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Patent # Description
2018/0144938 METHOD OF MANUFACTURING SEMINCONDUCTOR DEVICE
A method of manufacturing a semiconductor device is provided with: implanting charged particles including oxygen into a surface of a SiC wafer; and forming a...
2018/0144937 METHODS OF PATTERNING A TARGET LAYER
A method of forming patterns includes the steps of providing a substrate on which a target layer and a hard mask layer are formed; forming a plurality of first...
2018/0144936 Assistant Pattern for Measuring Critical Dimension of Main Pattern In Semiconductor Manufacturing
A method includes receiving an integrated circuit (IC) layout having a pattern layer. The pattern layer includes a main layout pattern. A dimension W1 of the...
2018/0144935 Method for Formation of a Transition Metal Dichalcogenide (TMDC) Material Layer
A method for formation of a transition metal dichalcogenide (TMDC) material layer on a substrate arranged in a process chamber of a molecular beam epitaxy tool...
2018/0144934 COMPOSITIONALLY MATCHED MOLECULAR SOLDERS FOR SEMICONDUCTORS
Chalcogenidometallates of group IIB, IV and V elements and, particularly, alkali metal-containing chalcogenidometallates of cadmium, lead and bismuth are...
2018/0144933 Method for Producing a Nitride Compound Semiconductor Device
A method for procuring a nitride compound semiconductor device is disclosed. In an embodiment the method includes growing a first nitride compound...
2018/0144932 DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
A method for manufacturing a semiconductor device includes introducing a gas into a chamber from a showerhead. The chamber has a sidewall surrounding a...
2018/0144931 METHOD OF FORMING SILICON-CONTAINING FILM
A method of forming a silicon-containing film includes: an adsorption step of supplying a silicon-containing gas represented by a general formula XSiCl.sub.3...
2018/0144930 Amorphous Boron Nitride Dielectric
A nanoelectronics structure is disclosed which includes a substrate layer which has least a first surface and also has a thickness of less than 100 nm. The...
2018/0144929 METHOD FOR FORMING HIGH ASPECT RATIO PATTERNING STRUCTURE
The invention disclosed a method for forming high aspect ratio patterning structure. Firstly, forming a dielectric film ashing stop layer, a first photoresist...
2018/0144928 Orientation Layer for Directed Self-Assembly Patterning Process
Disclosed is a method of forming a semiconductor device using a self-assembly (DSA) patterning process. The method includes forming a patterned feature over a...
2018/0144927 SEMICONDUCTOR STRUCTURES COMPRISING SILICON NITRIDE AND RELATED METHODS
Methods of forming silicon nitride. Silicon nitride is formed on a substrate by atomic layer deposition at a temperature of less than or equal to about...
2018/0144926 ADVANCED INTERCONNECT WITH AIR GAP
Ultra-low-k dielectric materials used as inter-layer dielectrics in high-performance integrated circuits are prone to be structurally unstable. The Young's...
2018/0144925 DRIVE METHOD AND DRIVE CIRCUIT FOR LIGHT-EMITTING DEVICE USING GAS DISCHARGE, AND ULTRAVIOLET IRRADIATION DEVICE
During a normal operation,alternating drive voltage to be applied between a pair of electrodes provided to face an outer surface of a bottom part of a gas...
2018/0144924 GAS DISCHARGE LAMP AND A DEVICE FOR CONTROLLING THE TEMPERATURE THEREOF
The present invention relates to a device for the regulated temperature control of a gas discharge lamp, and a gas discharge lamp. The device according to the...
2018/0144923 METHOD FOR CHARACTERISING IONS
A method for characterising ions includes trapping a first-generation ions in an ion trap; cooling the plurality of first-generation ions; photo-fragmenting...
2018/0144922 CAPACITORS AND RADIO FREQUENCY GENERATORS AND OTHER DEVICES USING THEM
Certain configurations of a stable capacitor are described which comprise electrodes produced from materials comprising a selected coefficient of thermal...
2018/0144921 MULTI-REFLECTING TOF MASS SPECTROMETER
A method of time-of-flight mass spectrometry is disclosed comprising: providing two ion mirrors (42) that are spaced apart in a first dimension (X-dimension)...
2018/0144920 OVERSAMPLED TIME OF FLIGHT MASS SPECTROMETRY
A method of mass spectrometry is disclosed comprising passing ions to an oversampled Time of Flight mass analyser (4) and sequentially recording ion signals on...
2018/0144919 SYSTEMS AND METHODS FOR DETECTION AND QUANTIFICATION OF SELENIUM AND SILICON IN SAMPLES
The present disclosure provides methods and systems for improved detection and/or quantification of selenium (Se) and/or silicon (Si) in samples. In certain...
2018/0144918 TECHNIQUES FOR MASS ANALYZING A COMPLEX SAMPLE
Techniques and apparatus for analyzing mass spectrometry data are described. In one embodiment, for example, an apparatus may include logic to access a product...
2018/0144917 COMPACT MASS SPECTROMETER
A miniature mass spectrometer is disclosed comprising an atmospheric pressure ionisation source and a first vacuum chamber having an atmospheric pressure...
2018/0144916 LOCK MASS LIBRARY FOR INTERNAL CORRECTION
A method of calibrating or optimising an analytical instrument is disclosed that comprises analysing analyte from a sample using an analytical instrument,...
2018/0144915 CONDUCTIVE OXIDE-COATED ELECTRODES VIA NANO- OR MICRO-STRUCTURED MATERIALS
Disclosed embodiments include conductive oxide-coated electrodes and methods of fabricating a conductive oxide-coated electrode. In a non-limiting embodiment,...
2018/0144914 METHOD OF MANUFACTURING ELECTRON MULTIPLIER BODY, PHOTOMULTIPLIER TUBE, AND PHOTOMULTIPLIER
A method of manufacturing an electron multiplier body, the method includes a step of preparing a first plate-like member having a surface and a back surface...
2018/0144913 TUBULAR TARGET
A target for a cathode sputtering system has a tubular target body made of a sputtering material and at least one connector piece, which is connected to the...
2018/0144912 SPUTTERING TARGET
A sputtering target comprising a flat part and a tapered part, wherein a machined groove for use in ignition is arranged on a sputtering surface of the target....
2018/0144911 METHOD AND SYSTEM OF MONITORING AND CONTROLLING DEFORMATION OF A WAFER SUBSTRATE
A method and system are for monitoring and controlling deformation of a wafer substrate during a plasma etching of the wafer substrate. The method includes...
2018/0144910 METHOD FOR TREATING THE SURFACE OF A MOVING FILM, AND FACILITY FOR IMPLEMENTING SAID METHOD
A method carried out in a facility having an enclosure, a support for the substrate, a counter-electrode, a head provided with an electrode, a device for...
2018/0144909 PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING
A method for coating a part body for use in a plasma processing chamber is provided. The part body is received into a chamber. At least part of a surface of...
2018/0144908 SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND BAFFLE STRUCTURE OF THE...
A conventional substrate processing apparatus for generating plasma cannot generate plasma with high density and thus throughput of substrate processing is...
2018/0144907 THERMAL REPEATABILITY AND IN-SITU SHOWERHEAD TEMPERATURE MONITORING
Embodiments described herein generally related to a substrate processing apparatus, and more specifically to an improved showerhead assembly for a substrate...
2018/0144906 Methods for Processing Substrates Using Small Plasma Chambers
A plasma processing method is provided. The method includes receiving a substrate in a substrate support that is configured to be movable along a linear path....
2018/0144905 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD
According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil...
2018/0144904 PHOSPHOROUS TRIFLUORIDE CO-GAS FOR CARBON IMPLANTS
Processes and systems for carbon ion implantation include utilizing phosphorous trifluoride (PF.sub.3) as a co-gas with carbon oxide gas, and in some...
2018/0144903 Inter-Electrode Gap Variation Methods for Compensating Deposition Non-Uniformity
Methods and systems for depositing material layers with gap variation between film deposition operations. One method includes depositing a material layer over...
2018/0144902 X-RAY TUBE ION BARRIER
In the present invention, a cathode is formed with one or more emitters energized to emit electrons that are accelerated towards an anode or target spaced from...
2018/0144901 X-RAY ILLUMINATION SYSTEM WITH MULTIPLE TARGET MICROSTRUCTURES
An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be...
2018/0144900 FOAM FUSE FILLER AND CARTRIDGE FUSE
Fuses having a melamine-coated-steatite foam filler are described. In particular, melamine-coated-steatite foam filler for use in a fuse comprising steatite...
2018/0144899 POWER DISTRIBUTION CLIP ASSEMBLY
A power distribution assembly which may be a fuse clip or a switch includes a lug mounted to a block in association with a spring clip which confronts one side...
2018/0144898 SAFETY TRIPPING DEVICE FOR A FRAME-TYPE ACB DRAWER SEAT
A safety tripping device for a frame-type ACB drawer seat, which includes a special gear, a first lever, a tension spring, a second lever, and a tripping...
2018/0144897 FORCE-DISTANCE CONTROLLED MECHANICAL SWITCH
A switch comprises a first elastic element, an actuator-element mechanically coupled to a first side of the first elastic element, and a first switching...
2018/0144896 SWITCH FOR SWITCHING BETWEEN DIFFERENT HIGH FREQUENCY SIGNALS
A high frequency switch is provided. The high frequency switch comprises a first high frequency connector, comprising a first inner conductor, integrally...
2018/0144895 ELECTROMAGNETIC DEVICE AND ELECTROMAGNETIC RELAY USING SAME
An electromagnetic device includes a spool having a cylindrical body with a through hole, a secondary coil formed in a spiral shape along an outer peripheral...
2018/0144894 CONTACT DEVICE AND ELECTROMAGNETIC CONTACT APPARATUS USING SAME
A contact device and an electromagnetic contactor using the contact device. The contact device has: a main contact including a pair of fixed contact elements...
2018/0144893 ELECTROMAGNETIC CONTACTOR
To provide an electromagnetic contactor that allows the extension space for arcs to be enlarged without having to enlarge the size in a direction in which a...
2018/0144892 MAGNETIC SHIELD STRUCTURE
A magnetic shield structure includes a housing made of a dielectric material, and a magnetic shield body formed by metal plating. The magnetic shield body is...
2018/0144891 WIRE RELEASE MECHANISM
A wire release mechanism includes two components with adjacent longitudinal fingers and a wire that is wound about the fingers. The wire restrains one of the...
2018/0144890 QUICKLY CLOSING SWITCH ELEMENT
A switch, in particular a grounding switch, is for quickly establishing a ground connection and for extinguishing an arc fault for a switching system. The...
2018/0144888 ELECTRICAL SWITCH FOR AN ELECTRICAL DEVICE AND SEALING ASSEMBLY FOR AN ELECTRICAL SWITCH
A sealing assembly for prevention of ingress of particulates and water into an electrical switch includes an engagement element with a rigid first abutment...
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