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Patent # Description
2016/0378007 ELECTROSTATIC LATENT IMAGE DEVELOPING TONER
An electrostatic latent image developing toner contains toner particles each containing a toner core, and a shell layer dividedly disposed as a plurality of...
2016/0378006 TONER, DEVELOPER, TONER HOUSING UNIT AND IMAGE FORMING APPARATUS
A toner includes a binder resin; a release agent; and two or more inorganic fine particles as external additives. At least one of the inorganic fine particles...
2016/0378005 DEVELOPER, DEVELOPER CONTAINER, DEVELOPMENT APPARATUS AND IMAGE FORMING APPARATUS
A developer contains at least a binder resin and a fluorescent brightening agent. A content of the fluorescent brightening agent in the developer is 0.3% by...
2016/0378004 ABS PART MATERIAL FOR ELECTROPHOTOGRAPHY-BASED ADDITIVE MANUFACTURING
A part material for printing three-dimensional parts with an electrophotography-based additive manufacturing system, the part material including a composition...
2016/0378003 MAGNETIC TONER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD
Provided is a toner having improved durability. The magnetic toner includes magnetic toner particles each containing a binder resin and a magnetic material, in...
2016/0378002 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS
An undercoat layer of an electrophotographic photosensitive member includes a binder resin, and a complex particle composed of a core particle coated with tin...
2016/0378001 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS
Provided are an electrophotographic photosensitive member comprising: a support, an undercoat layer formed on the support, and a photosensitive layer formed on...
2016/0378000 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS
Provided is an electrophotographic photosensitive member comprising a support, an intermediate layer formed on the support, a charge generating layer formed...
2016/0377999 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC APPARATUS
The present invention provides an electrophotographic photosensitive member that allows positive ghost to be reduced even in repeated use. The ...
2016/0377998 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS
Provided is an electrophotographic photosensitive member including a support, an undercoat layer formed on the support, and a photosensitive layer formed on...
2016/0377997 IMPRINT LITHOGRAPHY
A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating...
2016/0377996 SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY
A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction,...
2016/0377995 DEVICE AND METHOD FOR POSITIONING A PHOTOLITHOGRAPHY MASK BY A CONTACTLESS OPTICAL METHOD
A device for positioning a mask relative to the surface of a wafer with a view to the exposure of the wafer, which includes (i) first positioning structure...
2016/0377994 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE...
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic...
2016/0377993 MULTI-STAGE SYSTEM, A CONTROL METHOD THEREFOR, AND A LITHOGRAPHIC APPARATUS
A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable...
2016/0377992 Lithographic Apparatus for Measuring Overlay Error and a Device Manufacturing Method
A lithographic apparatus including an inspection apparatus can measure the overlay error of a target in a scribelane is measured. The overlay error of the...
2016/0377991 METHOD OF LAYER MANAGEMENT WITH DOUBLE-LAYER OVERLAY ACCURACY CONTROL, CALIBRATION MARK AND MEASUREMENT SYSTEM
The present invention provides a method for solving the need for layer management with double-layer overlay accuracy control, a calibration mark structure...
2016/0377990 Inspection Apparatus and Method, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing...
The present invention determines property of a target (30) on a substrate (W), such as a grating on a wafer. An inspection apparatus has an illumination source...
2016/0377989 FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid...
2016/0377988 OPTICAL ELEMENT AND OPTICAL ARRANGEMENT THEREWITH
An optical arrangement includes an optical element (1) and a thermal manipulation device. The optical element has a substrate (2), a coating (3, 9, 5) applied...
2016/0377987 SYSTEM FOR CREATING NANOSCALE PATTERNS
An super-resolution system for nano-patterning is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures...
2016/0377986 TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION APPARATUS
A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas...
2016/0377985 Component for a Radiation Source, Associated Radiation Source and Lithographic Apparatus
Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface...
2016/0377984 MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at...
2016/0377983 EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS
A process of an extreme ultraviolet lithography is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask, an EUV radiation source and an...
2016/0377982 Methods of Forming a Mask for Substrate Patterning
Patterning methods for creating features with sub-resolution dimensions that are self-aligned in photoresist materials. Techniques include selectably creating...
2016/0377981 SELECTIVE LASER ABLATION IN RESISTS AND BLOCK COPOLYMERS FOR HIGH RESOLUTION LITHOGRAPHIC PATTERNING
Various embodiments of the invention demonstrate selective laser ablation processes as a means to create a block copolymer derived lithographic pattern through...
2016/0377980 RESIST COMPOSITION
A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a...
2016/0377979 RESIST COMPOSITION
A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a...
2016/0377978 RESIST COMPOSITION
A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a...
2016/0377977 OXIME ESTER PHOTOINITIATORS
Compounds of the formula (I) ##STR00001## wherein Q is a direct bond or an n-valent linking group; n is an integer 2, 3, or 4; Z is for example...
2016/0377976 CURABLE COMPOSITION FOR NANOIMPRINTING AND CURED PRODUCT
Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically...
2016/0377975 MASK BLANK, PHASE-SHIFT MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
To provide a phase-shift mask in which the reduction in thickness of a light-shielding film is provided when a transition metal silicide-based material is used...
2016/0377974 PSM BLANK FOR ENHANCING SMALL SIZE CD RESOLUTION
A phase shift mask blank includes a transparent substrate, a phase shift layer, a first hard mask layer and an opaque layer. The transparent substrate is...
2016/0377973 PHOTOMASK, METHOD OF CORRECTING ERROR THEREOF, INTEGRATED CIRCUIT DEVICE MANUFACTURED BY USING THE PHOTOMASK,...
Provided are photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate...
2016/0377972 GLASS CERAMIC FOR ULTRAVIOLET LITHOGRAPHY AND METHOD OF MANUFACTURING THEREOF
An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the...
2016/0377971 Restoration solution for cine film bubble and restoration method
The present invention discloses a restoration solution for cine film bubble and a restoration method. The restoration solution comprises 100 parts by volume of...
2016/0377970 HIGH CONTRAST PROJECTION SCREEN WITH STRAY LIGHT REJECTION
A multi-layer projection screen includes a transparent substrate having first and second sides, a stray light rejection layer, and a lens array. The stray...
2016/0377969 LIGHT SOURCE DEVICE AND IMAGE PROJECTION APPARATUS HAVING LIGHT SOURCE DEVICE
A light source device includes a light source section that emits laser beam, a member reducing light quantity unevenness of the laser beam, a diffusion member...
2016/0377968 WAVELENGTH CONVERSION ELEMENT, LIGHT SOURCE DEVICE, AND PROJECTOR
A wavelength conversion element includes: a substrate; an intermediate layer that is provided on the substrate and has a refractive index less than a...
2016/0377967 PROJECTOR-USE LUMINESCENT WHEEL AND MANUFACTURING METHOD THEREFOR, AND PROJECTOR-USE LIGHT EMITTING DEVICE
Provided is a luminescent wheel for a projector, which has a novel structure in which a phosphor layer is hard to break even if its thickness is reduced; a...
2016/0377966 OPTICAL DEVICE
An optical device includes a phosphor wheel and two light sources. The phosphor wheel has two phosphor regions. The phosphor regions are located at different...
2016/0377965 ELECTRO-OPTICAL DEVICE, METHOD OF MANUFACTURING ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS
In an electro-optical device, a light-transmitting cover is disposed in mirrors, and when light is applied toward the mirrors through the light-transmitting...
2016/0377964 LIGHTING DEVICE, PROJECTOR, LIGHT-SOURCE-DEVICE SUPPORTING INSTRUMENT, AND LIGHT SOURCE CARTRIDGE
A lighting device includes a supporting section configured to support a light source device unit, a fan housing section in which an outflow port for causing...
2016/0377963 ILLUMINATION OPTICAL SYSTEM, OPTICAL ENGINE, AND IMAGE PROJECTION APPARATUS
An illumination optical system is provided that is configured to guide light emitted from a light source to an image generation unit that is arranged to be...
2016/0377962 OPTICAL DEVICE AND IMAGE DISPLAY APPARATUS
An optical device includes a glass plate, a movable section that supports the glass plate, shaft sections that swingably support the movable section around a...
2016/0377961 Self-centering mechanism, a clamping device for an electronic device and means for their integration
This invention comprises a self-centering mechanism for retaining an object, a clamping device for retaining an electronic device or an electronic device in a...
2016/0377960 MAGNETIC FLUID SHUTTER OPERATION
Techniques related to a method, apparatus, and systems for magnetic fluid shutter operation are described herein. For example, an apparatus may include an...
2016/0377959 Stable, High Efficiency, Wavelength Tunable Fiber Optic Parametric Oscillator
An optical apparatus comprising: a source and a loop. The source generates a pump. The resonating cavity of the source includes: a gain medium; and a tunable...
2016/0377958 TERAHERTZ WAVE GENERATING APPARATUS AND INFORMATION OBTAINING APPARATUS
The present invention relates to a terahertz wave generating apparatus including a terahertz wave generating element including a nonlinear optical crystal that...
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