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Patent # Description
2016/0336204 CHAMBER FOR DEGASSING SUBSTRATES
A heater or cooler chamber for a batch of more than one workpiece includes a heat storage block. In the block a multitude of pockets are provided, whereby each...
2016/0336203 METHOD AND DEVICE FOR BONDING SUBSTRATES
A method and corresponding device for bonding a first contact surface of a first substrate to a second contact surface of a second substrate. The method...
2016/0336202 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM...
Disclosed is a substrate liquid processing apparatus that includes: a liquid processing unit that performs a liquid processing on a film formed on a surface of...
2016/0336201 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus is provided including: a liquid processing unit that processes a substrate with a processing liquid; a carry-in port formed in...
2016/0336200 METHOD AND SYSTEM FOR PROCESSING SUBSTRATE IN SEMICONDUCTOR FABRICATION
A method of processing a substrate in semiconductor fabrication is provided. The method includes supplying a mixture to a process module. The method further...
2016/0336199 RESIN MOLDED ARTICLE, AND MANUFACTURING METHOD FOR SAME
A surface boundary is formed between a sealed surface of a thermosetting resin member and a thermoplastic resin member to seal the sealed surface. A newly...
2016/0336198 Barrier Configurations and Processes in Layer Structures
This invention relates generally to ID frequency identification (RFID) transponders and receivers. More specifically to the methods, apparatus and systems of...
2016/0336197 METHOD OF PROCESSING WORKPIECE
A method according to an embodiment includes (i) a step of preparing a workpiece in a processing container of a plasma processing apparatus, (ii) a first...
2016/0336196 APPARATUS AND METHOD FOR REMOVING PARTICLES PRESENT ON A WAFER USING PHOTOELECTRONS AND AN ELECTRIC FIELD
A wafer processing apparatus includes a particle charger for charging particles adsorbed onto a wafer with photoelectrons emitted from an emitter metal layer...
2016/0336195 LIGHT-IRRADIATION HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
A plurality of flash lamps that irradiate a semiconductor wafer with flash light are arrayed in a plane. The array of the plurality of flash lamps is divided...
2016/0336194 METHOD OF FORMING SEMICONDUCTOR DEVICE
A method of forming a semiconductor device includes following steps. First of all, a first work function layer is formed on a substrate. Next, a first...
2016/0336193 METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
A method of forming a pattern, the method including forming a mask layer on a feature layer on a substrate; forming guides regularly arranged with a first...
2016/0336192 METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
A method of forming a pattern including forming a feature layer on a substrate having first and second regions; forming a first guide pattern on the first...
2016/0336191 ETCHING METHOD
The etching method of one embodiment includes a first step of generating a plasma of a first processing gas containing a fluorocarbon gas and a ...
2016/0336190 FILM FORMING METHOD AND HEAT TREATMENT APPARATUS
Provided is a method for forming a low dielectric constant film on a substrate placed in a processing chamber inside a processing container. The method...
2016/0336189 ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
An organic film composition including a compound represented by the following general formula (1), ##STR00001## wherein n1 and n2 each independently represent 0...
2016/0336188 SEMICONDUCTOR-WAFER CLEANING TANK AND METHOD OF MANUFACTURING BONDED WAFER
The present invention is a semi conductor-wafer cleaning tank in which semiconductor wafers are immersed in a cleaning solution and cleaned, including a tank...
2016/0336187 METHOD OF FORMING SEMICONDUCTOR STRUCTURE
A method of forming a semiconductor structure includes following steps. First of all, a plurality of mandrels is formed on a target layer. Next, a plurality of...
2016/0336186 Multiple Directed Self-Assembly Patterning Process
Disclosed is a method of forming a target pattern for a semiconductor device using multiple directed self-assembly (DSA) patterning processes. The method...
2016/0336185 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
A plasma processing apparatus includes a plasma processing chamber processing a sample using plasma, a radio frequency power supply supplying radio frequency...
2016/0336184 Electronic Device Including A Material Defining A Void And A Process Of Forming The Same
An electronic device can include one or more trenches that include a material that defines one or more voids. In an embodiment, the substrate defines a first...
2016/0336183 METHODS, APPARATUS AND SYSTEM FOR FABRICATING FINFET DEVICES USING CONTINUOUS ACTIVE AREA DESIGN
At least one method, apparatus and system disclosed herein for processing a semiconductor wafer using a continuous active area design for manufacturing a...
2016/0336182 Floating Gate Separation in NAND Flash Memory
A method of forming a NAND flash memory includes anisotropically etching trenches of a gate stack down to an intermediate level in a floating gate polysilicon...
2016/0336181 METHOD FOR TUNING METAL GATE WORK FUNCTION BEFORE CONTACT FORMATION IN FIN-SHAPPED FIELD EFFECT TRANSISTOR...
The present invention provides a method for metal gate work function tuning before contact formation in a fin-shaped field effect transistor (FinFET), where in...
2016/0336180 METHOD FOR ETCHING HIGH-K METAL GATE STACK
A method for etching a gate includes forming a high-k material layer over a substrate; forming an overlying layer over the high-k material layer; performing a...
2016/0336179 PLATING METHOD AND RECORDING MEDIUM
An electroless plating process is performed on an Al layer, which is made of aluminum or an aluminum alloy, with an electroless plating liquid which is...
2016/0336178 PLASMA ASSISTED ATOMIC LAYER DEPOSITION OF MULTI-LAYER FILMS FOR PATTERNING APPLICATIONS
Methods and apparatus for depositing nanolaminate films are provided. In various embodiments, the nanolaminate film may be deposited over a core layer, which...
2016/0336177 Semiconductor Devices and Methods of Manufacture Thereof
A method of manufacturing a semiconductor device may include: forming an opening in an insulating layer to expose a portion of a major surface of a substrate,...
2016/0336176 METHOD AND STRUCTURE FOR FORMING A DENSE ARRAY OF SINGLE CRYSTALLINE SEMICONDUCTOR NANOCRYSTALS
A dense array of semiconductor single crystalline semiconductor nanocrystals is provided in the present application by forming an amorphous semiconductor...
2016/0336175 METHOD AND APPARATUS FOR FORMING OXIDE THIN FILM
Disclosed is a method for forming an oxide thin film on a solid substrate, the method including the steps of placing a solid substrate s a in a reaction...
2016/0336174 DEPOSITION OF SILICON AND OXYGEN-CONTAINING FILMS WITHOUT AN OXIDIZER
A silicon and oxygen-containing film, such as a silicon dioxide film, is deposited in the absence of an oxidizer by introducing siloxane precursors into a...
2016/0336173 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
The reliability of a semiconductor device is improved. In a manufacturing method, a film to be processed is formed over a circular semiconductor substrate, and...
2016/0336172 LITHOGRAPHY STACK AND METHOD
Lithography stack, intermediate semiconductor devices, and methods of fabrication are provided. The method includes obtaining an intermediate semiconductor...
2016/0336171 METHOD FOR VERTICAL AND LATERAL CONTROL OF III-N POLARITY
Disclosed herein is a method of: depositing a patterned mask layer on an N-polar GaN epitaxial layer of a sapphire, silicon, or silicon carbide substrate;...
2016/0336170 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a first nozzle that ejects droplets of a chemical liquid toward a...
2016/0336169 LIQUID FILLING METHOD
A large number of pattern elements stands upright on an upper surface of a substrate. After the upper surface of the substrate has been processed using a...
2016/0336168 Laser Driven Sealed Beam Lamp With Improved Stability
A sealed high intensity illumination device configured to receive a laser beam from a laser light source and method for making the same are disclosed. The...
2016/0336167 Electrodeless Single CW Laser Driven Xenon Lamp
An ignition facilitated electrodeless sealed high intensity illumination device is disclosed. The device is configured to receive a laser beam from a...
2016/0336166 ANALYSER ARRANGEMENT FOR PARTICLE SPECTROMETER
The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample, e.g. a...
2016/0336165 Multiplexed Electrostatic Linear Ion Trap
Systems and methods are provided for performing multiplex electrostatic linear ion trap mass spectrometry. A first beam of ions is received and the first beam...
2016/0336164 Systems and Methods for Ion Isolation
A mass spectrometer includes a radio frequency ion trap and a controller. The controller is configured to cause an ion population to be injected into the radio...
2016/0336163 Systems and Methods for Ion Isolation Using a Dual Waveform
A mass spectrometer includes a radio frequency ion trap; and a controller. The controller is configured to cause an ion population to be injected into the...
2016/0336162 TIME INTERVAL MEASUREMENT
A technique for time interval measurement is provided. First and second signal components are received, sampled and digitized. The first signal component is...
2016/0336161 Time-of-Flight Analysis of a Continuous Beam of Ions by a Detector Array
Systems and methods are provided for time-of-flight analysis of a continuous beam of ions by a detector array. A sample is ionized using an ion source to...
2016/0336160 Ion Guide for Mass Spectrometry
Methods and systems for transmitting ions in an ion guide are provided herein. In accordance with various aspects of the applicant's teachings, the methods and...
2016/0336159 FIELD ASYMMETRIC ION MOBILITY SPECTROMETRY FILTER
Ion filter for FAIMS fabricated using the LIGA technique. The ion filter is manufactured using a metal layer to form the ion channels and an insulating support...
2016/0336158 SYSTEMS AND METHODS FOR DELIVERING LIQUID TO AN ION SOURCE
Methods and systems for delivering a liquid sample to an ion source are provided herein: In various aspects, the methods and systems described herein can...
2016/0336157 Auxiliary Gas Inlet
There is provided a method of introducing ions into a mass spectrometer, comprising ionising a sample using a Matrix Assisted Laser Desorption Ionisation...
2016/0336156 Auxiliary Gas Inlet
There is provided a method of introducing ions into a mass spectrometer, comprising ionising a sample using a continuous ionisation source to form a plurality...
2016/0336155 COBALT, IRON, BORON, AND/OR NICKEL ALLOY-CONTAINING ARTICLES AND METHODS FOR MAKING SAME
Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X.dbd.B, C, Al), Fe, FeNi,...
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