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Patent # Description
2016/0284559 POLYMER FOR RESIST UNDER LAYER FILM COMPOSITION, RESIST UNDER LAYER FILM COMPOSITION, AND PATTERNING PROCESS
The invention provides a polymer for a resist under layer film composition, containing a repeating unit shown by the formula (1) and a repeating unit shown by...
2016/0284558 FIN TRIMMING IN A DOUBLE SIT PROCESS
A semiconductor structure and the method of forming that semiconductor structure. The method includes formation of a plurality of fins from a layer of...
2016/0284557 Patterning Process of a Semiconductor Structure with a Wet Strippable Middle Layer
A lithography method is provided in accordance with some embodiments. The lithography method includes forming an under layer of a polymeric material on a...
2016/0284556 ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES
Methods of etching a patterned substrate may include flowing an oxygen-containing precursor into a first remote plasma region fluidly coupled with a substrate...
2016/0284555 METHOD FOR FORMING STAIR-STEP STRUCTURES
A method for forming a stair-step structure in a substrate within a plasma processing chamber is provided. An organic mask is formed over the substrate. The...
2016/0284554 SPALLING USING DISSOLVABLE RELEASE LAYER
A method of performing spalling of a semiconductor substrate in which a release layer is used between a handling substrate and a stressor layer. The release...
2016/0284553 METHOD OF FORMING TUNGSTEN FILM
In a method of forming a tungsten film, an initial tungsten film and a main tungsten film are formed on an underlying film of a substrate. The initial tungsten...
2016/0284552 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND RECORDING MEDIUM
A method of manufacturing a semiconductor device includes forming a seed layer containing a metal element on a substrate by performing a first process and a...
2016/0284551 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
A method for fabricating semiconductor device is disclosed. A substrate having a first gate layer and a first dielectric layer thereon is provided. A shallow...
2016/0284550 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
A manufacturing method for a semiconductor device, the method, comprising forming, on a substrate, a first resist pattern including a plurality of line...
2016/0284549 SHORT-CHANNEL NFET DEVICE
A method of forming a semiconductor device is provided including co-implanting a halo species and carbon in a semiconductor layer with a finite tilt angle with...
2016/0284548 METHOD OF DOPING SUBSTRATE
Provided is a method of doping a substrate. The method includes providing the substrate, providing a target material on the substrate, and implanting a dopant...
2016/0284547 IMPURITY ADDING APPARATUS, IMPURITY ADDING METHOD, AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
An impurity-doping apparatus is provided with: a supporting plate which supports a semiconductor substrate; a wall-like block disposed above the supporting...
2016/0284546 METHOD OF MANUFACTURING A SUBSTRATE HAVING A CRYSTALLIZED LAYER AND A LASER CRYSTALLIZING APPARATUS FOR THE SAME
A method of manufacturing a substrate includes: irradiating, along a first path, a laser beam emitted from a source onto a substrate, wherein the substrate...
2016/0284545 SYSTEM AND METHOD FOR PRODUCING POLYCRYSTALLINE GROUP III NITRIDE ARTICLES AND USE THEREOF IN PRODUCTION OF...
The present disclosure relates to processes for producing single crystal Group III Nitride articles, polycrystalline Group III Nitride source materials...
2016/0284544 Methods and Devices for Fabricating and Assembling Printable Semiconductor Elements
The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate...
2016/0284543 SUBSTRATE PROCESSING APPARATUS, PROGRAM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A substrate processing apparatus includes: a substrate holder configured to hold a substrate; a gas supply unit configured to supply gas of processing the...
2016/0284542 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
A technique of manufacturing a semiconductor device includes forming a film on a substrate in a process chamber by supplying a precursor and a reactant to the...
2016/0284541 DEPOSITION OF METAL DIELECTRIC FILM FOR HARDMASKS
A system and method for depositing a metal dielectric film includes arranging a substrate in a plasma enhanced chemical vapor deposition (PECVD) processing...
2016/0284540 DEVICES COMPRISING HIGH-K DIELECTRIC LAYER AND METHODS OF FORMING SAME
Provided is a semiconductor device that includes a semiconductor substrate and a 10 to 40 .ANG. thick high-k dielectric layer that contains one or both of...
2016/0284539 Method of Manufacturing Semiconductor Device
A technique capable of suppressing the generation of foreign matter in a process container involves a method of manufacturing a semiconductor device including:...
2016/0284538 DEFECT PLANARIZATION
Aspects of the disclosure pertain to methods of forming planar amorphous carbon layers on patterned substrates. Layers formed according to embodiments outlined...
2016/0284537 SILICON-BASED MIDDLE LAYER COMPOSITION
A method of making a semiconductor device is provided. The method includes forming a first material layer that includes a silicon-based component having an...
2016/0284536 GROUP III-V COMPOUND SEMICONDUCTOR NANOWIRE, FIELD EFFECT TRANSISTOR, AND SWITCHING ELEMENT
The present invention pertains to a group III-V compound semiconductor nanowire able to be used in a group III-V compound semiconductor MOSFET (FET)...
2016/0284535 METHOD FOR WET STRIPPING SILICON-CONTAINING ORGANIC LAYERS
A method for stripping material from a microelectronic workpiece is described. The method includes receiving a workpiece having a surface exposing a layer...
2016/0284534 METHOD OF FORMING THIN FILM
Provided is a method of forming a thin film having a target thickness T on a substrate by an atomic layer deposition (ALD) method. The method includes n...
2016/0284533 SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD
In one embodiment, a semiconductor manufacturing apparatus includes an accommodation module configured to accommodate a substrate. The apparatus further...
2016/0284532 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
A semiconductor device manufacturing method, including: mounting substrates on a mounting table within a processing chamber along a rotation direction of the...
2016/0284531 ENERGY RESOLVED TIME-OF-FLIGHT MASS SPECTROMETRY
A time-of-flight mass spectrometer (TOF-MS) utilizes an ion dispersion device and a position-sensitive ion detector or an energy-sensitive ion detector to...
2016/0284530 Absorption Mode FT-IMS
A method of Fourier transform ion mobility spectrometry is disclosed wherein an absorption spectrum of the complex spectral data is used to determine the ion...
2016/0284529 High Resolution Mobility Analysis of Large Charge-Reduced Electrospray Ions
Achieving high conversion of large multiply charged biological ions into low charge states involves requirements difficult to reconcile when high transmission...
2016/0284528 SYSTEMS AND METHODS FOR HIGH THROUGHPUT SOLVENT ASSISTED IONIZATION INLET FOR MASS SPECTROMETRY
A multiplex system and method for achieving high throughput analysis of samples using solvent assisted ionization inlet includes an ionizing system with a...
2016/0284527 OFFLINE MASS CALIBRATION
A method includes producing ions from one or more calibrant species and delivering the ions to a mass analyzer, and measuring a first set of mass related...
2016/0284526 Pre-Filter Fragmentation
A method of fragmenting ions is disclosed comprising providing a linear ion trap comprising: (i) a first electrode set comprising a plurality of first...
2016/0284525 COOLED PHOTOMULTIPLIER TUBE BASED LIGHT DETECTOR WITH REDUCED CONDENSATION, AND RELATED APPARATUSES AND METHODS
A light detector includes a cooling device between a photomultiplier tube (PMT) device and a heat sink. A thermally conductive shield encloses the PMT device...
2016/0284524 CYLINDRICAL SPUTTERING TARGET
A cylindrical sputtering target includes a cylindrical substrate and a cylindrical sputtering target member joined together with a joining material. Where the...
2016/0284523 Hydrofluoroolefin Etching Gas Mixtures
The present invention relates to hydrofluorolefin compositions useful for removing surface deposits in CVD chambers, and relates to methods for removing...
2016/0284522 UPPER ELECTRODE, EDGE RING, AND PLASMA PROCESSING APPARATUS
According to one embodiment, an upper electrode to be arranged opposite to a lower electrode and serving as a shower head in a plasma processing apparatus of a...
2016/0284521 SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD
In one embodiment, a semiconductor manufacturing apparatus includes a housing configured to house a substrate, and a first temperature regulator configured to...
2016/0284520 MULTI-APERTURE EXTRACTION SYSTEM FOR ANGLED ION BEAM
An apparatus for creating an angled ion beam for implanting into a substrate is disclosed. The apparatus includes a plasma chamber in which plasma is created....
2016/0284519 PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A MICROWAVE FIELD WITH DIRECT UP-CONVERSION
A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a...
2016/0284518 Improved Ways to Generate Plasma in Continuous Power Mode for Low Pressure Plasma Processes
The present invention concerns a method comprising the steps of: introducing a substrate comprising a surface to be coated in a low-pressure reaction chamber;...
2016/0284517 Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory...
A technology for forming a uniform film in a plane of a substrate involves a substrate processing apparatus including: a substrate support where a substrate is...
2016/0284516 MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
A microwave plasma source for forming a surface wave plasma by radiating a microwave into a chamber of a plasma processing apparatus, which includes: a...
2016/0284515 ROLL-TO-ROLL PATTERNING OF TRANSPARENT AND METALLIC LAYERS
Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing...
2016/0284514 POWER SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD
A power supply system includes a high frequency power supply which supplies a high frequency power; a DC power supply which supplies a first negative DC...
2016/0284513 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PARTICLE BEAM WRITING METHOD
A multi charged particle beam writing apparatus includes a dividing circuitry to divide first irradiation time data into k pieces of second irradiation time...
2016/0284511 Lathe Head for Nano/Micro Machining of Materials
Apparatus, methods and systems for nano/micro machining. A lathe head has a microscopic pivot aperture for seating a conical tip. The conical tip is carried on...
2016/0284510 CHARGED PARTICLE BEAM DRAWING APPARATUS AND DRAWING DATA GENERATION METHOD
In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control...
2016/0284509 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
A charged particle beam writing apparatus includes an enlarged pattern forming circuitry to form an enlarged pattern by enlarging a figure pattern to be...
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