Easy To Use Patents Search & Patent Lawyer Directory
At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.
Searching:
Search by keyword, patent number, inventor, assignee, city or state:
| Patent # | Description |
|---|---|
| 2016/0268434 |
SOURCE/DRAIN REGIONS FOR FIN FIELD EFFECT TRANSISTORS AND METHODS OF
FORMING SAME A method for forming a semiconductor device includes forming a fin extending upwards from a semiconductor substrate and forming a sacrificial layer on... |
| 2016/0268433 |
METHOD OF MAKING A CMOS SEMICONDUCTOR DEVICE USING A STRESSED
SILICON-ON-INSULATOR (SOI) WAFER A method for forming a complementary metal oxide semiconductor (CMOS) semiconductor device includes providing a stressed silicon-on-insulator (sSOI) wafer... |
| 2016/0268432 |
SEMICONDUCTOR DEVICE According to one embodiment, a semiconductor device includes a semiconductor substrate having a trench and including an active area including a channel area... |
| 2016/0268431 |
FULLY DEPLETED DEVICE WITH BURIED INSULATING LAYER IN CHANNEL REGION A semiconductor device includes an active region formed in a semiconductor substrate, a gate structure disposed over the active region, source/drain regions... |
| 2016/0268430 |
METHOD FOR FABRICATING SEMICONDUCTOR STRUCTURES INCLUDING FIN STRUCTURES
WITH DIFFERENT STRAIN STATES, AND... Methods of forming a semiconductor structure include providing a multi-layer substrate having an epitaxial base layer overlying a strained primary... |
| 2016/0268429 |
FinFET with Multiple Dislocation Planes and Method for Forming the Same A method comprises forming a first fin and a second fin over a substrate, wherein the first fin and the second fin are separated by a trench, applying a first... |
| 2016/0268428 |
ELECTRONIC DEVICE WITH ASYMMETRIC GATE STRAIN The use of strained gate electrodes in integrated circuits results in a transistor having improved carrier mobility, improved drive characteristics, and... |
| 2016/0268427 |
Method for Inducing Strain in Vertical Semiconductor Columns A vertical Metal-Oxide-Semiconductor (MOS) transistor includes a substrate and a nano-wire over the substrate. The nano-wire comprises a semiconductor... |
| 2016/0268426 |
THREE-DIMENSIONAL TRANSISTOR WITH IMPROVED CHANNEL MOBILITY A semiconductor device includes a plurality of spaced apart fins, a dielectric material layer positioned between each of the plurality of spaced apart fins,... |
| 2016/0268425 |
Semiconductor Device Having a Fin at a Side of a Semiconductor Body One embodiment of a semiconductor device includes a fin at a first side of a semiconductor body, a body region of a second conductivity type in at least a part... |
| 2016/0268424 |
SEMICONDUCTOR STRUCTURE INCLUDING BACKGATE REGIONS AND METHOD FOR THE
FORMATION THEREOF A semiconductor structure includes a semiconductor substrate, a plurality of transistors and an electrically insulating layer provided between the substrate... |
| 2016/0268423 |
Semiconductor Device, Integrated Circuit and Method of Manufacturing a
Semiconductor Device A semiconductor device includes a transistor in a semiconductor substrate having a first main surface. The transistor includes a source region, a drain region,... |
| 2016/0268422 |
Method of Manufacturing a Semiconductor Device A method of manufacturing a semiconductor device includes forming a first semiconductor layer on a semiconductor substrate of a first conductivity type having... |
| 2016/0268421 |
SEMICONDUCTOR DEVICE A semiconductor device includes a semiconductor substrate having a first surface and a second surface opposite to the first surface, a first region of a first... |
| 2016/0268420 |
SEMICONDUCTOR DEVICE A semiconductor device is provided including a first electrode and a first semiconductor layer of a first conductivity type connected to the first electrode.... |
| 2016/0268419 |
SEMICONDUCTOR DEVICE A semiconductor device includes a first semiconductor region of a first conductivity type, a first electrode, a second electrode, a third electrode, a first... |
| 2016/0268418 |
NONVOLATILE MEMORY TRANSISTOR AND DEVICE INCLUDING THE SAME Provided are nonvolatile memory transistors and devices including the nonvolatile memory transistors. A nonvolatile memory transistor may include a channel... |
| 2016/0268417 |
DISPLAY DEVICE According to one embodiment, a thin-film transistor includes a semiconductor layer SC including a channel region, and a source region and a drain region on... |
| 2016/0268416 |
METHODS OF FORMING SEMICONDUCTOR DEVICES, INCLUDING FORMING A
SEMICONDUCTOR MATERIAL ON A FIN, AND RELATED... Methods of forming a semiconductor device are provided. A method of forming a semiconductor device includes forming a semiconductor layer on a fin, where the... |
| 2016/0268415 |
GATE AND SOURCE/DRAIN CONTACT STRUCTURES FOR A SEMICONDUCTOR DEVICE One illustrative device disclosed herein includes, among other things, a dielectric layer disposed above a source/drain region and a gate structure of a... |
| 2016/0268414 |
Semiconductor Devices Including Insulating Gates and Methods for
Fabricating the Same Semiconductor devices are provided including a first active fin extending in a first direction and a second active fin spaced apart from the first active fin... |
| 2016/0268413 |
DIAMOND SHAPED SOURCE DRAIN EPITAXY WITH UNDERLYING BUFFER LAYER A semiconductor structure includes a fin upon a semiconductor substrate. A clean epitaxial growth surface is provided by forming a buffer layer upon fin... |
| 2016/0268412 |
SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR
APPARATUS A semiconductor apparatus includes a substrate, a semiconductor layer formed above the substrate and including a nitride semiconductor, an electrode formed... |
| 2016/0268411 |
HIGH ELECTRON MOBILITY TRANSISTOR (HEMT) AND METHOD OF PRODUCING THE SAME A high electron mobility transistor (HEMT) primarily made of nitride semiconductor materials is disclosed. The HEMT includes, on a substrate, a buffer layer, a... |
| 2016/0268410 |
SEMICONDUCTOR DEVICE A semiconductor device includes: a substrate; a first compound semiconductor layer provided on the substrate; a second compound semiconductor layer provided on... |
| 2016/0268409 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF A semiconductor device includes a first nitride semiconductor layer, a second nitride semiconductor layer located on the first nitride semiconductor layer, a... |
| 2016/0268408 |
SEMICONDUCTOR DEVICE A semiconductor device includes a first compound semiconductor layer on a substrate, a second compound semiconductor layer on the first compound semiconductor... |
| 2016/0268407 |
TECHNIQUES FOR FORMING CONTACTS TO QUANTUM WELL TRANSISTORS Techniques are disclosed for providing a low resistance self-aligned contacts to devices formed in a semiconductor heterostructure. The techniques can be used,... |
| 2016/0268406 |
SINGLE-ELECTRON TRANSISTOR AND ITS FABRICATION METHOD Single-electron transistor comprising at least: first semiconductor portions forming source and drain regions, a second semiconductor portion forming at... |
| 2016/0268405 |
Thin-Substrate Double-Base High-Voltage Bipolar Transistors B-TRAN bipolar power transistor devices and methods, using a drift region which is much thinner than previously proposed double-base bipolar transistors of... |
| 2016/0268404 |
DUAL TRENCH-GATE IGBT STRUCTURE An IGBT device includes a substrate having a bottom semiconductor layer of a first conductivity type and an upper semiconductor layer of a second conductivity... |
| 2016/0268403 |
SEMICONDUCTOR DEVICE HAVING METAL LAYER AND METHOD OF FABRICATING SAME A semiconductor device includes a substrate having a first conductivity type, a high-voltage well having a second conductivity type and formed in the... |
| 2016/0268402 |
METHOD FOR MANUFACTURING A TRANSISTOR A method comprises arranging a stack, on a semiconductor substrate, comprising a sacrificial layer and an insulating layer. The insulator layer is at least... |
| 2016/0268401 |
COMPLEMENTARY TUNNELING FET DEVICES AND METHOD FOR FORMING THE SAME Described is an apparatus forming complementary tunneling field effect transistors (TFETs) using oxide and/or organic semiconductor material. One type of TFET... |
| 2016/0268400 |
COMMON FABRICATION OF MULTIPLE FINFETs WITH DIFFERENT CHANNEL HEIGHTS Commonly fabricated FinFET type semiconductor devices with different (i.e., both taller and shorter) heights of an entirety of or only the channel region of... |
| 2016/0268399 |
METHODS OF FORMING EMBEDDED SOURCE/DRAIN REGIONS ON FINFET DEVICES One illustrative method disclosed herein includes, among other things, forming a layer of insulating material in the source/drain regions of the device,... |
| 2016/0268398 |
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE According to one embodiment, a method of manufacturing a semiconductor device comprises forming a semiconductor layer on a substrate, forming a first... |
| 2016/0268397 |
Method of Manufacturing a Semiconductor Device A method of manufacturing a semiconductor device includes forming a transistor in a semiconductor substrate having a first main surface. The transistor is... |
| 2016/0268396 |
MANUFACTURING METHOD FOR VERTICAL CHANNEL GATE-ALL-AROUND MOSFET BY
EPITAXY PROCESSES A manufacturing method is provided for fabricating a vertical channel gate-all-around MOSFET by epitaxy processes. The method includes growing a first... |
| 2016/0268395 |
SELF-ALIGNED SOURCE AND DRAIN REGIONS FOR SEMICONDUCTOR DEVICES A method for forming a semiconductor device includes patterning a gate conductor, formed on a substrate, and a two-dimensional material formed on the gate... |
| 2016/0268394 |
SEMICONDUCTOR DEVICE HAVING FIN-TYPE FIELD EFFECT TRANSISTOR AND METHOD OF
MANUFACTURING THE SAME A semiconductor device includes a substrate having a first region and a second region, a first MOS transistor including a first fin structure and a first gate... |
| 2016/0268393 |
SEMICONDUCTOR DEVICES HAVING 3D CHANNELS, AND METHODS OF FABRICATING
SEMICONDUCTOR DEVICES HAVING 3D CHANNELS A semiconductor device includes a substrate including first to third fins aligned in a first direction, a first trench arranged between the first fin and the... |
| 2016/0268392 |
SEMICONDUCTOR ARRANGEMENT AND METHOD FOR MANUFACTURING THE SAME A semiconductor arrangement and a method for manufacturing the same. An arrangement may include a bulk semiconductor substrate; a fin formed on the substrate;... |
| 2016/0268391 |
METHODS FOR FORMING METAL SILICIDE A method for forming a metal silicide. The method comprises: providing a substrate having a fin, a gate formed on the fin, and spacers formed on opposite sides... |
| 2016/0268390 |
ASYMMETRIC HIGH-K DIELECTRIC FOR REDUCING GATE INDUCED DRAIN LEAKAGE An asymmetric high-k dielectric for reduced gate induced drain leakage in high-k MOSFETs and methods of manufacture are disclosed. The method includes... |
| 2016/0268389 |
SEMICONDUCTOR DEVICE A semiconductor device includes a semiconductor layer, a first electrode located over the semiconductor layer and connected to the semiconductor layer, a... |
| 2016/0268388 |
NON-VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME A non-volatile memory device includes a semiconductor body extending in a first direction, an electrode extending in a second direction crossing the first... |
| 2016/0268387 |
SPLIT-GATE FLASH MEMORY WITH IMPROVED PROGRAM EFFICIENCY A split gate memory cell is fabricated with a word gate extending below an upper surface of a substrate having the channel region. An embodiment includes... |
| 2016/0268386 |
Field Effect Power Transistor Metalization Having a Comb Structure with
Contact Fingers A metalization of a field effect power transistor having lateral semiconductor layers on an insulator substrate or an intrinsically conducting or doped... |
| 2016/0268385 |
CLOSED CELL CONFIGURATION TO INCREASE CHANNEL DENSITY FOR SUB-MICRON
PLANAR SEMICONDUCTOR POWER DEVICE A semiconductor power device supported on a semiconductor substrate that includes a plurality of transistor cells, each cell has a source and a drain region... |
File A Patent Application
- Protect your idea -- Don't let someone else file first. Learn more.
- 3 Easy Steps -- Complete Form, application Review, and File. See our process.
- Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.