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Patent # Description
2018/0158686 Deposition Of Metal Films
Methods to selectively deposit titanium-containing films on silicon-containing surfaces in high aspect ratio features of substrates comprise plasma-enhanced...
2018/0158685 PARASITIC CHANNEL MITIGATION VIA BACK SIDE IMPLANTATION
III-nitride materials are generally described herein, including material structures comprising III-nitride material regions and silicon-containing substrates....
2018/0158684 METHOD OF PROCESSING TARGET OBJECT
A controllability of a size of a mask can be improved in a multi-patterning method. A process of forming a silicon oxide film on a first mask and an...
2018/0158683 SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING
Methods for depositing nanolaminate protective layers over a core layer to enable deposition of high quality conformal films over the core layer for use in...
2018/0158682 METHOD TO ENHANCE GROWTH RATE FOR SELECTIVE EPITAXIAL GROWTH
Embodiments of the present disclosure generally relate to methods for forming a doped silicon epitaxial layer on semiconductor devices at increased pressure...
2018/0158681 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR TEMPLATE, NITRIDE SEMICONDUCTOR TEMPLATE AND NITRIDE...
There is provided a method for manufacturing a nitride semiconductor template constituted by forming a nitride semiconductor layer on a substrate, comprising:...
2018/0158680 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR TEMPLATE, NITRIDE SEMICONDUCTOR TEMPLATE AND NITRIDE...
There is provided a method for manufacturing a nitride semiconductor template constituted by forming a nitride semiconductor layer on a substrate, comprising:...
2018/0158679 High-Temperature Non-Stoichiometric Oxide Actuators
A piezoelectric actuator expands or deflects in response to an applied voltage. Unfortunately, the voltage required to actuate a piezoelectric device is...
2018/0158678 NITRIDE SEMICONDUCTOR ELEMENT AND NITRIDE SEMICONDUCTOR PACKAGE
A nitride semiconductor element capable of accommodating GaN electron transfer layers of a wide range of thickness, so as to allow greater freedom of device...
2018/0158677 GROWING GRAPHENE ON SUBSTRATES
Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a...
2018/0158676 SUPERCRITICAL FLUID PRODUCING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
A supercritical fluid producing apparatus according to the present disclosure includes a gas supply line, a cooler, a pump, a buffer tank, a heating device,...
2018/0158675 CLEANING METHOD
A method of cleaning an object that includes a plurality of chips divided individually, starting from modified layers, and integral with a holding member,...
2018/0158674 AROMATIC RESINS FOR UNDERLAYERS
Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
2018/0158673 GALLIUM ARSENIDE SUBSTRATE AND USE THEREOF
The present invention relates to a novel provided gallium arsenide substrates as well as the use thereof. The gallium arsenide substrates provided according to...
2018/0158672 Crystalline Semiconductor Growth on Amorphous and Poly-Crystalline Substrates
A multilayer semiconductor structure including at least in part a substrate and an III-N film layer. The substrate's constant of thermal expansion being...
2018/0158671 FILM FORMING APPARATUS AND FILM FORMING METHOD
A film forming apparatus includes a gas injection unit having a shower plate provided with gas injection holes, and a plurality of partition regions through...
2018/0158670 HIGH-K GATE DIELECTRICS ON 2D SUBSTRATES, INERT SURFACES, AND 3D MATERIALS
A method for forming a high-k oxide includes forming a nanofog of Al.sub.2O.sub.3 nanoparticles and conducting subsequent ALD deposition of a dielectric on the...
2018/0158669 SEMICONDUCTOR DEVICE
Methods for manufacturing a semiconductor device include forming a gate line extending in a first direction in a substrate, and an impurity region on a side...
2018/0158668 Double-Ended High Intensity Discharge Lamp and Manufacturing Method Thereof
A double-ended high intensity discharge lamp includes a luminous tube which comprises an inner tube and an outer tube. At least one electrical member is...
2018/0158667 Double-Ended High Intensity Discharge Lamp and Manufacturing Method Thereof
A double-ended high intensity discharge lamp includes a luminous tube and reflective layer covering at a reflective portion provided on at least a portion of...
2018/0158666 Double-Ended Ceramic Metal Halide Lamp
A double-ended ceramic metal halide lamp includes a luminous tube; at least two illuminators serially connected with each other deposed inside the luminous...
2018/0158665 APPARATUS FOR DETECTING CONSTITUENTS IN A SAMPLE AND METHOD OF USING THE SAME
An apparatus for detecting constituents in a sample includes first and second drift tubes defining first and second drift regions, and a controllable electric...
2018/0158664 Mobility Electrophoresis Separation Device, Operating Method Thereof, and Interface Between Liquid...
The present invention provides a mobility electrophoresis separation device, its operating method, and an interface between liquid chromatography and mass...
2018/0158663 Sheathless Interface for Capillary Electrophoresis/Electrospray Ionization-Mass Spectrometry
Provided herein are capillaries for use in an electrophoretic separations. The capillaries can comprise an elongated tubular wall defining a path for fluid...
2018/0158662 PRESSURE DRIVEN FLUIDIC INJECTION FOR CHEMICAL SEPARATIONS BY ELECTROPHORESIS
A pneumatic method, and associated apparatus, for injecting a discrete sample plug into the separation channel of an electrophoresis microchip (100) is...
2018/0158661 COLLECTION PROBE AND METHODS FOR THE USE THEREOF
Method and devices are provided for assessing tissue samples from a plurality of tissue sites in a subject using molecular analysis. In certain aspects,...
2018/0158660 SURFACE-ASSISTED LASER DESORPTION/IONIZATION METHOD, MASS SPECTROMETRY METHOD AND MASS SPECTROMETRY DEVICE
A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support having a substrate in...
2018/0158659 PREPARATION AND FEED APPARATUS OF STANDARD SAMPLE FOR CALIBRATION OF TRACE-ANALYSIS INSTRUMENT
Embodiments of the present disclosure relate to a preparation and feed apparatus of a standard sample for calibration of a trace-analysis instrument, and...
2018/0158658 Systems and Methods for Integrated Resputtering in a Physical Vapor Deposition Chamber
Physical vapor deposition systems are disclosed herein. An exemplary physical vapor deposition system includes a target, a collimator, a power source system,...
2018/0158657 METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING
A method and a system for plasma etching are provided. The method includes measuring a first set of plasma etch processing parameters; determining an etch...
2018/0158656 METHOD OF OPERATING SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICES
Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a...
2018/0158655 PLASMA SOURCE FOR A PLASMA CVD APPARATUS AND A MANUFACTURING METHOD OF AN ARTICLE USING THE PLASMA SOURCE
A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third...
2018/0158653 COMPOSITE PLASMA MODULATOR FOR PLASMA CHAMBER
A plasma-processing apparatus includes a chamber, a plasma generator, and a composite plasma modulator. The chamber includes a plasma zone. The plasma...
2018/0158652 METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING
A method and a system for monitoring a plasma chamber are provided. The method includes receiving process chamber characteristics from the plasma chamber;...
2018/0158651 Device for Treating an Object with Plasma
A system for treating an object with plasma includes a vacuum processing chamber having a holder on which the object to be treated is placed, at least two...
2018/0158650 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
A plasma processing apparatus includes a process chamber, and a pedestal provided in the process chamber and configured to hold a substrate. The plasma...
2018/0158649 CROSS SECTIONAL DEPTH COMPOSITION GENERATION UTILIZING SCANNING ELECTRON MICROSCOPY
A method for generating cross-sectional profiles using a scanning electron microscope (SEM) includes scanning a sample with an electron beam to gather an...
2018/0158648 CHARGED PARTICLE BEAM DEVICE PROVIDED WITH ION PUMP
In a charged particle apparatus with an ion pump, which is a charged particle beam apparatus with an ion pump including a charged particle beam irradiation...
2018/0158647 WAFER AND DUT INSPECTION APPARATUS AND METHOD USING THEREOF
A wafer and DUT inspection apparatus and a wafer and DUT inspection method using thereof are provided. The apparatus includes a vacuum chamber, a stage, an...
2018/0158646 Method of Image Acquisition and Electron Microscope
There is provided a method of image acquisition capable of reducing the effects of diffraction contrast. This method of image acquisition is implemented in an...
2018/0158645 SAMPLE CHAMBER DEVICE FOR ELECTRON MICROSCOPE, AND ELECTRON MICROSCOPE COMPRISING SAME
A vacuum sample chamber for a particle and optical device includes on one surface thereof, an aperture through which a particle beam to be focused along an...
2018/0158644 Method and System for Aberration Correction in an Electron Beam System
An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary...
2018/0158643 ION BEAM APPARATUS INCLUDING SLIT STRUCTURE FOR EXTRACTING ION BEAM, ETCHING METHOD USING THE SAME, AND METHOD...
An ion beam apparatus includes a source part generating plasma therein, a process part in which a process using an ion beam is performed, and a slit structure...
2018/0158642 METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE MULTI-BEAM DEVICE
A method of inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device is described. The method includes...
2018/0158641 RADIATION GENERATING TUBE, RADIATION GENERATING APPARATUS, RADIOGRAPHY SYSTEM AND MANUFACTURING METHOD THEREOF
The present invention relates to a radiation generating tube. The radiation generating tube includes an envelope including an insulating tubular member having...
2018/0158640 FIELD EMISSION APPARATUS
Disclosed is a field emission apparatus. The apparatus comprises a cathode electrode and an anode electrode spaced apart from each other, an emitter on the...
2018/0158639 TARGET FOR BARIUM-SCANDATE DISPENSER CATHODE
The invention relates to the field of production of barium-scandate dispenser cathodes or other barium-scandate materials. A target (66) containing a mixture...
2018/0158638 Circuit Breaker
The present disclosure relates to a circuit breaker. The circuit breaker includes a case having an accommodation space inside, an upper busbar and a lower...
2018/0158637 CHARGING DEVICE OF AIR CIRCUIT BREAKER
A first support member and a second support member are provided in a rotation support device and a worm gear is rotated in a state that the second support...
2018/0158636 LEAKAGE PROTECTIVE PLUG
A leakage protective plug and a tripping mechanism thereof, comprising a housing, and a tripping mechanism and a conducting structure arranged within the...
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