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Patent # Description
2016/0300748 CONVEYANCE EQUIPMENT
Conveyance equipment for conveying a plate-like member includes plural items of liquid discharging equipment that hold the member by discharging liquid to...
2016/0300747 Debonding Temporarily Bonded Semiconductor Wafers
Described methods and apparatus provide a controlled perturbation to an adhesive bond between a device wafer and a carrier wafer. The controlled perturbation,...
2016/0300746 ELECTROSTATIC CHUCK
An electrostatic chuck according to an embodiment is an electrostatic chuck for adsorbing an object. The electrostatic chuck includes a base body having a...
2016/0300745 SEMICONDUCTOR LIGHT EMITTING DEVICE, TRANSFER HEAD OF SEMICONDUCTOR LIGHT EMITTING DEVICE, AND METHOD OF...
A method of transferring a semiconductor light emitting device, and which includes positioning a transfer head having a head electrode facing a semiconductor...
2016/0300744 MOISTURE AND/OR ELECTRICALLY CONDUCTIVE REMAINS DETECTION FOR WAFERS AFTER RINSE / DRY PROCESS
A method, device, and apparatus is provided for detecting moisture and/or electrically conductive remains on a wafer after the wafer is removed from a drying...
2016/0300743 LOW TEMPERATURE THIN WAFER BACKSIDE VACUUM PROCESS WITH BACKGRINDING TAPE
Vacuum processing, such as a backside metallization (BSM) deposition, is performed on a taped wafer after a gas escape path is formed between a base film of...
2016/0300742 SEALING MECHANISM, DRIVE UNIT OF SEALING MECHANISM, CONVEYANCE DEVICE, AND MANUFACTURING DEVICE
A sealing mechanism functioning as a separator between two spaces having different pressures includes: a housing; a shaft inserted into the housing; an annular...
2016/0300741 SUBSTRATE SUPPORT WITH THERMAL ZONES FOR SEMICONDUCTOR PROCESSING
A substrate support in a semiconductor plasma processing apparatus, comprises multiple independently controllable thermal zones arranged in a scalable...
2016/0300740 Cassette and Substrate Transfer Device
A cassette and a substrate transfer device are disclosed. The cassette includes a first frame and at least one movable face. The first frame includes at least...
2016/0300739 PLASMA PROCESSING METHOD
Disclosed is a plasma processing device that provides an object to be treated with plasma treatment. A wafer as an object to be treated, which is attached on...
2016/0300738 Plasma Generation and Control Using a DC Ring
The present invention provides a SWP (surface wave plasma) processing system that does not create underdense conditions when operating at low microwave power...
2016/0300737 Airflow Control Device and Method of Adjusting the Same, Substrate Cleaning Device
The present invention discloses an airflow control device and a method of adjusting the same, a substrate cleaning device. The airflow control device is...
2016/0300736 PROCESSING APPARATUS
A processing apparatus of an embodiment includes a stage that can have a sample placed thereon, a rotation mechanism that rotates the stage, a first nozzle...
2016/0300735 PURGE DEVICES HAVING MICRONOZZLES AND OPERATING METHODS THEREOF
The present invention provides purge devices having micronozzles and operating methods thereof. The purge device having micronozzles are operated to clean...
2016/0300734 SUBSTRATE PROCESSING SYSTEM
A substrate processing system includes a first processing block, a second processing block, and a reversing device. The first processing block includes a first...
2016/0300733 SEALING SHEET WITH SEPARATORS ON BOTH SURFACES, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
A sealing sheet with separators on both surfaces is provided with a sealing sheet, a separator (A) stacked on one surface of the sealing sheet and having a...
2016/0300732 METHOD FOR PRODUCING SUBSTRATE FOR SEMICONDUCTOR ELEMENT MOUNTING
A process of forming, on a surface of the substrate a plurality of resist layers made of two kinds of dry film resist that differ in main peak wavelength in...
2016/0300731 METHODS OF ETCHBACK PROFILE TUNING
A method of controlling an etch profile includes introducing a tungsten containing gas into a processing chamber; depositing a first tungsten film lining...
2016/0300730 Cu-Low K Cleaning and Protection Compositions
This disclosure relates post chemical mechanical planarization cleaning composition of semiconductor substrate for advanced electronics fabrication and...
2016/0300729 Methods and Apparatus for Deuterium Anneal of Multi-Layered Semiconductor Structure
Methods and apparatus for passivation of semiconductor interfaces by deuterium annealing are described. Harmonic improvements after deuterium annealing of a...
2016/0300728 PLASMA ETCHING METHOD, PATTERN FORMING METHOD AND CLEANING METHOD
A plasma etching method is performed by forming a desired pattern of a mask into a film including a zirconium oxide film by plasma etching with plasma...
2016/0300727 SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus includes a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto the upper surface of a substrate...
2016/0300726 System and Method for Planarizing a Substrate
Techniques include providing selective or differential planarization such that different regions of a substrate can have different amounts of material removed....
2016/0300725 ADVANCED ETCHING TECHNOLOGIES FOR STRAIGHT, TALL AND UNIFORM FINS ACROSS MULTIPLE FIN PITCH STRUCTURES
Embodiments of the invention describe semiconductor devices with high aspect ratio fins and methods for forming such devices. According to an embodiment, the...
2016/0300724 Oxide-Nitride-Oxide Stack Having Multiple Oxynitride Layers
A semiconductor device including an oxide-nitride-oxide (ONO) structure having a multi-layer charge storing layer and methods of forming the same are provided....
2016/0300723 CYCLIC DEPOSITION METHOD FOR THIN FILM AND MANUFACTURING METHOD FOR SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE
Provided is a method of cyclically depositing a thin film including: performing an oxide depositing operation of repeatedly performing a deposition operation,...
2016/0300722 SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC
Oxide growth of a gate dielectric layer that occurs between processes used in the fabrication of a gate dielectric structure can be reduced. The reduction in...
2016/0300721 WORK FUNCTION METAL FILL FOR REPLACEMENT GATE FIN FIELD EFFECT TRANSISTOR PROCESS
A method of forming a semiconductor device that includes forming a sacrificial gate structure on a channel portion of a fin structure, wherein the angle at the...
2016/0300720 Gate Contact Structure of FinFET
An embodiment includes a substrate, wherein a portion of the substrate extends upwards forming a fin, a gate dielectric over a top surface and at least...
2016/0300719 Method of Manufacturing a Semiconductor Device Having a Rear-Side Insert Structure
A method of manufacturing a semiconductor device includes forming a cavity in a first semiconductor layer formed on a semiconducting base layer, the cavity...
2016/0300718 METHOD FOR INCREASING PATTERN DENSITY IN SELF-ALIGNED PATTERNING SCHEMES WITHOUT USING HARD MASKS
Provided is a method for increasing pattern density of a structure using an integration scheme and perform pitch splitting at the resist level without the use...
2016/0300717 SEMICONDUCTOR LAMINATE, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD THEREOF
Provided is a method for manufacturing a semiconductor device. Also provided are: a semiconductor device which can be obtained by the method; and a dispersion...
2016/0300716 METHOD OF FABRICATING CRYSTALLINE ISLAND ON SUBSTRATE
Certain electronic applications, such as OLED display back panels, require small islands of high-quality semiconductor material distributed over a large area....
2016/0300715 METHOD TO ENHANCE GROWTH RATE FOR SELECTIVE EPITAXIAL GROWTH
Embodiments of the present disclosure generally relate to methods for forming a doped silicon epitaxial layer on semiconductor devices at increased pressure...
2016/0300714 SYSTEM AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE
A method and apparatus for depositing a film on a substrate includes a plasma source positioned proximate to a distributor configured to provide a...
2016/0300713 ELIMINATING FIRST WAFER METAL CONTAMINATION EFFECT IN HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION SYSTEMS
Methods and apparatuses for conditioning chambers using a two-stage process involving a low bias and a high bias stage are provided. Methods also involve...
2016/0300712 APPARATUS AND METHOD FOR SELECTIVE OXIDATION AT LOWER TEMPERATURE USING REMOTE PLASMA SOURCE
Devices and methods for selectively oxidizing silicon are described herein. An apparatus for selective oxidation of exposed silicon surfaces includes a thermal...
2016/0300711 USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SELF-ASSEMBLY, AND SELECTIVE DEPOSITION
A method for treating a microelectronic substrate to form a chemical template includes patterning the substrate to form a trench structure with a plurality of...
2016/0300710 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
Disclosed is a substrate processing method that includes a water-repellency step, a rinse step, and a dry step. In the water-repellency step, a water-repellent...
2016/0300709 METHOD FOR FORMING SPACERS FOR A TRANSISTOR GATE
A method is provided for forming spacers for a gate of a field effect transistor, the gate being situated above a layer of semiconductor material, including...
2016/0300708 CHAMFERING APPARATUS AND METHOD FOR MANUFACTURING NOTCHLESS WAFER
A chamfering apparatus including chamfering part for removing notch, cleaning part for cleaning and drying wafer, and chamfered-shape measuring part for...
2016/0300707 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, and a chamber. The substrate rotating mechanism includes an...
2016/0300706 METHOD FOR FORMING COATING FILM FOR LITHOGRAPHY
The present invention provides a method for forming a coating film for a lithography, comprising the steps of: performing spin coating of a composition for...
2016/0300705 ULTRAVIOLET LIGHT EMITTING DEVICE
An ultraviolet light emitting device includes: a first substrate; a second substrate; a gas in a space between the first substrate and the second substrate;...
2016/0300704 ULTRAVIOLET LIGHT EMITTING DEVICE
An ultraviolet light emitting device comprises: a first substrate having a main surface; a second substrate facing the main surface of the first substrate; a...
2016/0300703 HYBRID ION SOURCE, MASS SPECTROMETER, AND ION MOBILITY DEVICE
Provided is an ion source achieving high sensitivity and high robustness while executing a plurality of types of ionization schemes. To this end, a hybrid ion...
2016/0300702 Automated Beam Check
A method of automatically performing a routine to check the operational state of a mass spectrometer is disclosed wherein the method is performed automatically...
2016/0300701 Photomultiplier Tube, Image Sensor, And An Inspection System Using A PMT Or Image Sensor
A system for inspecting a sample including a detector, either a photomultiplier tube or an electron-bombarded image sensor, that is positioned to receive light...
2016/0300700 Anode Shield
A sputter system and an anode and anode shield assembly that provide for improved grounding for extended sputter cycles.
2016/0300699 APPARATUS FOR OPTICAL EMISSION SPECTROSCOPY AND PLASMA TREATMENT APPARATUS
Disclosed is an apparatus for optical emission spectroscopy which includes a light measuring unit measuring light in a process chamber performing a plasma...
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