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Patent # Description
2018/0047587 TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing a transistor, includes: (i) forming a metal-oxide semiconductor layer over a substrate; (ii) forming a source electrode and a drain...
2018/0047586 EPITAXIALLY COATED SEMICONDUCTOR WAFER, AND METHOD FOR PRODUCING AN EPITAXIALLY COATED SEMICONDUCTOR WAFER
Epitaxial wafers with a high concentration of BMD nuclei or developed BMDs just below a denuded zone, and having low surface roughness, are produced by forming...
2018/0047585 METHOD OF FABRICATING A SEMICONDUCTOR STRUCTURE
A method of making a semiconductor structure, the method including forming a conductive layer over a substrate. The method further includes forming a first...
2018/0047584 METHOD FOR ETCH-BASED PLANARIZATION OF A SUBSTRATE
Techniques herein provide an etch-based planarization technique. An initial film is deposited on a substrate. Deposition of this initial film results in a...
2018/0047583 COMPOSITE PATTERNING MASK USING ANGLED ION BEAM DEPOSITION
A method may include providing an initial mask feature in a mask disposed on a substrate, the initial mask feature comprising a first material, the substrate...
2018/0047582 Semiconductor Device and Method of Manufacturing the Semiconductor Device
A method of manufacturing a semiconductor device includes forming an etching mask over a semiconductor body, forming a plurality of trenches in the...
2018/0047581 PATTERNING METHOD, METHOD FOR PRODUCING PROCESSED SUBSTRATE, METHOD FOR PRODUCING OPTICAL COMPONENT, METHOD FOR...
To provide a patterning method for forming a desired pattern in a reverse process. A patterning method includes a reverse process. A photocurable composition...
2018/0047580 PHOTORESIST REMOVAL
Among other things, one or more systems and techniques for removing a photoresist from a semiconductor wafer are provided. The photoresist is formed over the...
2018/0047579 Manufacturing Method of Semiconductor Device
In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed...
2018/0047578 METHOD OF PROCESSING TARGET OBJECT
A method of processing a target object is provided. The target object has an etching target layer, an organic film on the etching target layer and a mask on...
2018/0047577 ATOMIC LAYER ETCHING USING A BORON-CONTAINING GAS AND HYDROGEN FLUORIDE GAS
Embodiments of the invention provide a method for atomic layer etching (ALE) of a substrate. According to one embodiment, the method includes providing a...
2018/0047576 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
A substrate processing device includes a control device that controls a substrate holding unit, an etching liquid supply unit, and a plurality of electrodes....
2018/0047575 SELF-ALIGNED SINGLE DUMMY FIN CUT WITH TIGHT PITCH
A method of forming a semiconductor device and resulting structures having a dummy semiconductor fin removed from within an array of tight pitch semiconductor...
2018/0047574 DUAL ENDPOINT DETECTION FOR ADVANCED PHASE SHIFT AND BINARY PHOTOMASKS
The present invention provides a method and apparatus for etching a photomask substrate with enhanced process monitoring, for example, by providing for optical...
2018/0047573 PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
Controllability of ion bombardment on a substrate is further improved to achieve uniformity of the etched substrate across the substrate surface. A plasma...
2018/0047572 DRESSING DEVICE, POLISHING APPARATUS, HOLDER, HOUSING AND DRESSING METHOD
A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the...
2018/0047571 SEMICONDUCTOR DEVICE PACKAGES AND STACKED PACKAGE ASSEMBLIES INCLUDING HIGH DENSITY INTERCONNECTIONS
A semiconductor device package includes an electronic device and a redistribution stack. The redistribution stack includes a dielectric layer disposed over an...
2018/0047570 LOW TEMPERATURE NANOWIRE GROWTH ON ARBITRARY SUBSTRATES
The present invention provides a method to manufacture nanowires. In various embodiments, a method is provided for producing an oxidized metal layer as a...
2018/0047569 METHOD OF SELECTIVE EPITAXY
Embodiments of the present disclosure generally relate to methods for trench filling of high quality epitaxial silicon-containing material without losing...
2018/0047568 MULTILAYER DIELECTRIC STRUCTURES WITH GRADED COMPOSITION FOR NANO-SCALE SEMICONDUCTOR DEVICES
Multilayer dielectric structures are provided with graded composition. For example, a multilayer dielectric structure includes a stack of dielectric films,...
2018/0047567 METHOD OF FABRICATING THIN FILM
A unit cycle process is repeatedly performed to form the thin film having a predetermined thickness. In the unit cycle process, a preliminary film layer is...
2018/0047566 METHOD FOR CLEANING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects...
2018/0047565 METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and...
2018/0047564 METHOD TO TUNE CONTACT CD AND REDUCE MASK COUNT BY TILTED ION BEAM
A novel method of processing and fabricating semiconductor devices is provided to reduce critical dimensions inherent in a given photolithography process. A...
2018/0047563 High-Precision Dispense System With Meniscus Control
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense...
2018/0047562 High-Purity Dispense System
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense...
2018/0047561 Lithography Method with Surface Modification Layer
A lithography method is provided in accordance with some embodiments. The lithography method includes forming a surface modification layer on a substrate, the...
2018/0047560 Method for Performing a Wet Treatment of a Substrate
A method for performing a wet treatment of a structure is described in the present disclosure. An example method includes obtaining a structure comprising a...
2018/0047559 SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
A substrate treatment device according to an embodiment includes a placement portion on which a substrate is placed and rotated, a liquid supply portion which...
2018/0047558 ENGINEERED SUBSTRATE STRUCTURE FOR POWER AND RF APPLICATIONS
A substrate includes a support structure comprising: a polycrystalline ceramic core; a first adhesion layer coupled to the polycrystalline ceramic core; a...
2018/0047557 POLYCRYSTALLINE CERAMIC SUBSTRATE AND METHOD OF MANUFACTURE
A method of fabricating a ceramic substrate structure includes providing a ceramic substrate, encapsulating the ceramic substrate in a barrier layer, and...
2018/0047556 Orthogonal Acceleration Coaxial Cylinder Time of Flight Mass Analyser
A Time of Flight mass analyser is disclosed comprising an annular ion guide having a longitudinal axis and comprising a first annular ion guide section and a...
2018/0047555 Imaging Guided Ambient Ionisation Mass Spectrometry
A method is disclosed comprising obtaining or acquiring image or other data from one or more regions of a target using an imaging sensor. The image or other...
2018/0047554 Rapid Evaporative Ionisation Mass Spectrometry ("REIMS") and Desorption Electrospray Ionisation Mass...
A method is disclosed comprising providing a biological sample on a swab, directing a spray of charged droplets onto a surface of the swab in order to generate...
2018/0047553 Spectrometric Analysis
A method of spectrometric analysis comprises obtaining one or more sample spectra for an aerosol, smoke or vapour sample. The one or more sample spectra are...
2018/0047552 REACTION MONITORING
The invention generally relates to systems and methods for on-line reaction monitoring. In certain embodiments, the invention provides systems that include a...
2018/0047551 Ambient Ionization Mass Spectrometry Imaging Platform for Direct Mapping from Bulk Tissue
A method of ion imaging is disclosed that includes automatically sampling a plurality of different locations on a sample using a front device which is arranged...
2018/0047550 Method and Apparatus for Chemical Ionization of a Gas Mixture
A method and apparatus for chemical ionization of analyte gas particles in a carrier gas by introducing primary ions, characterized in that the primary and...
2018/0047549 Method of Calibrating a Mass Spectrometer
A method of calibrating a mass spectrometer is disclosed. The mass spectrometer includes a first quadrupole, a second mass analyzer and a detection means. The...
2018/0047548 DIFFERENTIALLY PUMPED REACTIVE GAS INJECTOR
One process used to remove material from a surface is ion etching. In certain cases, ion etching involves delivery of both ions and a reactive gas to a...
2018/0047547 SLIP RING, SUPPORT MECHANISM, AND PLASMA PROCESSING APPARATUS
Disclosed is a slip ring including: a conductive rotor that is rotatable around a rotation axis; a conductive stator provided coaxially with the rotor; a...
2018/0047546 DRY-ETCH DEVICE AND A LOWER ELECTRODE THEREOF
A dry-etch device and a lower electrode are disclosed. The lower electrode includes a body of an electrode plate and a plurality of protrusions. The body of...
2018/0047545 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing method includes an etching step of mounting a substrate on a surface of a rotatory table arranged in a vacuum chamber and supplying an...
2018/0047544 PROCESS CHAMBER HAVING TUNABLE SHOWERHEAD AND TUNABLE LINER
Process chambers having a tunable showerhead and a tunable liner are disclosed herein. In some embodiments, a processing chamber includes a showerhead; a...
2018/0047543 SYSTEMS AND METHODS FOR RF POWER RATIO SWITCHING FOR ITERATIVE TRANSITIONING BETWEEN ETCH AND DEPOSITION PROCESSES
A system is provided and includes a first linear motor, a first separator support assembly, and a controller. The first linear motor includes a shaft that is...
2018/0047542 INDUCTIVELY COUPLED PLASMA CHAMBER HAVING A MULTI-ZONE SHOWERHEAD
Apparatus for plasma processing are provided herein. In some embodiments, a process chamber includes: a chamber body having a processing volume within; a...
2018/0047541 FILM FORMING APPARATUS AND GAS INJECTION MEMBER USED THEREFOR
A film forming apparatus, for forming a film on a target substrate using a processing gas excited by plasma, includes: a processing chamber for accommodating...
2018/0047540 HIGH DOSE OUTPUT, THROUGH TRANSMISSION & RELECTIVE TARGET X-RAY SYSTEM AND METHODS OF USE
A high dose output, through transmission and reflective target x-ray tube and methods of use includes, in general an x-ray tube for accelerating electrons...
2018/0047539 FUSE RESISTOR AND METHOD OF MANUFACTURING THE SAME
Provided are a fuse resistor and a method of manufacturing the same, more particularly, are a fuse resistor mounted at an electric circuit of an electronic...
2018/0047538 Fuse Unit
A fuse unit includes a fuse element which includes a fusible portion, a housing which accommodates the fuse element in a state that the fusible portion is...
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