Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2016/0379857 VACUUM PROCESSING APPARATUS
The present invention provides a vacuum processing apparatus that includes gas supply means having a hard interlock of a pair of gas valves. The present...
2016/0379856 ETCHING METHOD AND PLASMA PROCESSING APPARATUS
An etching method is provided. In the etching method, a silicon oxide film is etched by using plasma in a first condition. In the first condition, a surface...
2016/0379855 STORAGE UNIT, TRANSFER APPARATUS, AND SUBSTRATE PROCESSING SYSTEM
A storage unit of an embodiment includes a container, a rectifying plate, and an exhaust duct. The container provides a first space for storing a plurality of...
2016/0379854 Vacuum Compatible LED Substrate Heater
A system for heating substrates within a chamber, which may be maintained at vacuum conditions, is disclosed. The LED substrate heater comprises a base having...
2016/0379853 Electrostatic Chuck With LED Heating
An electrostatic chuck with LED heating is disclosed. The electrostatic chuck with LED heating comprises a first subassembly, which comprises a LED heater, and...
2016/0379852 LEAK TOLERANT LIQUID COOLING SYSTEM EMPLOYING IMPROVED AIR PURGING MECHANISM
A cooling system for at least one thermal unit includes a tank assembly that includes: a sump chamber, a purge chamber that is located above the sump chamber,...
2016/0379851 TEMPERATURE CONTROLLED SUBSTRATE PROCESSING
A semiconductor processing system includes a vacuum chamber, a gas source configured to supply a gas to the chamber, a platen having a top surface in the...
2016/0379850 SEMICONDUCTOR DIE SINGULATION METHOD
In one embodiment, die are singulated from a wafer having a back layer by placing the wafer onto a first carrier substrate with the back layer adjacent the...
2016/0379849 DEVICE AND METHOD FOR SCRIBING A BOTTOM-SIDE OF A SUBSTRATE WHILE VIEWING THE TOP SIDE
A device includes a table surface defining a horizontal plane having an x-axis and a y-axis orthogonal to the x-axis and the x-axis and y-axis lie in the...
2016/0379848 Substrate Processing Apparatus
A substrate processing apparatus includes: a processing chamber for processing a substrate; a substrate holding part whereon the substrate is placed; an...
2016/0379847 Method for Fabricating a Semiconductor Chip Panel
A method for fabricating a semiconductor chip is disclosed. In an embodiment, the method includes providing a carrier, providing a plurality of semiconductor...
2016/0379846 SEMICONDUCTOR PACKAGES SEPARATED USING A SACRIFICIAL MATERIAL
One or more embodiments are directed to semiconductor packages that are assembled using a sacrificial material, that when removed, separates the assembled...
2016/0379845 SEMICONDUCTOR PACKAGES INCLUDING INTERPOSER AND METHODS OF MANUFACTURING THE SAME
A semiconductor package may include a semiconductor die mounted on a first surface of an interposer die so that a die connection portion of the semiconductor...
2016/0379844 TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING
In one embodiment, a method for etching a copper layer disposed on a substrate includes directing reactive ions to the substrate when a mask that defines an...
2016/0379843 METHOD FOR MANUFACTURING INTEGRATED CIRCUIT DEVICE
According to one embodiment, a method is disclosed for manufacturing an integrated circuit device, the method can include forming a mask member on a first...
2016/0379842 GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF Si-CONTAINING ARC OR SILICON OXYNITRIDE TO DIFFERENT FILMS...
A method for the dry removal of a material on a microelectronic workpiece is described. The method includes receiving a workpiece having a surface exposing a...
2016/0379841 ETCHING METHOD
Disclosed is a method for selectively etching a first region made of silicon oxide to a second region made of silicon nitride. The method includes: performing...
2016/0379840 CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
A chemical mechanical polishing pad is provided, comprising: a chemical mechanical polishing layer having a polishing surface; wherein the chemical mechanical...
2016/0379839 SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
A method for making a semiconductor device. A substrate having a fin structure is provided. A continuous dummy gate line is formed on the substrate. The dummy...
2016/0379838 PROCESSING APPARATUS AND PROCESSING METHOD
A processing apparatus includes a rotary table that causes a workpiece to rotate around a rotary axis, a roller-shaped member that rotates on an axis...
2016/0379837 DIRECTED SELF-ASSEMBLY
The disclosure provides methods for directed self-assembly (DSA) of a block co-polymer (BCP). In one embodiment, a method includes: forming an oxide spacer...
2016/0379836 METHOD FOR FORMING A PATTERN
A method for forming a pattern includes steps of forming a patterned core layer on a substrate, conformally forming a spacer layer on the patterned core layer...
2016/0379835 GAS PHASE ETCHING SYSTEM AND METHOD
A method and system for the dry removal of a material on a microelectronic workpiece are described. The method includes receiving a workpiece having a surface...
2016/0379834 ETCHING METHOD
Disclosed is a method for etching an etching target layer which contains silicon and is provided with a metal-containing mask thereon. The method includes:...
2016/0379833 METHOD FOR CLEANING PLASMA PROCESSING CHAMBER AND SUBSTRATE
A method for cleaning a plasma processing chamber is provided. The method includes introducing an organic gas into a plasma processing chamber. The organic gas...
2016/0379832 FINFET SPACER ETCH WITH NO FIN RECESS AND NO GATE-SPACER PULL-DOWN
A method may include providing a patterned feature extending from a substrate plane of a substrate, the patterned feature including a semiconductor portion and...
2016/0379831 Multi-Gate Field Effect Transistors Having Oxygen-Scavenged Gate Stack
A method includes forming a silicon cap layer on a semiconductor fin, forming an interfacial layer over the silicon cap layer, forming a high-k gate dielectric...
2016/0379830 MULTIPLE NANOSECOND LASER PULSE ANNEAL PROCESSES AND RESULTANT SEMICONDUCTOR STRUCTURE
Semiconductor structures and methods of fabricating the same using multiple nanosecond pulsed laser anneals are provided. The method includes exposing a gate...
2016/0379829 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
There is provided a method for manufacturing a semiconductor device, including: providing a semiconductor substrate having a plurality of openings formed...
2016/0379828 SILICON DOPING SOURCE FILMS BY ALD DEPOSITION
A conformal thermal ALD film having a combination of elements containing a dopant, such as boron (or phosphorus), and an oxide (or nitride), in intimate...
2016/0379827 METHOD FOR SELECTIVELY DEPOSITING A LAYER ON A THREE DIMENSIONAL STRUCTURE
A method may include providing a substrate having a surface that defines a substrate plane and a substrate feature that extends from the substrate plane;...
2016/0379826 CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS
Disclosed herein are methods of doping a fin-shaped channel region of a partially fabricated 3-D transistor on a semiconductor substrate. The methods may...
2016/0379825 SEMICONDUCTOR POWER DEVICE AND METHOD FOR PRODUCING SAME
A method for producing a semiconductor power device includes forming a gate trench from a surface of the semiconductor layer toward an inside thereof. A first...
2016/0379824 LOW ROUGHNESS EUV LITHOGRAPHY
Provided herein are methods and related apparatus to smooth the edges of features patterned using extreme ultraviolet (EUV) lithography. In some embodiments,...
2016/0379823 TONE INVERTED DIRECTED SELF-ASSEMBLY (DSA) FIN PATTERNING
A method for DSA fin patterning includes forming a BCP layer over a lithographic stack, the BCP layer having first and second blocks, the lithographic stack...
2016/0379822 DIRECT AND PRE-PATTERNED SYNTHESIS OF TWO-DIMENSIONAL HETEROSTRUCTURES
A method for growing a transition metal dichalcogenide on a substrate, the method including providing a growth substrate having a first side and a second side...
2016/0379821 METHOD TO PRODUCE PYRITE
A method for preparing a device having a film on a substrate is disclosed. In the method, a film is deposited on a substrate. The film includes a...
2016/0379820 COMPOUND FINFET DEVICE INCLUDING OXIDIZED III-V FIN ISOLATOR
A semiconductor device includes a wafer having a bulk layer and a III-V buffer layer on an upper surface of the bulk layer. The semiconductor device further...
2016/0379819 INTERCONNECT INTEGRATION FOR SIDEWALL PORE SEAL AND VIA CLEANLINESS
A method for sealing porous low-k dielectric films is provided. The method comprises exposing a substrate to UV radiation and a first reactive gas, wherein the...
2016/0379818 INSULATING A VIA IN A SEMICONDUCTOR SUBSTRATE
Insulating a via in a semiconductor substrate, including: applying a first dielectric layer to the semiconductor substrate; and applying a second dielectric...
2016/0379817 PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME
[Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the...
2016/0379816 TECHNIQUES TO ENGINEER NANOSCALE PATTERNED FEATURES USING IONS
A method of patterning a substrate. The method may include providing a surface feature on the substrate, the surface feature having a first dimension along a...
2016/0379815 TRAPPING MULTIPLE IONS
Devices, methods, and systems for trapping multiple ions are described herein. One device includes two or more ovens wherein each oven includes a heating...
2016/0379814 MOLECULAR DETECTION APPARATUS AND METHOD
According to one embodiment, a molecular detection apparatus includes an ionizer, a voltage applier, a separator and a detector. The ionizer attaches ions to a...
2016/0379813 Systems and Methods for Using Interleaving Window Widths in Tandem Mass Spectrometry
Systems and methods are provided for analyzing a sample using overlapping measured mass selection window widths. A mass range of a sample is divided into two...
2016/0379812 METHOD FOR MEASUREMENT OF ION EVENTS
A method of processing an input data stream including at least one data peak (2), comprising: detecting at least one peak (2) in the input data stream having...
2016/0379811 METHOD OF DETERMINING CELL CYCLE STAGE DISTRIBUTION OF CELLS
A method of determining a cell cycle stage distribution of cells includes the steps of providing a cell sample; pre-treating the cell sample with a solvent;...
2016/0379810 Systems and Methods for Acquiring Data for Mass Spectrometry Images
Systems and methods are provided for maximizing the data acquired from a sample in a mass spectrometry imaging experiment. An ion source device is instructed...
2016/0379809 DETECTORS AND METHODS OF USING THEM
Certain embodiments described herein are directed to detectors and systems using them. In some examples, the detector can include a plurality of dynodes, in...
2016/0379808 VENTILATION SYSTEMS FOR USE WITH A PLASMA TREATMENT SYSTEM
A gas containment apparatus for use with an end effector including at least one plasma head includes at least one enclosing structure coupled to the end...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 149 150 151 152 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.