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Patent # Description
2018/0130689 Electrostatic Chuck Including Clamp Electrode Assembly Forming Portion of Faraday Cage for RF Delivery and...
A ceramic layer is attached to a top surface of a base plate using a bond layer. The ceramic layer has a top surface configured to support a substrate. A clamp...
2018/0130688 TRANSFER APPARATUS, PROCESSING APPARATUS, AND TRANSFER METHOD
A frame unit is transferred from a cassette to a predetermined position. The frame unit has a platelike workpiece, a tape attached to the workpiece, and a ring...
2018/0130687 ELECTRONIC DEVICE MANUFACTURING LOAD PORT APPARATUS, SYSTEMS, AND METHODS
An electronic device manufacturing system includes a factory interface that has a load port. The load port may include a panel having a back surface. The back...
2018/0130685 SYSTEMS, APPARATUS, AND METHODS FOR AN IMPROVED LOAD PORT
Embodiments provide systems, apparatus, and methods for an improved load port that includes a frame supporting a dock and a carrier opener; an elevator...
2018/0130684 SYSTEMS, APPARATUS, AND METHODS FOR AN IMPROVED LOAD PORT BACKPLANE
Embodiments provide systems, apparatus, and methods for an improved load port that includes a backplane assembly supporting a docking tray and a substrate...
2018/0130683 APPARATUS AND METHOD FOR CONTACTLESS TRANSFER AND SOLDERING OF CHIPS USING A FLASH LAMP
A method and apparatus for soldering a chip (1a) to a substrate (3). A chip carrier (8) is provided between a flash lamp (5) and the substrate (3). The chip...
2018/0130682 STORAGE DEVICE AND PHOTORESIST COATING AND DEVELOPING MACHINE HAVING STORAGE DEVICE
A storage device and a photoresist coating and developing machine having a storage device are disclosed. The storage device includes a frame and a plurality of...
2018/0130681 PROCESSING SYSTEM
A processing system includes: at least one processing unit. Each processing unit includes a plurality of processing chambers, and a utility module. Each of the...
2018/0130680 Thermal Process Device
A thermal process device for heat treating a product or plurality of products includes a thermal processing chamber having opposed distal ends and a plurality...
2018/0130679 PLASMA PROCESSING DEVICE
The present invention relates to a plasma processing device, comprising: an upper electrode has a plurality of protruding posts which made by conducting...
2018/0130678 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
Disclosed is a substrate treating apparatus including a substrate holder, a rotating drive unit, a treatment liquid supplying unit, an exterior cup, and an...
2018/0130677 SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards....
2018/0130676 GROOVE-TYPE DRYING STRUCTURE
A groove-type drying structure includes a drying groove having a cover. The drying groove is internally provided with an inner groove body. The inner groove...
2018/0130675 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RECORDING MEDIUM
A substrate processing apparatus performs: a pressure raising process of raising a pressure within the processing container to a processing pressure higher...
2018/0130674 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
Disclosed are an apparatus and method for processing a substrate. The apparatus includes a chamber, a susceptor disposed in a lower portion of the chamber, a...
2018/0130673 PACKAGE STRUCTURE, FAN-OUT PACKAGE STRUCTURE AND METHOD OF THE SAME
A package structure includes a spiral coil, a redistribution layer (RDL) and a molding material. The molding material fills gaps of the spiral coil. The spiral...
2018/0130672 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device includes preparing an object layer on a substrate; polishing the object layer with a first slurry including a...
2018/0130671 Methods For Self-Aligned Patterning
Processing methods comprising depositing a film on a substrate surface and in a surface feature with chemical planarization to remove the film from the...
2018/0130670 ETCHING METHOD
Disclosed is a method for etching an etching target layer which contains silicon and is provided with a metal-containing mask thereon. The method includes:...
2018/0130669 SELF-LIMITING CYCLIC ETCH METHOD FOR CARBON-BASED FILMS
Embodiments of the disclosure describe a cyclic etch method for carbon-based films. According to one embodiment, the method includes providing a substrate...
2018/0130668 ENHANCED PATTERNING OF INTEGRATED CIRCUIT LAYER BY TILTED ION IMPLANTATION
Methods for achieving sub-lithographic feature sizes in an integrated circuit (IC) layer are provided that use ion implantation to enhance or reduce the etch...
2018/0130667 FILM THICKNESS MEASURING METHOD, FILM THICKNESS MEASURING APPARATUS, POLISHING METHOD, AND POLISHING APPARATUS
The present invention relates to a film-thickness measuring method for detecting a film thickness by analyzing optical information contained in a reflected...
2018/0130666 ENHANCED THIN FILM DEPOSITION
Methods of producing metal-containing thin films with low impurity contents on a substrate by atomic layer deposition (ALD) are provided. The methods...
2018/0130665 METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
A method of fabricating a semiconductor device, the method including forming a deposition active layer and a guide pattern on a semiconductor substrate such...
2018/0130664 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
In a method of manufacturing a semiconductor device, by performing a predetermined number of times a cycle of performing supplying reducing gas to a substrate...
2018/0130663 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
A method of manufacturing a semiconductor device includes the following processes. A metal film forming process in which a metal film including cobalt is...
2018/0130662 SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC
Oxide growth of a gate dielectric layer that occurs between processes used in the fabrication of a gate dielectric structure can be reduced. The reduction in...
2018/0130661 Semiconductor Device and Method of Manufacturing the Same
A third semiconductor layer (105) including a third nitride semiconductor is provided between an electrode (110) and a second semiconductor layer (104)...
2018/0130660 SEMICONDUCTOR DEVICE HAVING INTERCONNECT STRUCTURE
Various embodiments provide semiconductor devices. A base including a substrate and an interlayer dielectric layer is provided. The base has a first region and...
2018/0130659 Plasma Doping Using A Solid Dopant Source
A method of processing a workpiece is disclosed, where the interior surfaces of the plasma chamber are first coated using a conditioning gas that contains the...
2018/0130658 APPARATUS AND METHOD FOR BONDING SUBSTRATES
A device and method is described for producing an electrically conductive direct bond between a bonding side of a first substrate and a bonding side of a...
2018/0130657 Geometric Control Of Bottom-Up Pillars For Patterning Applications
Processing methods comprising selectively replacing a first pillar material with a second pillar material in a self-aligned process are described. The first...
2018/0130656 FORMING DEFECT-FREE RELAXED SiGe FINS
A method of forming defect-free relaxed SiGe fins is provided. Embodiments include forming fully strained defect-free SiGe fins on a first portion of a Si...
2018/0130655 SYMMETRIC TUNNEL FIELD EFFECT TRANSISTOR
The present disclosure relates to semiconductor structures and, more particularly, to a symmetric tunnel field effect transistor and methods of manufacture....
2018/0130654 PRECURSORS FOR SILICON DIOXIDE GAP FILL
A full fill trench structure is described, including a microelectronic device substrate having a high aspect ratio trench therein and filled with silicon...
2018/0130653 OPTICS FOR CONTROLLING LIGHT TRANSMITTED THROUGH A CONICAL QUARTZ DOME
Embodiments described herein generally relate to apparatus for heating substrates. The apparatus generally include a process chamber having a substrate support...
2018/0130652 PROCESS FEED MANAGEMENT FOR SEMICONDUCTOR SUBSTRATE PROCESSING
Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a...
2018/0130651 PULSED PLASMA ANALYZER AND METHOD FOR ANALYZING THE SAME
A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that...
2018/0130650 INTEGRATED SAMPLE PROCESSING FOR ELECTROSPRAY IONIZATION DEVICES
Methods, systems and devices that generate differential axial transport in a fluidic device having at least one fluidic sample separation flow channel and at...
2018/0130649 Systems and Methods for Scaling Injection Waveform Amplitude During Ion Isolation
This disclosure describes a method of adjusting the amplitude of broadband waveforms for isolation, especially during injection to a multipole trapping device....
2018/0130648 Rate Enhanced Pulsed DC Sputtering System
A sputtering system and method are disclosed. The system includes first power source coupled to a first magnetron and an anode, and the first power source...
2018/0130647 METHOD AND APPARATUS FOR CALIBRATING OPTICAL PATH DEGRADATION USEFUL FOR DECOUPLED PLASMA NITRIDATION CHAMBERS
Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a...
2018/0130646 METHODS AND SYSTEMS FOR GENERATING PLASMA ACTIVATED LIQUID
Exemplary systems and methods associated with activating fluids using indirect plasma. In particular, liquid can be activated to high concentrations and at...
2018/0130645 HEAT TRANSFER MEDIUM SYSTEM AND SUBSTRATE PROCESSING APPARATUS
A heat transfer medium supply system includes valve units each alternately supplying a first and a second heat transfer medium to a corresponding zone of a...
2018/0130644 HIGH CONDUCTANCE PROCESS KIT
Apparatus for plasma processing of semiconductor substrates. Aspects of the apparatus include an upper shield with a gas diffuser arranged at a center of the...
2018/0130643 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
A plasma processing apparatus includes: a base that has an electrode body provided with a placing surface on which a substrate is placed and a pedestal which...
2018/0130642 Methods And Systems To Modulate Film Stress
Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the...
2018/0130641 Apparatus and Method for Augmenting the Volume of Atmospheric Pressure Plasma Jets
An apparatus and methods to increase and direct the spatial volume of atmospheric pressure plasma jets. One or more additional gas flows is introduced to...
2018/0130640 ACTIVE SHOWERHEAD
An active showerhead used for a plasma reactor is described. The active showerhead includes a plurality of substrate layers. The substrate layers include at...
2018/0130639 EXTERNAL PLASMA SYSTEM
Methods and systems for generating a plasma using an external plasma system are described. The plasma system may include an energy coupling device (e.g., an...
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