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Patent # Description
2016/0291489 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS
Provided is an electrophotographic photosensitive member including a support, an undercoat layer, and a photosensitive layer in this order, in which: the...
2016/0291488 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS
The present invention provides an electrophotographic photosensitive member including a support, and a photosensitive layer on the support. The photosensitive...
2016/0291487 ELECTROPHOTOGRAPHIC MEMBER, METHOD FOR PRODUCING SAME, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS
The electrophotographic member includes an electro-conductive substrate and an electro-conductive resin layer as the surface layer on the substrate. The...
2016/0291486 IMPRINTING APPARATUS, METHOD OF CREATING DATA ON MATERIAL DISTRIBUTION, IMPRINTING METHOD, AND ARTICLE...
Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus...
2016/0291485 IMPRINTING APPARATUS, IMPRINTING METHOD, AND ARTICLE MANUFACTURING METHOD
Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus...
2016/0291484 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage by irradiating a measurement beam using four...
2016/0291483 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
An immersion-type exposure apparatus includes a measurement area for measuring a substrate, an exposure area, which differs from the measurement area, for...
2016/0291482 EUV focus monitoring systems and methods
Systems and methods for monitoring the focus of an EUV lithography system are disclosed. Another aspect includes a method having operations of measuring a...
2016/0291481 Method, Apparatus and Substrates for Lithographic Metrology
A substrate has three or more overlay gratings formed thereon by a lithographic process. Each overlay grating has a known overlay bias. The values of overlay...
2016/0291480 Method for Regulating a Light Source of a Photolithography Exposure System and Exposure Assembly for a...
The invention relates to a method for regulating a light source of a photolithography exposure system which comprises a plurality of LEDs, by means of the...
2016/0291479 Inspection Apparatus for Measuring Properties of a Target Structure, Methods of Operating an Optical System,...
An inspection apparatus (for example a scatterometer) comprises: a substrate support for supporting a substrate and an optical system. An illumination system...
2016/0291478 CATALYTIC PHOTORESIST FOR PHOTOLITHOGRAPHIC METAL MESH TOUCH SENSOR FABRICATION
A catalytic photoresist composition includes a negative photoresist component and a catalyst component that includes catalytic nanoparticles. The negative...
2016/0291477 SURFACE TREATMENT PROCESS AND SURFACE TREATMENT LIQUID
A surface treatment liquid that can effectively prevent pattern collapse of, in particular, a silicon pattern and a surface treatment process using the surface...
2016/0291476 FIELD GUIDED POST EXPOSURE BAKE APPLICATION FOR PHOTORESIST MICROBRIDGE DEFECTS
Embodiments described herein generally relate to methods for mitigating patterning defects. More specifically, embodiments described herein relate to utilizing...
2016/0291475 PHOTOSENSITIVE RESIN COMPOSITION FOR DRY ETCHING, AND METHOD FOR PRODUCING RESIST PATTERN FOR DRY ETCHING
A photosensitive resin composition for dry etching including a water-soluble resin, a photopolymerizable monomer, and a photopolymerization initiator, and a...
2016/0291474 EXPOSURE DOSE HOMOGENIZATION THROUGH ROTATION, TRANSLATION, AND VARIABLE PROCESSING CONDITIONS
A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be...
2016/0291473 PORTABLE IMAGE-FORMING DEVICE
A portable image-forming device includes a housing, an exposure member for exposing an instant film disposed inside of the housing by means of a light...
2016/0291472 HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION
A hardmask composition may include graphene nanoparticles having a size in a range of about 5 nm to about 100 nm and a solvent.
2016/0291471 LAMINATED STRUCTURE
A laminated structure for use as a thy film photoresist, which includes a supporting layer, a photosensitive resin layer and a protective layer. The protective...
2016/0291470 PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM
A photosensitive polysiloxane composition having good adhesion during development, a protective film, and an element having the protective film are provided....
2016/0291469 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article...
2016/0291468 PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD
A photosensitive transfer material including a support and a photosensitive resin composition layer, in which the photosensitive resin composition layer...
2016/0291467 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a...
2016/0291466 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A resist composition contains: a resin having an acid-labile group, an acid generator, a compound having two or more phenolic-hydroxy groups and being other...
2016/0291465 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: ...
2016/0291464 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an...
2016/0291463 LIGHT-CURABLE IMPRINTING-RESIN COMPOSITION AND ANTI-REFLECTIVE FILM
An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern...
2016/0291462 PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
A pattern-forming method comprises forming a prepattern that is insoluble or hardly soluble in an organic solvent. A first composition is applied on at least...
2016/0291461 PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK...
There are provided a pattern forming method in which, in self-organization lithography using a graphoepitaxy method, high miniaturization of patterns can be...
2016/0291460 PELLICLE
There is provided a pellicle wherein the pellicle frame is formed with a protrusion which extends either inward or outward from the pellicle frame so that an...
2016/0291459 PHOTOMASK INCLUDING TRANSFER PATTERNS FOR REDUCING A THERMAL STRESS
A photomask includes a light transmission substrate, and a transfer pattern disposed over the light transmission substrate, a shape of the transfer pattern...
2016/0291458 METHOD INTEGRATING TARGET OPTIMIZATION AND OPTICAL PROXIMITY CORRECTION
A method integrating target optimization and optical proximity correction including: fragmenting sides of a target pattern in the metal layer to form a...
2016/0291457 RETICLE, SYSTEM COMPRISING A PLURALITY OF RETICLES AND METHOD FOR THE FORMATION THEREOF
A method includes providing a pre-optical proximity correction (OPC) layout of at least a portion of at least one reticle. The pre-OPC layout defines a test...
2016/0291456 HALFTONE PHASE SHIFT MASK BLANK, HALFTONE PHASE SHIFT MASK, AND PATTERN EXPOSURE METHOD
In a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon, the halftone phase shift film is composed of a...
2016/0291455 METHOD FOR PREPARING HALFTONE PHASE SHIFT PHOTOMASK BLANK
A halftone phase shift film containing Si and N and/or O is deposited on a transparent substrate by reactive sputtering using a silicon-containing target with...
2016/0291454 METHOD FOR PREPARING HALFTONE PHASE SHIFT PHOTOMASK BLANK
A halftone phase shift film containing Si and N and/or O is deposited on a transparent substrate by reactive sputtering of a Si-containing target with a...
2016/0291453 PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND BLANK PREPARING METHOD
In a phase shift mask blank comprising a transparent substrate and a phase shift film deposited thereon and having a phase shift of 150-200.degree. with...
2016/0291452 HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
A halftone phase shift mask blank is provided comprising a transparent substrate and a halftone phase shift film which is composed of a silicon base material...
2016/0291451 PHASE SHIFT BLANKMASK AND PHOTOMASK
Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14...
2016/0291450 Mounted lenticular grating with parallax ghosting mitigation for many-frame animation
Parallax ghosting is mitigated in a mounted lenticular grating with for many-frame animation by having lenticules at an offset angle .alpha. relative to the...
2016/0291449 COOLING STRUCTURE, LIGHTING OPTICAL SYSTEM, PROJECTION-TYPE DISPLAY APPARATUS, AND COOLING METHOD
A cooling structure includes a phosphor unit, air-blowing systems that cause cooling air to flow, and a duct structure. The phosphor unit includes a substrate...
2016/0291448 PROJECTOR WITH ADJUSTABLE SUPPORT
A projector includes a power source accommodation section and a projection section body. The power source accommodation section is supported by a duct and...
2016/0291447 Light Containment and Control Device
A light control device comprising a grid formed from a plurality of non-overlapping fabric ribbons positioned perpendicular to the plane defined by the grid;...
2016/0291446 TURNTABLE WITH LIGHT TRANSMISSION ROUND PLATTER AND LIGHT COLLECTION SPINDLE
A turntable with a light transmission round platter and at least one light collection spindle is provided. The light transmission round platter connects to the...
2016/0291445 MINIATURE STABILIZED UNMANNED AERIAL VEHICLE GIMBAL
Embodiments discussed herein provide improved control of an unmanned aerial vehicle camera gimbal. In some embodiments, a linear control circuit is described...
2016/0291444 ENCLOSURE DEVICE
In one embodiment of an enclosure device, a camera casing and light source casing are secured to a plate frame, and the enclosure device is configured to be...
2016/0291443 CASCADED OPTICAL HARMONIC GENERATION
A cascaded harmonic generator, for cascaded optical harmonic generation from an optical beam provided by a laser source, may include a second harmonic...
2016/0291442 QUANTUM WAVE-CONVERTER
A plug-and-play fiber-coupled nonlinear optical quantum wave-converter, optimized for quantum communications, comprises a commercial periodically-poled,...
2016/0291441 ELECTROPHORETIC DISPLAY DEVICE AND ELECTRONIC APPARATUS
Provided is an electrophoretic display device in which a partitioning wall is provided between a first substrate and a second substrate, a dispersion liquid is...
2016/0291440 CONTROLLABLE LIGHT-TRANSMISSIVE ELEMENT
The present invention relates to a light-transmissive element (106, 200, 500) which has light controlling properties. The light-transmissive element (106, 200,...
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