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Patent # Description
2018/0096858 METALIZATION REPAIR IN SEMICONDUCTOR WAFERS
Embodiments are directed to a method for repairing features of a host semiconductor wafer. The method includes forming a feature of the host semiconductor...
2018/0096857 METHOD FOR FLUOROCARBON FILM USED AS MIDDLE STOP LAYER FOR POROUS LOW K FILM
A method for manufacturing an interconnect structure includes providing a metal interconnect layer, forming a first dielectric layer on the metal interconnect...
2018/0096856 SUBSTRATE TREATING APPARATUS
A substrate treating apparatus and a method of treating a substrate, the apparatus including a substrate treater that treats a substrate using a chemical...
2018/0096855 SUBSTRATE LIQUID TREATMENT APPARATUS, SUBSTRATE LIQUID TREATMENT METHOD AND STORAGE MEDIUM
A substrate liquid treatment method in one embodiment includes, storing a phosphoric acid solution in a processing bath provided in a liquid treatment unit,...
2018/0096854 METHOD FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE, SILICON CARBIDE EPITAXIAL SUBSTRATE, METHOD FOR...
A method for manufacturing a silicon carbide epitaxial substrate includes epitaxially growing a first layer on a silicon carbide single crystal substrate, and...
2018/0096853 METHOD OF PRODUCING ETCHING MASK, ETCHING MASK PRECURSOR, AND OXIDE LAYER, AND METHOD OF MANUFACTURING THIN...
The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing...
2018/0096852 Methods and Devices Using PVD Ruthenium
Ruthenium containing gate stacks and methods of forming ruthenium containing gate stacks are described. The ruthenium containing gate stack comprises a...
2018/0096851 DEVICES WITH MULTIPLE THRESHOLD VOLTAGES FORMED ON A SINGLE WAFER USING STRAIN IN THE HIGH-K LAYER
A method for adjusting a threshold voltage includes depositing a strained liner on a gate structure to strain a gate dielectric. A threshold voltage of a...
2018/0096850 Method and Structure for Semiconductor Device Having Gate Spacer Protection Layer
A method of forming a semiconductor device includes providing a precursor. The precursor includes a substrate; a gate stack over the substrate; a first...
2018/0096849 PROCESS OF FORMING AN ELECTRONIC DEVICE INCLUDING EXPOSING A SUBSTRATE TO AN OXIDIZING AMBIENT
A process of forming electronic device can include providing a substrate having a first portion and a second portion; introducing a nitrogen-containing species...
2018/0096848 METHOD OF PROVIDING AN ELECTRONIC DEVICE AND ELECTRONIC DEVICE THEREOF
Some embodiments include a method. The method can include: providing a carrier substrate; providing a first bond promoting layer over the carrier substrate;...
2018/0096847 Methods Of Forming Self-Aligned Vias
Processing methods comprising selectively orthogonally growing a first material through a mask to provide an expanded first material are described. The mask...
2018/0096846 SELECTIVE GAS ETCHING FOR SELF-ALIGNED PATTERN TRANSFER
Selective gas etching for self-aligned pattern transfer uses a first block and a separate second block formed in a sacrificial layer to transfer critical...
2018/0096845 METHOD OF FABRICATING SEMICONDUCTOR DEVICE
A method of fabricating a semiconductor device is provided. The method includes forming a dummy gate electrode on a substrate, forming a trench on a side...
2018/0096844 METHOD OF GAS-PHASE DEPOSITION BY EPITAXY
A gas phase epitaxial deposition method deposits silicon, germanium, or silicon-germanium on a single-crystal semiconductor surface of a substrate. The...
2018/0096843 GAS FLOW PROFILE MODULATED CONTROL OF OVERLAY IN PLASMA CVD FILMS
Methods for modulating local stress and overlay error of one or more patterning films may include modulating a gas flow profile of gases introduced into a...
2018/0096842 REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON CARBIDE FILM
Provided are methods and apparatuses for depositing a graded or multi-layered silicon carbide film using remote plasma. A graded or multi-layered silicon...
2018/0096841 METHODS FOR FORMING ELECTRONIC DEVICES FROM NANOMATERIALS
A multi-scale manufacturing system comprising a centrally located multi-axis and multi-dimensional first manipulating component associated with a housing for...
2018/0096840 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
A method for manufacturing a semiconductor device includes forming an etch target layer on a semiconductor substrate, forming a first photoresist pattern...
2018/0096839 SHRINK PROCESS AWARE ASSIST FEATURES
Methods for fabricating integrated circuits are provided. In one example, a method includes providing a circuit structure layer over a substrate and at least...
2018/0096838 CHEMICALLY PATTERNED GUIDE LAYERS FOR USE IN CHEMOEPITAXY DIRECTING OF BLOCK CO-POLYMERS
The present invention is broadly concerned with materials, processes, and structures that allow an underlayer to be imaged directly using conventional...
2018/0096837 SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus for processing a wafer including a temporary substrate and a semiconductor device. The substrate processing apparatus includes...
2018/0096836 SUBSTRATE PROCESSING DEVICE
A substrate processing apparatus includes a processing unit supplying at least one of a plurality of types of chemical liquids to a substrate and a scrubber...
2018/0096835 ATOMIC LAYER DEPOSITION SEALING INTEGRATION FOR NANOSHEET COMPLEMENTARY METAL OXIDE SEMICONDUCTOR WITH...
A semiconductor device including a gate structure present on at least two suspended channel structures, and a composite spacer present on sidewalls of the gate...
2018/0096834 CHEMICAL MODIFICATION OF HARDMASK FILMS FOR ENHANCED ETCHING AND SELECTIVE REMOVAL
Embodiments include a method of processing a hardmask that includes forming an alloyed carbon hardmask over an underlying layer. In an embodiment, the alloyed...
2018/0096833 WAFER STACKING TO FORM A MULTI-WAFER-BONDED STRUCTURE
In one aspect, a method includes heating a wafer chuck, heating a first wafer, depositing a first epoxy along at least a portion of a surface of the first...
2018/0096832 RF/DC FILTER TO ENHANCE MASS SPECTROMETER ROBUSTNESS
Systems and methods described herein utilize a multipole ion guide that can receive ions from an ion source for transmission to downstream mass analyzers,...
2018/0096831 MATRIX-ASSISTED LASER DESORPTION MASS SPECTROMETRY OF HIGH MOLECULAR WEIGHT POLYOXYETHYLENE DERIVATIVE
A matrix-assisted laser desorption (MALDI) mass spectrometry in which a mixture comprising a polyethylene glycol derivative having a molecular weight of 40,000...
2018/0096830 Systems and Methods for Using Variable Mass Selection Window Widths in Tandem Mass Spectrometry
Systems and methods are used to analyze a sample using variable mass selection window widths. A tandem mass spectrometer is instructed to perform at least two...
2018/0096829 MULTIBAND PHOTOCATHODE AND ASSOCIATED DETECTOR
The invention relates to a photocathode including an input window (210) suitable for receiving a flow of incident photons, and an active layer (230), the...
2018/0096828 IN-SITU CLEANING USING HYDROGEN PEROXIDE AS CO-GAS TO PRIMARY DOPANT OR PURGE GAS FOR MINIMIZING CARBON...
An ion source assembly and method is provided for improving ion implantation performance. The ion source assembly has an ion source chamber and a source gas...
2018/0096827 ATMOSPHERIC PLASMA PROCESSING SYSTEMS AND METHODS FOR MANUFACTURE OF MICROELECTRONIC WORKPIECES
Systems and related methods are disclosed for atmospheric plasma processing of microelectronic workpieces, such as semiconductor wafers. For disclosed...
2018/0096826 PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, AND METHOD OF CONTROLLING PLASMA GENERATING APPARATUS
A plasma generating apparatus according to the present disclosure includes: a high frequency power supply that generates a high frequency power; a plasma...
2018/0096825 ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED THIN FILM COATINGS ON PROCESS RINGS
A ring shaped body includes a top flat region, a ring inner side and a ring outer side. The ring inner side comprises an approximately vertical wall. A...
2018/0096824 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
A plasma processing apparatus comprises a base including an electrode body having a seat surface for setting a substrate held on a conveying carrier, and a...
2018/0096823 LARGE AREA ENERGETIC ION SOURCE
An RF antenna system for a plasma chamber comprises an RF input coupling a trunk to an RO power supply; two main branches electrically connected to the main...
2018/0096822 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
A plasma processing method includes applying a pulse wave of high frequency electric power for plasma generation and a pulse wave of high frequency electric...
2018/0096821 DUAL-CHANNEL SHOWERHEAD WITH IMPROVED PROFILE
Described processing chambers may include a chamber housing at least partially defining an interior region of the semiconductor processing chamber. The...
2018/0096820 PLASMA SYSTEM
A plasma system comprises a first electrode which connecting to a power generator and a second electrode which is grounded and disposed corresponding to the...
2018/0096819 DUAL-CHANNEL SHOWERHEAD WITH IMPROVED PROFILE
Described processing chambers may include a chamber housing at least partially defining an interior region of the semiconductor processing chamber. The cambers...
2018/0096818 CHAMBER WITH FLOW-THROUGH SOURCE
Described processing chambers may include a chamber housing at least partially defining an interior region of a semiconductor processing chamber. The chamber...
2018/0096817 SPECIMEN HOLDER
The purpose of the present invention is to provide a specimen holder having a structure capable of maintaining a seal surface regardless of a change of...
2018/0096816 ANGLED FLAT EMITTER FOR HIGH POWER CATHODE WITH ELECTROSTATIC EMISSION CONTROL
In the present invention, a computed tomography system, an X-ray tube used therein and a cathode assembly disposed in the X-ray tube, as well as an associated...
2018/0096815 Magnetron Having a Cooling Structure
A magnetron includes an anode cylinder extending in a cylindrical shape along a central axis and a plurality of plate-like vanes at least each one end of which...
2018/0096814 BATTERY CONNECTION UNIT, AND ATTACHMENT STRUCTURE FOR BATTERY CONNECTION UNIT
A battery connection unit includes an electronic component electrically connected to a battery terminal and a terminal of an electric wire, and an insulating...
2018/0096813 ELECTRICAL SWITCH UNIT FOR AN ELECTRICAL DEVICE
An electrical switch unit for use in an electrical device to control flow of electrical current therethrough from a power source to power the electrical...
2018/0096812 ELECTROMECHANICAL SWITCHING DEVICE WITH ELECTRODES HAVING 2D LAYERED MATERIALS WITH DISTINCT FUNCTIONAL AREAS
An electromechanical switching device includes a first electrode, comprising layers of a first 2D layered material, which layers exhibit a first surface; a...
2018/0096811 CONTACT MECHANISM OF ELECTROMAGNETIC RELAY
A contact mechanism of an electromagnetic relay comprises a contact assembly, a movable contact assembly and a driving unit. The contact assembly comprises a...
2018/0096810 ELECTROMAGNETIC RELAY
An electromagnetic relay including: an electromagnet; a movable spring having a movable contact; a first terminal to which one end of the movable spring is...
2018/0096809 RELAY WITH A CONTROLLER
The disclosure relates to a relay having a relay contact, having an electrical connection terminal at which an electrical variable can be tapped off, a control...
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