING METHOD
In a method for forming a resist film, a first resist film is formed on a light shielding film formed on a substrate, by using a spin coating method. A...
2016/0111252 CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING METHOD, AND SHOT CORRECTION METHOD OF...
In a charged particle beam writing apparatus, a charged particle optical system includes a first, second, and third deflection control system configured to...
2016/0111251 PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path...
2016/0111250 BEAM EXTRACTION SLIT STRUCTURE AND ION SOURCE
A beam extraction slit structure includes a plasma chamber interior surface that is, in operation, in contact with a plasma; a plasma chamber exterior surface...
2016/0111249 Methods and Apparatus for Determining, Using, and Indicating Ion Beam Working Properties
Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a...
2016/0111248 Electron Microscope and Elemental Mapping Image Generation Method
An electron microscope includes an acquisition section that acquires an electron microscope image of a specimen that includes a plurality of identical...
2016/0111247 CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE
A Charged Particle Microscope, comprising: includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An...
2016/0111246 BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAMS, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
A blanking device for multi charged particle beams includes a plurality of individual blanking mechanisms configured to individually deflect a corresponding...
2016/0111245 ELECTRODE ASSEMBLY HAVING PIERCE ELECTRODES FOR CONTROLLING SPACE CHARGE EFFECTS
An electrode assembly for accelerating or decelerating an ion beam is provided. In one example, the electrode assembly may include a pair of exit electrodes...
2016/0111244 ELECTROSTATIC LENS HAVING A DIELECTRIC SEMICONDUCTING MEMBRANE
Electrostatic lenses for focusing a beam of charged particles, and in particular an electron beam, are used especially in the electron guns of electron...
2016/0111243 Charged Particle Beam System and Method of Operating a Charged Particle Beam System
The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal...
2016/0111242 METHOD AND APPARATUS FOR A POROUS ELECTROSPRAY EMITTER
An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least...
2016/0111241 Ion Beam Uniformity Control
A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes...
2016/0111240 SURFACE MOUNT ELECTRICAL FUSE WITH A SUPPORT BRIDGE
An improved surface mount electrical fuse including a first fuse terminal; a second fuse terminal spaced apart from the first fuse terminal; and a fuse element...
2016/0111239 AXIAL MAGNETIC FIELD COIL FOR VACUUM INTERRUPTER
A contact assembly for use in a vacuum interrupter includes a contact disc of a first electrically conductive material, a coil, and a contact support. The coil...
2016/0111238 MAGNETIC ACTUATOR
A magnetic actuator includes: a movable unit, movable between a first position and a second position, and including an integrally formed eddy-current component...
2016/0111237 METHOD FOR DRIVING AN INDUCTIVE ACTUATOR
A method for driving an inductive actuator having an actuating element and an actuator coil, includes initially acting on the actuator coil with a voltage...
2016/0111236 OVER-TEMPERATURE PROTECTION METHOD, OVER-TEMPERATURE PROTECTION CIRCUIT AND LINEAR DRIVING CIRCUIT THEREOF
A method of over-temperature protection for a power switch, can include: (i) generating a sensing signal by sensing a temperature of the power switch; (ii)...
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