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Patent # Description
2016/0358789 APPARATUS FOR DECREASING SUBSTRATE TEMPERATURE NON-UNIFORMITY
Embodiments of the present disclosure provide a cover assembly that includes a cover having a plurality of ports, and each port has a diameter of less than 1...
2016/0358788 METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DISTORTIONS
A method includes forming a material layer over a substrate, forming a first hard mask (HM) layer over the material layer, forming a first trench, along a...
2016/0358787 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
In accordance with an embodiment, a manufacturing method of a semiconductor device includes: respectively forming a first layer and a second layer at the top...
2016/0358786 Techniques for Spin-on-Carbon Planarization
Systems and methods for SOC planarization are described. In an embodiment, an apparatus for SOC planarization includes a substrate holder configured to support...
2016/0358785 METHOD FOR SELECTIVE UNDER-ETCHING OF POROUS SILICON
A method for making a solar cell is disclosed. In accordance with the method of the present invention a composite wafer is formed. The composite layer includes...
2016/0358784 PLASMA-ENHANCED ETCHING IN AN AUGMENTED PLASMA PROCESSING SYSTEM
Methods for etching a substrate in a plasma processing chamber having at least a primary plasma generating region and a secondary plasma generating region...
2016/0358783 METHOD AND DEVICE FOR TEXTURING A SILICON SURFACE
A method for texturing at least one substrate surface of at least one crystalline silicon substrate includes etching the substrate surface with fluorine gas in...
2016/0358782 ATOMIC LAYER ETCHING OF GaN AND OTHER III-V MATERIALS
Provided herein are ALE methods of removing III-V materials such as gallium nitride (GaN) and related apparatus. In some embodiments, the methods involve...
2016/0358781 PROCESS CHAMBER
Embodiments described herein generally relate to a method and apparatus for plasma treating a process chamber. A substrate having a gate stack formed thereon...
2016/0358780 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
In accordance with an embodiment, a substrate treatment apparatus includes a housing, a magnetic field generating portion and a microwave supply portion. The...
2016/0358779 MECHANISMS FOR SEMICONDUCTOR DEVICE STRUCTURE
Semiconductor device structures and methods for forming the same are provided. The method for forming a semiconductor device structure includes forming a dummy...
2016/0358778 METHODS OF FORMING PATTERNS USING PHOTORESISTS
In a method of forming a pattern, a lower coating layer and a photoresist layer are sequentially formed on an object layer. An exposure process may be...
2016/0358777 RESIST UNDER LAYER FILM COMPOSITION AND PATTERNING PROCESS
The present invention provides a resist under layer film composition containing a novolak resin having a repeating unit shown by the formula (1) and either or...
2016/0358776 2-DIMENSIONAL PATTERNING EMPLOYING TONE INVERTED GRAPHOEPITAXY
After formation of a template layer over a neutral polymer layer, a self-assembling block copolymer material is applied and self-assembled. The template layer...
2016/0358775 SiGe FINFET WITH IMPROVED JUNCTION DOPING CONTROL
A semiconductor device and a method for fabricating the device. The method includes: providing a FinFET having a source/drain region, at least one SiGe fin, a...
2016/0358774 SILICON GERMANIUM-ON-INSULATOR FORMATION BY THERMAL MIXING
A layer of amorphous silicon is formed on a germanium-on-insulator substrate, or a layer of germanium is formed on a silicon-on-insulator substrate. An anneal...
2016/0358773 METHOD FOR MAKING ENHANCED SEMICONDUCTOR STRUCTURES IN SINGLE WAFER PROCESSING CHAMBER WITH DESIRED UNIFORMITY...
A method for processing a semiconductor wafer in a single wafer processing chamber may include heating the single wafer processing chamber to a temperature in...
2016/0358772 METHODS FOR SEMICONDUCTOR PASSIVATION BY NITRIDATION
In some embodiments, a semiconductor surface having a high mobility semiconductor may be effectively passivated by nitridation, preferably using hydrazine, a...
2016/0358771 METHODS OF FORMING DIFFERENT SIZED PATTERNS
A method includes forming a template portion to provide a first opening trench portion surrounding a first isolated pattern, and forming an array of pillars on...
2016/0358770 METHOD FOR FORMING PATTERN OF SEMICONDUCTOR DEVICE
Methods include forming an anti-reflection layer containing a photosensitive material directly on an etching layer, forming a photoresist layer directly on the...
2016/0358769 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
There is provided a semiconductor device manufacturing method, including: a film forming process in which, by supplying a solution for modifying a surface...
2016/0358768 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
According to one embodiment, a method for fabricating a semiconductor device includes performing a back surface processing to remove at least one of a scratch...
2016/0358767 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
There is provided a method of manufacturing a semiconductor device, comprising forming a film on a substrate by performing a cycle a predetermined number of...
2016/0358766 REDUCING OVERFRAGMENTATION IN ULTRAVIOLET PHOTODISSOCIATION
A method and apparatus are disclosed for dissociation of precursor ions, such as polypeptides, by ultraviolet photodissociation (UVPD) for mass spectrometry...
2016/0358765 ION SOURCE FILTER
An ion source filter for use in the source region is disclosed. The ion source filter includes four rod electrodes having circular cross sections. The rod...
2016/0358764 Quasi-Planar Multi-Reflecting Time-of-Flight Mass Spectrometer
A multi-reflecting, time-of-flight (MR-TOF) mass spectrometer including two quasi-planar electrostatic ion mirrors extended along drill direction (Z) and...
2016/0358763 Hermetically Sealed Magnetic Keeper Cathode
A sputtering cathode includes a magnet array having an outer, ring magnet surrounding an inner, disk magnet. A sputtering target is positioned on one side of...
2016/0358762 SEMICONDUCTOR MANUFACTURING SYSTEM AND SEMICONDUCTOR MANUFACTURING METHOD
In one embodiment, a semiconductor manufacturing system includes a gas supply module configured to supply an etching gas. The system further includes a chamber...
2016/0358761 HIGH THERMAL CONDUCTIVITY WAFER SUPPORT PEDESTAL DEVICE
A support pedestal device for an electrostatic chuck includes a base housing defining an internal cavity, and a base insert disposed proximate the internal...
2016/0358760 SYSTEM AND METHOD FOR PLASMA TREATMENT USING DIRECTIONAL DIELECTRIC BARRIER DISCHARGE ENERGY SYSTEM
A system including a directional dielectric barrier discharge (DBD) energy system, including a first electrode assembly configured to generate energy,...
2016/0358759 LASER INDUCED PLASMA MICROMACHINING (LIPMM)
A system for laser-induced plasma micromachining of a work-piece includes a dielectric fluid, a dielectric fluid supply device, a laser, a processor, and a...
2016/0358758 PLASMA PROCESSING APPARATUS
Disclosed is a plasma processing apparatus that includes a processing container configured to accommodate a wafer, and a dielectric window provided to...
2016/0358757 MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
A microwave plasma source for forming a surface wave plasma by radiating a microwave into a chamber of a plasma processing apparatus, includes: a microwave...
2016/0358756 PLASMA PROCESSING APPARATUS
Disclosed is a plasma processing apparatus including: a processing container that includes a bottom portion and a sidewall and defines a processing space; a...
2016/0358755 LARGE DYNAMIC RANGE RF VOLTAGE SENSOR AND METHOD FOR VOLTAGE MODE RF BIAS APPLICATION OF PLASMA PROCESSING SYSTEMS
A voltage sensor of a substrate processing system including a multi-divider circuit, a clamping circuit and first and second outputs. The multi-divider circuit...
2016/0358754 Systems, Methods and Apparatus for Choked Flow Element Extraction
A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma...
2016/0358753 PLASMA PROCESSING APPARATUS AND METHOD
An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power...
2016/0358752 PLASMA GENERATION DEVICE
A plasma generation device includes: a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair...
2016/0358751 ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME
An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a...
2016/0358750 Power Combiner and Microwave Introduction Mechanism
A power combiner includes a main body composed of outer and inner conductors, a plurality of power introduction ports configured to introduce electromagnetic...
2016/0358749 PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING
An apparatus for processing a substrate is provided. A chamber wall forms a processing chamber cavity. A substrate support for supporting the substrate is...
2016/0358748 Plasma Processing Apparatus and Coil Used Therein
A plasma etching apparatus includes a chamber having a processing space and a plasma generating space 4 defined therein and a coil 20 wound around the...
2016/0358747 CONDUCTIVE FILM AND METHOD OF MAKING SAME
A method for making a conductive film includes the steps of: depositing a conductive metal film on a substrate to form a metal-coated substrate; depositing a...
2016/0358746 Defect Image Classification Apparatus
A defect image classification apparatus includes a control unit that selects images obtained from at least some detectors among a plurality of detectors,...
2016/0358745 Charged Particle Beam Apparatus
There is provided a charged particle beam apparatus which can quickly perform high accuracy positioning and defect detection. A process of acquiring a low...
2016/0358744 PROCESSING MATERIALS
Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful intermediates and products, such as energy, fuels,...
2016/0358743 PLASMON-EXCITED ELECTRON BEAM ARRAY FOR COMPLEMENTARY PATTERNING
A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the...
2016/0358742 CHARGE DRAIN COATING FOR ELECTRON-OPTICAL MEMS
A system and method associated with a charge drain coating are disclosed. The charge drain coating may be applied to surfaces of an electron-optical device to...
2016/0358741 System and Method for Providing a Clean Environment in an Electron-Optical System
An electron extractor of an electron source capable of absorbing contaminant materials from a cavity proximate to the extractor is disclosed. The electron...
2016/0358740 AN ELECTRON EMITTER FOR AN X-RAY TUBE
Example embodiments presented herein are directed towards an electron emitter (22, 22_1, 22_2, 22_3) for an x-ray tube. The electron emitter comprises an...
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