Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2016/0189970 METHOD FOR FORMING A SEMICONDUCTOR STRUCTURE
The present invention provides a method for forming a semiconductor structure, including: firstly, providing a substrate, a fin structure being disposed on the...
2016/0189969 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device includes forming a device structure in a surface of a semiconductor substrate, forming, in a face of the...
2016/0189968 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device that reduces degradation of device properties includes forming an impurity region in a surface layer of a...
2016/0189967 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device includes providing a semiconductor substrate having a front surface and a back surface; forming a transition...
2016/0189966 PRE-FILL WAFER CLEANING FORMULATION
A pre-fill solution for application onto a substrate surface prior to a fill operation is provided, the fill operation defined by application of an electroless...
2016/0189965 PROCESS, STACK AND ASSEMBLY FOR SEPARATING A STRUCTURE FROM A SUBSTRATE BY ELECTROMAGNETIC RADIATION
A method for separating a structure from a substrate through electromagnetic irradiations (EI) belonging to a spectral range comprises the steps of a)...
2016/0189964 SEMICONDUCTOR DEVICE HAVING AREAS WITH DIFFERENT CONDUCTIVITY TYPES AND DIFFERENT DOPING
A semiconductor device includes a semiconductor substrate. The semiconductor substrate includes a plurality of first doping regions of a first doping structure...
2016/0189963 DOPING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
Disclosed is a method of performing doping by implanting a dopant to a processing target substrate. First, in an oxide film forming step, an oxide film is...
2016/0189962 Semiconductor Device Having a Metal-Semiconductor Junction and Manufacturing Therefor
A method for manufacturing a semiconductor device includes providing a wafer having a first semiconductor layer, forming at the first semiconductor layer a...
2016/0189961 Polycrystalline Silicon Substrate and Manufacturing Method thereof
The present invention discloses a polycrystalline silicon substrate and a manufacturing method thereof. The method comprises: provide a substrate; sequentially...
2016/0189960 METHOD OF MANUFACTURING NANOWIRE ARRAY USING INDUCED GROWTH
Provided is a method of manufacturing a nanowire array using induced growth, in which a nitride inorganic nanowire is grown from a nitride seed by forming the...
2016/0189959 TYPE III-V AND TYPE IV SEMICONDUCTOR DEVICE FORMATION
Forming a semiconductor device is disclosed, according to embodiments of the present disclosure. Forming the semiconductor device can include forming a first...
2016/0189958 HETEROEPITAXIAL GROWTH OF Ge-Sn ALLOYS
Heteroepitaxial methods are described herein for the growth of germanium-tin alloy layers directly on silicon substrates. A method of heteroeptiaxial growth of...
2016/0189957 Method of Forming Silicon Film and Apparatus Therefor
There is provided a method of forming a silicon film on a target surface of a target object, including: performing a gas process on the target surface of the...
2016/0189956 METHOD FOR MANUFACTURING SiC WAFER FIT FOR INTEGRATION WITH POWER DEVICE MANUFACTURING TECHNOLOGY
A method for producing silicon carbide substrates fit for epitaxial growth in a standard epitaxial chamber normally used for silicon wafers processing. Strict...
2016/0189955 SILICON CARBIDE SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR SUBSTRATE, AND...
A silicon carbide semiconductor substrate includes: a base substrate that has a main surface having an outer diameter of not less than 100 mm and that is made...
2016/0189954 METHODS OF PERFORMING SEMICONDUCTOR GROWTH USING REUSABLE CARRIER SUBSTRATES AND RELATED CARRIER SUBSTRATES
Semiconductor devices are fabricated by providing a growth substrate having a thickness within a preselected range and then bonding a lower surface of the...
2016/0189953 METHODS OF FORMING ELECTRONIC DEVICES
Methods of forming an electronic device comprise: (a) providing a semiconductor substrate comprising a porous feature on a surface thereof; (b) applying a...
2016/0189952 METHOD FOR GROWING EPITAXIES OF A CHEMICAL COMPOUND SEMICONDUCTOR
A method includes providing a substrate, forming a prelayer over a substrate, forming a barrier layer over the prelayer, and forming a channel layer over the...
2016/0189951 METHODS OF FORMING A LAYER AND METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
In a method of forming a layer, a substrate is loaded into a chamber and placed at a home position that is a first relative angular position. A process cycle...
2016/0189950 FILM FORMING METHOD
Disclosed is a method of forming a nitride film on a substrate to be processed ("processing target substrate") having a carbon-containing film that contains a...
2016/0189949 TRIPLE QUADRUPOLE MASS SPECTROMETER
The present triple quadrupole mass spectrometer determines the relationship between a parameter, such as the mass-to-charge ratio of a precursor ion or that of...
2016/0189948 DEVICE FOR ANALYZING A SAMPLE GAS COMPRISING AN ION SOURCE
A device for analyzing a sample gas comprises an ion source for generating primary ions, a reaction chamber to which the primary ions produced in the ion...
2016/0189947 ELECTRODE RING FOR ION MOBILITY SPECTROMETER, ION TRANSFER TUBE AND ION MOBILITY SPECTROMETER
The present disclosure provides an electrode ring for an ion mobility spectrometer, an ion transfer tube and an ion mobility spectrometer. Wherein, the...
2016/0189946 ION TRANSPORT APPARATUS AND MASS SPECTROMETER USING THE SAME
Within an intermediate vacuum chamber next to an ionization chamber maintained at atmospheric pressure, an electrode group of a radio-frequency carpet composed...
2016/0189945 SAMPLE INTRODUCTION DEVICE
A sample introduction device comprises a sampling unit, a gas suction pump, adsorption units, a piston cylinder and a desorption cylinder that comprises a...
2016/0189944 METHOD FOR ANALYSIS OF SAMPLE AND APPARATUS THEREFOR
A thermal analysis step, a molecule ionization step and a molecular structure analysis step are executed in parallel to a temperature increasing step. In the...
2016/0189943 Intensity Correction for TOF Data Acquisition
Systems and methods are provided for correcting uniform detector saturation. In one method, a mass analyzer analyzes N extractions of an ion beam. A nonzero...
2016/0189942 NANOPARTICULATE ASSISTED NANOSCALE MOLECULAR IMAGING BY MASS SPECTROMETRY
Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally...
2016/0189941 METHODS AND APPARATUS FOR NODULE CONTROL IN A TITANIUM-TUNGSTEN TARGET
Embodiments of the present disclosure include methods and apparatus for controlling titanium-tungsten (TiW) target nodule formation. In some embodiments, a...
2016/0189940 RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS
One embodiment of the present invention provides a sputtering system for large-scale fabrication of solar cells. The sputtering system includes a reaction...
2016/0189939 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION
A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support...
2016/0189938 ONE-PIECE PROCESS KIT SHIELD
Embodiments of process kit shields and process chambers incorporating same are provided herein. In some embodiments, a one-piece process kit shield includes a...
2016/0189937 DETERMINING A VALUE OF A VARIABLE ON AN RF TRANSMISSION MODEL
Systems and methods for determining a value of a variable on a radio frequency (RF) transmission model are described. One of the methods includes identifying a...
2016/0189936 HIGH CONDUCTANCE PROCESS KIT
Apparatus for plasma processing of semiconductor substrates. Aspects of the apparatus include an upper shield with a gas diffuser arranged at a center of the...
2016/0189935 IN SITU CONTROL OF ION ANGULAR DISTRIBUTION IN A PROCESSING APPARATUS
A processing apparatus may include a plasma source coupled to a plasma chamber to generate a plasma in the plasma chamber, an extraction plate having an...
2016/0189934 PLASMA PROCESSING APPARATUS
Provided is a plasma processing apparatus that processes a substrate by converting a processing gas into plasma. A plurality of rotatable substrate stages are...
2016/0189933 RADIAL WAVEGUIDE SYSTEMS AND METHODS FOR POST-MATCH CONTROL OF MICROWAVES
A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first...
2016/0189932 TUNING A PARAMETER ASSOCIATED WITH PLASMA IMPEDANCE
Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a...
2016/0189931 PLASMA PROCESSING APPARATUS AND METHOD FOR DETERMINING REPLACEMENT OF MEMBER OF PLASMA PROCESSING APPARATUS
Disclosed is a plasma processing apparatus including a processing container configured to air-tightly accommodate a substrate; and a placing table provided in...
2016/0189930 EXPOSURE APPARATUS AND EXPOSURE METHOD
To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus...
2016/0189929 RAPID TEM SAMPLE PREPARATION METHOD WITH BACKSIDE FIB MILLING
A method for TEM sample preparation with backside milling of a sample extracted from a workpiece in an energetic-beam instrument such as a FIB-SEM is...
2016/0189928 SYSTEM AND METHOD TO IMPROVE PRODUCTIVITY OF HYBRID SCAN ION BEAM IMPLANTERS
A method for improving the productivity of a hybrid scan implanter by determining an optimum scan width is provided. A method of tuning a scanned ion beam is...
2016/0189927 Method of Measuring Vertical Beam Profile in an Ion Implantation System Having a Vertical Beam Angle Device
An ion implantation system measurement system has a scan arm that rotates about an axis and a workpiece support to translate a workpiece through the ion beam....
2016/0189926 Beam Profiling Speed Enhancement for Scanned Beam Implanters
An ion implantation system and method are provided where an ion beam is tuned to a first process recipe. The ion beam is scanned along a scan plane at a first...
2016/0189925 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING ION BEAM
A computer-readable recording medium encoded with a computer program for executing an ion etching method of etching a substrate arranged on a substrate holder...
2016/0189924 Electron Microscope and Method of Operating Same
An electron microscope is offered that is capable of achieving noise cancellation which results in a low level of noise and which can be implemented at high...
2016/0189923 APPARATUS AND METHOD
An apparatus for imaging or fabrication using charged particles, the apparatus including: a charged particle source configured to generate a charged particle...
2016/0189922 CHARGED PARTICLE MICROSCOPE WITH IMPROVED SPECTROSCOPIC FUNCTIONALITY
A spectroscopic analysis method, comprising: Directing a beam of radiation onto a location P on a specimen, thereby causing a flux of X-rays to emanate from...
2016/0189921 Compact Particle Sensor
An energy sensor is provided including a collimator comprising a plurality of sensor apertures aligned in a plurality of directions configured to allow passage...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 149 150 151 152 153 154 155 156 157 158 159 160 161 162 163 164 165 166 167 168 169 170 171 172 173 174 175 176 177 178 179 180 181 182 183 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.