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Patent # Description
2016/0147162 ILLUMINATION OPTICAL APPARATUS AND DEVICE MANUFACTURING METHOD
Provided is an illumination optical apparatus for illuminating a mask with light from a light source. The apparatus includes an optical integrator configured...
2016/0147161 LITHOGRAPHIC METHOD
A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a...
2016/0147160 Radiation Source for an EUV Optical Lithographic Apparatus, and Lithographic Apparatus Comprising such a...
A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will...
2016/0147159 OPTICAL IMAGING DEVICE
There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device...
2016/0147158 IMAGING OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field...
2016/0147157 PATTERN FORMATION METHOD, PATTERN, AND ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC...
There is provided a pattern formation method comprising: a step (i) for forming a first negative type pattern by performing the specific steps on a substrate;...
2016/0147156 PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD...
The pattern formation method includes the following steps (i) to (iii): (i) a step in which an active-light-sensitive or radiation-sensitive resin composition...
2016/0147155 PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM,...
There are provided A pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2)...
2016/0147154 PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM,...
There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2)...
2016/0147153 SYSTEMS, DEVICES, AND METHODS FOR PRINTING ON THREE-DIMENSIONAL OBJECTS
Systems, devices, and methods for printing on surfaces of three-dimensional objects are provided. The systems, devices, and methods allow for images, and...
2016/0147152 ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION AND RESIST UNDERLAYER FILM-FORMING COMPOSITION...
An additive for a resist underlayer film-forming composition that modifies a surface state of a resist underlayer film into a hydrophobic state to enhance...
2016/0147151 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLAC RESIN
An excellent resist underlayer film having a selectivity of dry etching rate close to that of a resist, selectivity of dry etching rate lower than that of a...
2016/0147150 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
A chemically amplified resist composition comprising a base polymer, an acid generator, and a basic compound which is a cholanoate having an acid labile...
2016/0147149 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
An androstane or estrane-substituted cholane as base resin is combined with an acid generator to formulate a positive resist composition, especially chemically...
2016/0147148 FORMING CONDUCTIVE METAL PATTERNS USING THIOSULFATE COPOLYMERS
A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a)...
2016/0147147 PATTERN FORMING METHOD, ACTINIC RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR...
There are provided a pattern forming method which satisfies high sensitivity, high resolving power at the time of isolated line pattern formation, a good...
2016/0147146 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A non-ionic compound includes a group represented by formula (Ia): ##STR00001## wherein R.sup.2 represents a group having a C.sub.5 to C.sub.18 alicyclic ...
2016/0147145 PHOTOIMAGEABLE COMPOSITIONS CONTAINING OXETANE FUNCTIONALITY
Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions useful for forming films...
2016/0147144 REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES
A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.
2016/0147143 IMPRINT METHOD AND APPARATUS
An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into...
2016/0147142 PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK
A photomask blank has a chemically amplified positive resist film comprising (A) a polymer comprising recurring units having a specific substituent group on...
2016/0147141 PELLICLE AND EUV EXPOSURE DEVICE COMPRISING SAME
The present invention addresses the problem of providing a pellicle which has high EUV transmittance and high strength, while being not susceptible to damage...
2016/0147140 PATTERN VERIFYING METHOD
The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process...
2016/0147139 SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
An object of the present invention is to provide a substrate with a multilayer reflective film, which gives a reflective mask achieving high reflectance and...
2016/0147138 EUV MASK AND MANUFACTURING METHOD BY USING THE SAME
The present disclosure provides a photolithography mask. The photolithography mask includes a substrate that contains a low thermal expansion material (LTEM)....
2016/0147137 PELLICLE FOR EUV MASK AND FABRICATION THEREOF
The present disclosure provides a method in accordance with some embodiments. A wafer is grinded from a back side. The wafer is inserted into an opening...
2016/0147136 WAVELENGTH CONVERSION ELEMENT, LIGHT SOURCE DEVICE, PROJECTOR, AND METHOD FOR MANUFACTURING WAVELENGTH...
The invention relates to a wavelength conversion element including: a phosphor layer including a first surface and fluorescence-emitting points dispersed...
2016/0147135 ILLUMINATION SYSTEM AND PROJECTION APPARATUS
An illumination system including a plurality of light source units, at least one light concentrating unit, at least one taper tunnel and a light consolidating...
2016/0147134 ENCLOSURE ASSEMBLY
Enclosure assembly includes a clipping member for being secured to an electronic device and an air guiding duct coupled to the clipping member. The clipping...
2016/0147133 IMAGING DEVICE AND FIXING DEVICE
An imaging device includes a base, an illuminating device, a first housing element, and a second housing element. The first housing element defines a cutout....
2016/0147132 ENVIRONMENTAL LIGHTING SYSTEM AND METHOD
A photography lighting system operative to impart patterns of complimentary colors that mimic the ambient light of natural surroundings creating a faithful...
2016/0147131 Multiple Camera Apparatus and Method for Synchronized Autofocus
A disclosed apparatus includes a plurality of camera units. Control logic, operatively coupled to each camera unit, is operative to perform a parallax...
2016/0147130 CRYSTAL-PAIR COUNTER-ROTATOR WITH TRANSLATION CAPABILITY
In an optical parametric frequency conversion arrangement first and second optically nonlinear crystals (18, 20) mounted on respectively first and second...
2016/0147129 OPTICAL COMMUNICATION DEVICE AND METHOD OF CONTROLLING OPTICAL MODULATOR
An optical communication device has a pair of Mach-Zehnder optical modulators; a voltage monitor configured to monitor a voltage component acquired by...
2016/0147128 TIR-MODULATED WIDE VIEWING ANGLE DISPLAY
Improvements and modifications are provided in the type of frustrated total internal reflection (TIR) systems described in U.S. Pat. Nos. 6,885,496; 6,891,658;...
2016/0147127 DISPLAY UNIT AND ELECTRONIC APPARATUS
There is provided a display unit including: in an insulating liquid, migrating particles; non-migrating particles having optical reflection characteristics...
2016/0147126 ELECTRO-OPTIC ASSEMBLY
An electro-optic assembly for use in a vehicle having a windshield is provided and includes a first arcuate substrate having a first surface with an...
2016/0147125 ELECTRONIC DEVICES WTH TRANSPARENT CONDUCTING ELECTRODES, AND METHODS OF MANUFACTURE THEREOF
An embodiment of a transparent conducting electrode includes a first non-conductive layer formed from a first non-conductive material, a conductive layer, and...
2016/0147124 PIXEL STRUCTURE OF DISPLAY PANEL
A pixel structure of display panel includes a first thin film transistor device, a second thin film transistor device, a first passivation layer, a common...
2016/0147123 ARRAY SUBSTRATE AND DISPLAY DEVICE
An array substrate and a display device are provided. A common electrode line with the same extending direction as a gate line is disposed at one end near a...
2016/0147122 DISPLAY DEVICE
A display device may include a transistor, which includes a first transistor electrode and a second transistor electrode. The display device may further...
2016/0147121 LIQUID CRYSTAL DEVICE AND ELECTRONIC APPARATUS
In a first substrate of a liquid crystal device, among wiring lines extending to a non-display area interposed between a display area and an outer edge of a...
2016/0147120 DISPLAY DEVICE
A display device includes a first substrate; a gate line on the first substrate; a data line disposed to intersect the gate line; a thin film transistor (TFT)...
2016/0147119 LIQUID CRYSTAL DISPLAY
A liquid crystal display (LCD) is provided. A liquid crystal display (LCD) comprising a first pixel electrode portion; a second pixel electrode portion...
2016/0147118 LIQUID CRYSTAL DISPLAY
A liquid crystal display according to an embodiment includes: a lower panel including a pixel electrode having a first subpixel electrode and a second subpixel...
2016/0147117 PIXEL STRUCTURES FOR LIQUID CRYSTAL DISPLAY DEVICE
In one aspect of the invention, a pixel structure comprises a substrate and a first electrode disposed on the substrate, a first dielectric layer disposed on...
2016/0147116 LIQUID CRYSTAL DISPLAY AND MANUFACTURING METHOD THEREOF
Disclosed is a liquid crystal display including: a first substrate; a second substrate facing the first substrate; a liquid crystal layer provided between the...
2016/0147115 DISPLAY DEVICE
Disclosed herein are a backlight unit and a display device using the same. In an embodiment, the backlight unit includes a substrate, at least one light source...
2016/0147114 ARRAY TEST MODULATOR AND DEVICE FOR INSPECTING THIN FILM TRANSISTOR SUBSTRATE INCLUDING THE SAME
An array test modulator, including a first glass; a second glass facing the first glass and including a common electrode; a liquid crystal layer between the...
2016/0147113 Touch Polarizer and Touch Display Device
A touch polarizer and a touch display device are provided. The touch polarizer includes a first substrate, a transparent electrode layer, a wire-grid electrode...
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