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Patent # Description
2018/0374722 PLASMA PROCESSING APPARATUS
A plasma processing apparatus capable of achieving a uniform plasma space therein is provided. The plasma processing apparatus includes a processing vessel, a...
2018/0374721 FILM FORMING APPARTUS
A supply part includes a first partition, a second partition under the first partition, a third partition under the second partition, a first flow path between...
2018/0374720 GAS EXHAUST PLATE AND PLASMA PROCESSING APPARATUS
A gas exhaust plate capable of improving a confinement effect of plasma while achieving sufficient conductance is provided. The gas exhaust plate is provided...
2018/0374719 SYSTEMS AND METHODS OF GAP CALIBRATION VIA DIRECT COMPONENT CONTACT IN ELECTRONIC DEVICE MANUFACTURING SYSTEMS
An electronic device manufacturing system includes a motion control system for calibrating a gap between surfaces of process chamber or loadlock components by...
2018/0374718 METHOD OF RECONSTITUTED SUBSTRATE FORMATION FOR ADVANCED PACKAGING APPLICATIONS
Embodiments of the present disclosure generally describe methods for minimizing the occurrence and the extent of die shift during the formation of a...
2018/0374717 Semiconductor package and method of forming the same
An adhesive layer is formed on a semiconductor wafer. The semiconductor wafer is diced to form a plurality of chips. Each of the chips has an adhesive sheet...
2018/0374716 ADHESIVE-BONDED THERMAL INTERFACE STRUCTURES
A heat sink can be attached to a heat-producing electronic device by aligning an adhesive material to a surface of the heat sink, applying the adhesive...
2018/0374715 ADHESIVE-BONDED THERMAL INTERFACE STRUCTURES FOR INTEGRATED CIRCUIT COOLING
A heat sink can be attached to a heat-producing electronic device by aligning an adhesive material to a surface of the heat sink, applying the adhesive...
2018/0374714 ADHESIVE-BONDED THERMAL INTERFACE STRUCTURES
A heat sink can be attached to a heat-producing electronic device by aligning an adhesive material to a surface of the heat sink, applying the adhesive...
2018/0374713 METHOD FOR IMPROVING THRESHOLD VOLTAGE OF OXIDE SEMICONDUCTOR THIN FILM TRANSISTOR
The invention provides a method for improving threshold voltage of oxide semiconductor TFT, by bending the oxide semiconductor TFT for a default number of...
2018/0374712 HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK
A method for etching features in an OMOM stack with first layer of silicon oxide, a second layer of a metal containing material over the first layer, a third...
2018/0374711 METHOD FOR MAKING NANOSTRUCTURES
A method of making nanostructures including: locating a photoresist mask layer on a substrate, the thickness of the photoresist mask layer is H; forming a...
2018/0374710 METHOD FOR MAKING NANOSCALE BELTS
A method of making nanoscale belts including: providing a semiconductor thin film, placing stripe masks on the semiconductor thin film, the thickness of the...
2018/0374709 ETCHING METHOD USING REMOTE PLASMA SOURCE, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE INCLUDING THE ETCHING...
An etching method using a remote plasma source (RPS) and a method of fabricating a semiconductor device, the etching method including generating a plasma by...
2018/0374708 Method and Structure for Semiconductor Device Having Gate Spacer Protection Layer
A method of forming a semiconductor device includes providing a precursor. The precursor includes a substrate; a gate stack over the substrate; a first...
2018/0374707 HIGH ASPECT RATIO GATES
Embodiments are directed to a method of forming a feature of a semiconductor device. In one or more embodiments, the feature is a gate, and the method includes...
2018/0374706 CORROSION RESISTANT COATING FOR SEMICONDUCTOR PROCESS EQUIPMENT
A corrosion resistant coating for semiconductor process equipment and methods of making corrosion resistant coatings for semiconductor process equipment are...
2018/0374705 INTEGRATED TRANSIENT VOLTAGE SUPPRESSOR CIRCUIT
A transient signal protection circuit includes an input node coupled to a signal line configured to carry an output signal from a first circuit to a second...
2018/0374704 DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE
A diffusing agent composition and a method of manufacturing a semiconductor substrate using the diffusing agent composition. The diffusing agent composition...
2018/0374703 METHOD FOR DOPING SEMICONDUCTOR SUBSTRATES BY MEANS OF A CO-DIFFUSION PROCESS AND DOPED SEMICONDUCTOR SUBSTRATE...
The invention relates to a method for doping semiconductor substrates by means of a co-diffusion process. First, semiconductor substrates are coated at least...
2018/0374702 METHOD OF FORMING SEMICONDUCTOR DEVICE
A method of forming a semiconductor device includes the following steps. First of all, a material layer is formed on a substrate, and a sidewall image...
2018/0374701 METHOD FOR MAKING NANOSCALE CHANNELS
A method of making nanoscale channels including: providing a substrate, locating a photoresist mask layer on the substrate, the thickness of the photoresist...
2018/0374700 METHOD FOR ASSEMBLING SEMICONDUCTOR NANOCRYSTALS
A method for assembling semiconductor nanocrystals including: providing a binary system including semiconductor nanocrystals with an effective particle...
2018/0374699 III-NITRIDE TUNNEL JUNCTION WITH MODIFIED P-N INTERFACE
A III-nitride tunnel junction with a modified p-n interface, wherein the modified p-n interface includes a delta-doped layer to reduce tunneling resistance....
2018/0374698 SEMICONDUCTOR TRANSISTOR HAVING SUPERLATTICE STRUCTURES
A transistor, including a substrate of a first doping type; an epitaxy layer of the first doping type above the substrate; a channel layer of a second doping...
2018/0374697 METHODS AND APPARATUSES FOR INCREASING REACTOR PROCESSING BATCH SIZE
Certain embodiments herein relate to methods of increasing a reaction chamber batch size. A portion of a batch of wafers is processed within the chamber. The...
2018/0374696 METHOD OF REDISTRIBUTION LAYER FORMATION FOR ADVANCED PACKAGING APPLICATIONS
Embodiments of the present disclosure generally describe methods of forming one or more device terminal redistribution layers using imprint lithography. The...
2018/0374695 PATTERN FORMING METHOD
A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a ...
2018/0374694 ION ANALYZER
Provided is an ion analyzer characterized by: an ionization chamber (10) to be maintained at atmospheric pressure; an analysis chamber (11) for analyzing an...
2018/0374693 ION MODULATOR FOR CHARACTERIZING LARGER BIOMOLECULES IN A DIFFERENTIAL MOBILITY SPECTROMETER
The tandem differential mobility spectrometer (DMS)-ion modulator instrument provides improved resolution relative to traditional DMS for molecules with larger...
2018/0374692 DISPENSER SYSTEM FOR MASS SPECTROMETRIC SAMPLE PREPARATIONS
The invention relates to the preparation of samples on mass spectrometric sample supports with dispensing of liquids, and particularly to devices and methods...
2018/0374691 ANALYTICAL DEVICE
An analytical device includes: a regulator to which a gas storage container attached and which is held by a holder; a gas introduction chamber to which gas in...
2018/0374690 METHOD OF PRODUCTION OF UNIFORM METAL PLATES AND SPUTTERING TARGETS MADE THEREBY
A method of making a metal or metal alloy target having the steps of providing a billet, the billet having a generally cylindrical configuration and having a...
2018/0374689 Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source
An electrically and magnetically enhanced ionized physical vapor deposition (I-PVD) magnetron apparatus and method is provided for sputtering material from a...
2018/0374688 MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION PLASMA SOURCE FOR DEPOSITING DIAMOND AND...
A magnetically enhanced HDP-CVD plasma source includes a hollow cathode target and an anode. The anode and cathode form a gap. A cathode target magnet assembly...
2018/0374687 PLASMA PROCESSING APPARATUS
A plasma processing apparatus according to one aspect includes a chamber body providing a chamber, the chamber body including a side wall, an opening being...
2018/0374686 PLASMA REACTOR WITH ELECTRODE ASSEMBLY FOR MOVING SUBSTRATE
A processing tool for a plasma process includes a chamber body that has an interior space that provides a plasma chamber and that has a ceiling and an opening...
2018/0374685 PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma...
2018/0374684 PROCESSING TOOL WITH ELECTRICALLY SWITCHED ELECTRODE ASSEMBLY
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor, a pump coupled to the plasma chamber, a...
2018/0374683 FILAMENT, IONIZATION CHAMBER, AND ION-IMPLANTATION APPARATUS
A filament includes first and second end portions between which a connecting portion is arranged. The first and second end portions are electrically connected...
2018/0374682 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
A plasma processing method includes a gas supply step and a film forming step. In the gas supply step, a gaseous mixture containing a compound gas containing a...
2018/0374681 IONIZATION CHAMBER, ION-IMPLANTATION APPARATUS AND ION-IMPLANTATION METHOD
An ionization chamber includes a cavity in which an air supply pipe and a filament are located. The air supply pipe is bent to form a closed frame in which the...
2018/0374680 PLASMA PROCESSING APPARATUS
Disclosed is a plasma processing apparatus including a plurality of microwave radiating mechanisms configured to radiate microwaves output from an output unit...
2018/0374679 POWER FEED MEMBER AND SUBSTRATE PROCESSING APPARATUS
A power feed member having high heat insulation and capable of transmitting a power at a low loss is provided. The power feed member configured to supply a...
2018/0374678 ANTENNA AND PLASMA PROCESSING APPARATUS
In an antenna including a dielectric window and a slot plate provided on one surface of the dielectric window, in a case where a reference position g is a...
2018/0374677 CALIBRATION OF ELEMENTARY SMALL PATTERNS IN VARIABLE-SHAPED-BEAM ELECTRON-BEAM LITHOGRAPHY
A method for calibrating elementary patterns in variable-shaped-beam electron-beam lithography, includes the following steps: producing, by ...
2018/0374676 PLASMA SOURCE
A plasma source is provided. The plasma source includes a chamber body, a supply passage, a vacuum connector, an antenna, a first insulator, a second...
2018/0374675 METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is...
2018/0374674 Charged Particle Beam Device Having Inspection Scan Direction Based on Scan with Smaller Dose
A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle...
2018/0374673 CHARGED PARTICLE BEAM DEVICE AND OPTICAL-AXIS ADJUSTING METHOD THEREOF
A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has...
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