Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2018/0138058 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
A substrate processing apparatus of the present disclosure includes: a processing container; and a supply line which connects the processing container with a...
2018/0138057 TRANSFER HEAD ARRAY
A transfer head array includes a body and a plurality of transfer heads. The body includes a base portion and at least one wall portion. The wall portion is...
2018/0138056 Package and Method for Integration of Heterogeneous Integrated Circuits
In some embodiments, the present disclosure relates to a package for holding a plurality of integrated circuits. The package includes a first conductive pad...
2018/0138055 REMOVAL METHODS FOR HIGH ASPECT RATIO STRUCTURES
Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber....
2018/0138054 TRANSITION METAL DRY ETCH BY ATOMIC LAYER REMOVAL OF OXIDE LAYERS FOR DEVICE FABRICATION
Transition metal dry etch by atomic layer removal of oxide layers for device fabrication, and the resulting devices, are described. In an example, a method of...
2018/0138053 Wet Etching Method and Etching Solution
Disclosed is a wet etching method for etching a metal-containing film on a substrate with the use of an etching solution, wherein the etching solution contains...
2018/0138052 Backside Polisher with Dry Frontside Design and Method Using The Same
A wafer polishing apparatus is described herein. The wafer polishing apparatus includes a polish module configured to apply air pressure to a first surface of...
2018/0138050 TOPOGRAPHIC PLANARIZATION METHOD FOR LITHOGRAPHY PROCESS
Topographic planarization methods for a lithography process are provided. The method includes providing a substrate having a topography surface. A ...
2018/0138049 SiN SPACER PROFILE PATTERNING
Processing methods may be performed to form recesses in a semiconductor substrate. The methods may include oxidizing an exposed silicon nitride surface on a...
2018/0138048 PATTERN FORMATION METHOD
According to one embodiment, a pattern formation method includes forming a structure body on a first surface of a patterning member, the structure body having...
2018/0138047 System and Method for Wafer-Scale Fabrication of Free Standing Mechanical and Photonic Structures By Ion Beam...
A method for fabrication of free standing mechanical and photonic structures is presented. A resist mask is applied to a bulk substrate. The bulk substrate is...
2018/0138046 METHOD AND STRUCTURE TO CONTROL CHANNEL LENGTH IN VERTICAL FET DEVICE
A method of manufacturing a vertical field effect transistor includes an isotropic etch of a gate conductor to recess the gate and define the length of the...
2018/0138045 SEMICONDUCTOR STRUCTURES AND FABRICATION METHODS THEREOF
A method for fabricating a semiconductor structure includes providing a base structure, forming a dielectric layer on the base structure, forming a plurality...
2018/0138044 WETTING PRETREATMENT FOR ENHANCED DAMASCENE METAL FILLING
Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the...
2018/0138043 III-V SEMICONDUCTOR DIODE
A stacked III-V semiconductor diode having a p.sup.+ substrate with a dopant concentration of 5*10.sup.18 to 5*10.sup.20 cm.sup.-3, a layer thickness of 50-500...
2018/0138042 Methods for Integrated Circuit Design and Fabrication
The present disclosure provides a method of patterning a target material layer over a semiconductor substrate. The method includes steps of forming a spacer...
2018/0138041 METHODS FOR FORMING FINE PATTERNS USING SPACERS
There is provided a method for forming fine patterns. The method includes forming a pattern divider on an underlying layer, forming a mask layer on the...
2018/0138040 SELF-ALIGNED MULTI-PATTERNING PROCESS FLOW WITH ALD GAPFILL SPACER MASK
Methods and apparatuses for forming symmetrical spacers for self-aligned multiple patterning processes are described herein. Methods include depositing gapfill...
2018/0138039 METHOD OF FABRICATING BLACK PHOSPHORUS ULTRATHIN FILM AND BLACK PHOSPHORUS ULTRATHIN FILM THEREOF
The present invention relates to a method of fabricating a black phosphorus thin film and a black phosphorus thin film thereof and, more particularly, to a...
2018/0138038 CLEANING METHOD
Implementations of the present disclosure generally relate to methods and apparatuses for epitaxial deposition on substrate surfaces. More particularly,...
2018/0138037 THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME, ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE...
A method for manufacturing a thin film transistor is disclosed. The method includes: manufacturing a gate electrode, a gate insulation layer, an active layer,...
2018/0138036 METHOD FOR HIGH MODULUS ALD SIO2 SPACER
Methods and apparatuses for forming high modulus silicon oxide spacers using atomic layer deposition are provided. Methods involve depositing at high...
2018/0138035 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
During at least part of a time period for a pressure increasing step of increasing a pressure inside a processing container from a pressure lower than a...
2018/0138034 FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE USING PATTERNING STACKS
Formation methods of a semiconductor device structure are provided. The method includes forming an under layer over a substrate, forming a middle layer over...
2018/0138033 REMOVAL OF METAL
Methods of removing metal from a portion of a substrate include exposing the substrate to a reducing environment comprising at least one reducing agent and at...
2018/0138032 METHODS AND SOLUTIONS FOR CLEANING INGAAS (OR III-V) SUBSTRATES
Embodiments described herein generally relate to improved methods and solutions for cleaning a substrate prior to epitaxial growth of Group III-V channel...
2018/0138031 PROCESS CHAMBER HAVING SEPARATE PROCESS GAS AND PURGE GAS REGIONS
Embodiments of the present invention generally relate to chambers and methods of processing substrates therein. The chambers generally include separate process...
2018/0138030 METHOD FOR CLEANING, PASSIVATION AND FUNCTIONALIZATION OF SI-GE SEMICONDUCTOR SURFACES
A method for in-situ dry cleaning of a SiGe semiconductor surface, ex-situ degreases the Ge containing semiconductor surface and removes organic contaminants....
2018/0138029 FAN-OUT SEMICONDUCTOR PACKAGE
A fan-out semiconductor package includes: a first connection member having a through-hole; a semiconductor chip disposed in the through-hole of the first...
2018/0138028 SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
Methods of selectively inhibiting deposition of silicon-containing films deposited by atomic layer deposition are provided. Selective inhibition involves...
2018/0138027 PHOSPHOR-CONTAINING FILM AND BACKLIGHT UNIT
Provided are a phosphor-containing capable of suppressing deterioration of phosphors and can be manufactured with high efficiency and a backlight unit....
2018/0138026 MULTI-REFLECTION MASS SPECTROMETER WITH DECELERATION STAGE
Disclosed herein is a multi-reflection mass spectrometer comprising two ion mirrors spaced apart and opposing each other in an X direction, each mirror...
2018/0138025 Adaptive and Targeted Control of Ion Populations to Improve the Effective Dynamic Range of Mass Analyser
A method of mass spectrometry is disclosed wherein one or more relatively abundant or intense species of ions in a first population of ions are selectively...
2018/0138024 CONNECTOR PIECE FOR A TUBULAR TARGET
A connection piece for a tubular target which has a cylindrical inner surface and a cylindrical outer surface and at least one magnetic insert. The position of...
2018/0138023 Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of A Moving Substrate
Apparatus and methods to process a substrate comprising a gas distribution assembly comprising a plasma process region with an array of individual plasma...
2018/0138022 APPARATUS AND METHOD FOR HANDLING AN IMPLANT
An apparatus for plasma treatment of an implant prior to installing the implant in a live subject is provided. The apparatus comprises an activation device and...
2018/0138021 PLASMA LIGHT UP SUPPRESSION
A method for suppressing arcing in helium distribution channels of an electrostatic chuck in a plasma processing chamber, wherein the electrostatic chuck is...
2018/0138020 RF ION SOURCE WITH DYNAMIC VOLUME CONTROL
Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at...
2018/0138019 PLASMA IRRADIATION APPARATUS AND PLASMA IRRADIATION METHOD
Provided are a plasma irradiation apparatus and plasma irradiation method capable of converting a silica precursor to a high quality silica film in a short...
2018/0138018 DUAL-FREQUENCY SURFACE WAVE PLASMA SOURCE
Described herein is a technology related to a method for utilizing a dual-frequency surface wave plasma sources to provide stable ionizations on a plasma...
2018/0138017 Microwave Chemical Processing
Methods and systems include supplying pulsed microwave radiation through a waveguide, where the microwave radiation propagates in a direction along the...
2018/0138016 CONTROLLING ETCH RATE DRIFT AND PARTICLES DURING PLASMA PROCESSING
The invention is an plasma processing system with a plasma chamber for processing semiconductor substrates, comprising: a radio frequency or microwave power...
2018/0138015 PROCESSING CHAMBER HARDWARE FAULT DETECTION USING SPECTRAL RADIO FREQUENCY ANALYSIS
A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to...
2018/0138014 Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Distribution Plates
A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around...
2018/0138013 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD
In one embodiment, a multi charged particle beam writing apparatus includes an aperture plate forming multiple beams, a stage on which a writing target...
2018/0138012 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD
In one embodiment, a multi charged particle beam writing apparatus includes an aperture plate having a plurality of holes to form multiple beams, a blanking...
2018/0138011 CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
An electron beam exposure apparatus which exposes a wafer coated with an electron beam resist with an electron beam is equipped with: a stage that can be moved...
2018/0138010 Charged Particle Beam Apparatus
A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without...
2018/0138009 CHARGED PARTICLE BEAM APPARATUS AND SAMPLE ELEVATING APPARATUS
To realize a sample lifting and lowering device capable of easily responding to increase of a diameter of a sample with weight and high rigidity as well as...
2018/0138008 Ion Source
An ion source is provided that includes a gas source for supplying a gas, and an ionization chamber defining a longitudinal axis extending therethrough and...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.