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Patent # Description
2016/0343583 Method of laser annealing a semiconductor wafer with localized control of ambient oxygen
Laser annealing of a semiconductor wafers using a forming gas for localized control of ambient oxygen gas to reduce the amount of oxidization during laser...
2016/0343582 APPARATUS FOR ADVANCED PACKAGING APPLICATIONS
The embodiments disclosed herein pertain to novel methods and apparatus for removing material from a substrate. In certain embodiments, the method and...
2016/0343581 UNIFORM, DAMAGE FREE NITRIDE ETCH
An integrated circuit may be formed by forming a sacrificial silicon nitride feature. At least a portion of the sacrificial silicon nitride feature may be...
2016/0343580 TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYLINDER ETCH
Various embodiments herein relate to methods, apparatus and systems for forming a recessed feature in dielectric material on a semiconductor substrate....
2016/0343579 CHAMBER CLEANING AND SEMICONDUCTOR ETCHING GASES
The present invention relates to fluoroolefin compositions useful as gases for CVD semiconductor manufacture, particularly for etching applications including...
2016/0343578 METHODS AND APPARATUS FOR FORMING A RESIST ARRAY USING CHEMICAL MECHANICAL PLANARIZATION
Methods, apparatus, and systems are provided for forming a resist array on a material to be patterned using chemical-mechanical planarization. The resist array...
2016/0343577 Methods for Manufacturing Semiconductor Devices
A method for forming a semiconductor device includes providing a semiconductor substrate having an upper side and comprising, in a vertical cross-section...
2016/0343576 FORMULATIONS TO SELECTIVELY ETCH SILICON AND GERMANIUM
Compositions useful for the selective removal of silicon-containing materials relative to germanium-containing materials, and vice versa, from a...
2016/0343575 METHOD OF FABRICATING PATTERN STRUCTURE
A method includes forming mask patterns spaced apart from each other by at least one opening on an etch target layer, filling the opening with a block...
2016/0343574 Segmented Edge Protection Shield
A segmented edge protection shield for plasma dicing a wafer. The segmented edge protection shield includes an outer structure and a plurality of plasma shield...
2016/0343573 SEMICONDUCTOR DEVICE HAVING ELECTRODE MADE OF HIGH WORK FUNCTION MATERIAL, METHOD AND APPARATUS FOR...
Provided is a semiconductor device including a metal film which can be formed with lower costs but still manage to have a necessary work function and oxidation...
2016/0343572 METALLIZED JUNCTION FINFET STRUCTURES
FinFET devices are provided wherein the current path is minimized and mostly limited to spacer regions before the channel carriers reach the metal contacts....
2016/0343571 Method for removing dielectric layers from semiconductor components by using a laser beam
A method for removing dielectric layers from semiconductor components by way of a laser beam. The dielectric layer is irradiated with a laser beam which has,...
2016/0343570 SILICON CARBIDE SUBSTRATE AND METHOD FOR PRODUCING SILICON CARBIDE SUBSTRATE
A silicon carbide substrate includes a Si substrate (silicon substrate), a SiC base film (silicon carbide base film) which is stacked on the Si substrate and...
2016/0343569 METHOD FOR FORMING POLYSILICON
A method for forming polysilicon on a semiconductor substrate that include providing amorphous silicon on a semiconductor substrate, exposing at least an area...
2016/0343568 METHOD FOR FORMING SURFACE OXIDE LAYER ON AMORPHOUS SILICON
The invention provides a method for forming a surface oxide layer on an amorphous silicon including steps: using a HF acid to clean a surface of the amorphous...
2016/0343567 METHOD OF FORMING NON-CONTINUOUS LINE PATTERN AND NON-CONTINUOUS LINE PATTERN STRUCTURE
A method of forming a non-continuous line pattern includes forming a DSA material layer on a substrate, performing a phase separation of the DSA material layer...
2016/0343566 SUBSTRATE WITH CRYSTALLIZED SILICON FILM AND MANUFACTURING METHOD THEREOF
The present invention relates to a substrate with a crystallized silicon film and manufacturing method thereof, wherein the substrate with the crystallized...
2016/0343565 SUBSTRATE CLEANING METHOD FOR REMOVING OXIDE FILM
It was found out that when radicals generated by plasma are fed to a treatment chamber via a plurality of holes (111) formed on a partition plate which...
2016/0343564 EDGE TRIM PROCESSES AND RESULTANT STRUCTURES
Edge trim processes in 3D integrated circuits and resultant structures are provided. The method includes trimming an edge of a wafer at an angle to form a...
2016/0343563 ION TRAP WITH VARIABLE PITCH ELECTRODES
Methods, apparatuses, and systems for design, fabrication, and use of an ion trap with variable pitch electrodes are described herein. One apparatus includes...
2016/0343562 TANDEM QUADRUPOLE MASS SPECTROMETER
A dwell time calculation table (51a) showing a correspondence relation between a CID gas pressure inside a collision cell (31) and a dwell time for data...
2016/0343561 Electrostatic Mass Spectrometer With Encoded Frequent Pulses
A method, apparatus and algorithms are disclosed for operating an open electrostatic trap (E-trap) or a multi-pass TOF mass spectrometer with an extended...
2016/0343560 Analytical Apparatus Utilizing Electron Impact Ionization
An analytical apparatus for mass spectrometry comprises an electron impact ionizer including an electron emitter and an ionization target zone. The target zone...
2016/0343559 Coupling device for mass spectrometry apparatus
An object of the present invention is to provide a technology that enables highly sensitive atmospheric-pressure real-time mass spectrometry of a volatile...
2016/0343558 TANDEM MASS SPECTROMETRY DATA PROCESSING SYSTEM
A composition formula of each precursor ion located on a measured mass spectrum is estimated from the m/z value of the precursor ion (S11). A composition...
2016/0343557 TANDEM MASS SPECTROMETRY DATA PROCESSING SYSTEM
Peak information is collected from an MS/MS spectrum in which the product ions generated from ions originating from a plurality of compounds are mixed. Using...
2016/0343556 Setting Ion Detector Gain Using Ion Area
A control system and method of determining a signal to noise (S/N) ratio of an ion detector system, including an ion detector, electron multiplier or...
2016/0343555 CLAMP AND CARRIER USED IN A COATING APPARATUS
The present disclosure provides a clamp and a carrier used in a coating apparatus. The clamp includes a fixed clamping piece and a movable clamping piece...
2016/0343554 OXIDE SINTERED BODY, METHOD FOR PRODUCING SAME AND SPUTTERING TARGET
An oxide sintered body comprising a bixbyite phase composed of In.sub.2O.sub.3 and an A.sub.3B.sub.5O.sub.12 phase (wherein A is one or more elements selected...
2016/0343553 GOLD OR PLATINUM TARGET, AND PRODUCTION METHOD FOR SAME
Method of producing a target having a small average crystal grain size of gold or platinum and having a uniform crystal grain size in an in-plane direction of...
2016/0343552 DEPOSITION OF SOLID STATE ELECTROLYTE ON ELECTRODE LAYERS IN ELECTROCHEMICAL DEVICES
Methods and apparatus are described for improving the fabrication of thin film electrochemical devices such as thin film batteries and electrochromic devices,...
2016/0343551 SPUTTERING TARGET
Objects of the present invention consist in achievement of both of elongation of life of a sputtering target as well as uniformity of a thickness of a...
2016/0343550 END BLOCK ASSEMBLY, BEARING ASSEMBLY, AND METHOD FOR MANUFACTURING A BEARING ASSEMBLY
In various embodiments, an end block assembly for rotatably mounting a tubular electrode in a processing chamber is provided. The end block assembly includes a...
2016/0343549 Monitoring a Discharge in a Plasma Process
Systems and methods of monitoring a discharge in a plasma process are disclosed. The methods include supplying the plasma process with a periodic power supply...
2016/0343548 SYSTEMS AND METHODS FOR PROVIDING CHARACTERISTICS OF AN IMPEDANCE MATCHING MODEL FOR USE WITH MATCHING NETWORKS
Systems and methods for generating and using characteristics of an impedance matching model with different impedance matching networks are described impedances...
2016/0343547 SUBSTRATE-PROCESSING SYSTEM AND METHOD OF COATING CARBON-PROTECTION LAYER THEREFOR
Provided is a substrate processing system including a plasma processing module and a protection layer coated on the plasma processing module. The protection...
2016/0343546 PLASMA POWER SUPPLY UTILIZING IGNITION CIRCUIT WITH BYPASS SWITCH WITH REACTIVE IMPEDANCE
The disclosed invention reduces current in the ignition circuit during normal operation (after ignition) by redirecting portion of the plasma current via a...
2016/0343545 Textured Silicon Liners In Substrate Processing Systems
Substrate processing systems, such as ion implantation systems, deposition systems and etch systems, having textured silicon liners are disclosed. The silicon...
2016/0343544 PLASMA ETCHING APPARATUS
A plasma etching apparatus includes: a vacuum chamber; a rotatable electrostatic chuck table for holding a workpiece in the vacuum chamber; a nozzle for...
2016/0343543 APPARATUS FOR MANUFACTURING TEMPLATE AND METHOD FOR MANUFACTURING TEMPLATE
According to one embodiment, an apparatus for manufacturing a template includes a vacuum chamber, an electrode and an adjustor. The vacuum chamber includes an...
2016/0343542 CHARGED PARTICLE BEAM APPARATUS, SPECIMEN OBSERVATION SYSTEM AND OPERATION PROGRAM
For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation...
2016/0343541 CROSS-SECTION PROCESSING-AND-OBSERVATION METHOD AND CROSS-SECTION PROCESSING-AND-OBSERVATION APPARATUS
A cross-section processing-and-observation method includes: a cross-section exposure step of irradiating a sample with a focused ion beam to expose a...
2016/0343540 Method of Improving Quality of Scanning Charged Particle Microscope Image, and Scanning Charged Particle...
A scanning charged particle microscope apparatus includes image quality improvement unit which performs an image quality improvement process on image data...
2016/0343539 PROTECTIVE AGENT FOR ELECTRON MICROSCOPIC OBSERVATION OF BIOLOGICAL SAMPLE IN WATER-CONTAINING STATE, KIT FOR...
Provided are a protective agent for electron microscopic observation in a vacuum which can protect a biological sample in a water-containing state, such as a...
2016/0343538 ELECTRON SCANNING MICROSCOPE AND IMAGE GENERATION METHOD
In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical...
2016/0343537 ELECTRON BEAM MICROSCOPE WITH IMPROVED IMAGING GAS AND METHOD OF USE
Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle...
2016/0343536 METHOD AND DEVICE FOR MANIPULATING PARTICLE BEAM
A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase...
2016/0343535 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD
In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a...
2016/0343534 System and Method for Calibrating Charge-Regulating Module
This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module...
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