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Patent # Description
2019/0115241 HYDROPHOBIC ELECTROSTATIC CHUCK
The present disclosure relates to an electrostatic chuck, including: a base having a dielectric first surface to support a substrate thereon during processing;...
2019/0115240 GAS FLOW FOR CONDENSATION REDUCTION WITH A SUBSTRATE PROCESSING CHUCK
A gas flow is described to reduce condensation with a substrate processing chuck. In one example, a workpiece holder in the chamber having a puck to carry the...
2019/0115239 SUBSTRATE ALIGNMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
Disclosed are a substrate alignment apparatus, a substrate processing apparatus, and a substrate processing method using the substrate alignment apparatus. The...
2019/0115238 Substrate Transport Vacuum Platform
An apparatus including a first device configured to support at least one substrate thereon; and a first transport having the device connected thereto. The...
2019/0115237 CASSETTE HOLDER ASSEMBLY FOR A SUBSTRATE CASSETTE AND HOLDING MEMBER FOR USE IN SUCH ASSEMBLY
The invention relates to a cassette holder assembly for holding a cassette for storing at least one semiconductor material substrate in an interior space...
2019/0115236 Swath Selection for Semiconductor Inspection
A semiconductor-inspection method is performed by a semiconductor-inspection system. In the method, user input is received that specifies a swath across a...
2019/0115235 METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE
A method of manufacturing a semiconductor package includes obtaining a plurality of individual chips classified according to a test bin item as a result of...
2019/0115234 Transfer System
Regarding a transfer system that includes a plurality of transfer vehicles that transfer articles, the present invention realizes technology that can alleviate...
2019/0115233 METHOD AND SYSTEM FOR MASS ARRANGEMENT OF MICRO-COMPONENT DEVICES
A method for mass arrangement of micro-component devices includes the following process stages: disposing the micro-component devices to float on a liquid...
2019/0115232 EXCIMER LASER ANNEALING APPARATUS
An excimer laser annealing apparatus is provided. The excimer laser annealing apparatus includes: a laser output channel, at least one first intake pipe and at...
2019/0115231 METHOD AND APPARATUS FOR TREATING SUBSTRATE
The inventive concept provides an apparatus and a method for heat-treating a substrate. The method includes a first treatment operation of spacing a substrate...
2019/0115230 SUBSTRATE PROCESSING APPARATUS, DISCHARGE METHOD, AND PROGRAM
A substrate processing apparatus including: a first valve provided between a gas supply source and an air-water separation tank, the first valve opening and...
2019/0115229 POSITIONING APPARATUS
A positioning apparatus comprises a base element provided for fastening to a robot, a base movably supported at the base element, and a piezoactuator by which...
2019/0115228 CERAMIC CIRCUIT SUBSTRATE AND METHOD FOR MANUFACTURING SAME
[Problem] To obtain a ceramic circuit substrate for a power module wherein an insulating resin for preventing solder flow and chip displacement and an...
2019/0115227 TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing a transistor, includes: (i) forming a metal-oxide semiconductor layer over a substrate; (ii) forming a source electrode and a drain...
2019/0115226 DOPANT ANNEAL WITH STABILIZATION STEP FOR IC WITH MATCHED DEVICES
A method of fabricating an integrated circuit (IC) includes providing a substrate having a semiconductor surface layer thereon including a field dielectric in...
2019/0115225 Systems and Methods for in SITU Maintenance of a Thin Hardmask During an Etch Process
Methods of patterning a target material layer are provided herein. The method includes steps of positioning a semiconductor wafer having the target material...
2019/0115224 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a support member to support a substrate,...
2019/0115223 SELF-ALIGNED PLANARIZATION OF LOW-K DIELECTRICS AND METHOD FOR PRODUCING THE SAME
A method of forming a uniform self-aligned low-k layer with a large process window for inserting a memory array with pillar/convex topography and the resulting...
2019/0115222 METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE
A method for forming a semiconductor device structure is provided. The semiconductor device structure includes forming a film over a substrate. The...
2019/0115221 FIN PROFILE IMPROVEMENT FOR HIGH PERFORMANCE TRANSISTOR
A finFET semiconductor device and method for fabricating such a device are presented. The semiconductor device includes a first fin formed in a first...
2019/0115220 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
A method includes etching a dummy gate to form an opening. A gate dielectric layer is deposited in the opening. A blocking layer is deposited over the gate...
2019/0115219 HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE OXIDE THICKNESS OF A FILM
Embodiments described herein generally relate to enable the formation of a metal gate structure with a reduced effective oxide thickness over a similar...
2019/0115218 TRENCH MOSFET WITH DEPLETED GATE SHIELD AND METHOD OF MANUFACTURE
A semiconductor device, method of manufacture of a semiconductor device, and electronic system are disclosed. For example, the semiconductor device includes at...
2019/0115217 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
Polysilicon films (P1,P2) are simultaneously formed on a wafer (W1) and a monitor wafer (W2) under the same growth condition in a wafer process. At least one...
2019/0115216 NANO-COMPOUND FIELD-EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREFOR
The purpose of the present invention is to provide a nano-compound field-effect transistor formed by fusing, on a gate, a channel part having a nano-compound...
2019/0115215 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A vertical semiconductor apparatus includes: a gallium nitride substrate; a gallium nitride semiconductor layer on the gallium nitride substrate; a p-type...
2019/0115214 SEMICONDUCTOR DEVICE AND METHOD FOR FORMING P-TYPE CONDUCTIVE CHANNEL IN DIAMOND USING ABRUPT HETEROJUNCTION
The present application discloses a semiconductor device and a method for forming a p-type conductive channel in a diamond using an abrupt heterojunction,...
2019/0115213 SEMICONDUCTOR PITCH PATTERNING
A semiconductor pitch patterning can include a method comprising forming a first set of spacers on a surface of a substrate. The method can include...
2019/0115212 CORE-SHELL NANOPLATELETS AND USES THEREOF
Disclosed is a formulation of semiconductor nanoplatelets, including at least one nanoplatelet including a nanoplatelet core and a shell on the surface of the...
2019/0115211 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
A semiconductor device is disclosed in which proton implantation is performed a plurality of times to form a plurality of n-type buffer layers in an n-type...
2019/0115210 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Disclosed are a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a chamber having a first housing...
2019/0115209 SILICON-BASED HARDMASK
Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are...
2019/0115208 POLYCRYSTALLINE CERAMIC SUBSTRATE AND METHOD OF MANUFACTURE
A method of fabricating a ceramic substrate structure includes providing a ceramic substrate, encapsulating the ceramic substrate in a barrier layer, and...
2019/0115207 SELECTIVE DEPOSITION OF SILICON OXIDE
Methods and apparatuses for selectively depositing silicon oxide on a silicon oxide surface relative to a silicon nitride surface are described herein. Methods...
2019/0115206 METHOD OF DEPOSITING THIN FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Provided is a method of depositing a thin film on a pattern structure of a semiconductor substrate, the method including (a) supplying a source gas; (b)...
2019/0115205 SILICON CARBIDE WAFER AND METHOD FOR PRODUCTION THEREOF
A method for producing a silicon carbide wafer includes: providing a silicon carbide wafer having an unpolished surface; in which the unpolished surface has a...
2019/0115204 MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM DEPOSITION APPARATUS
In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by...
2019/0115203 Continuous-Wave Laser-Sustained Plasma Illumination Source
An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and...
2019/0115202 MAGNET ASSEMBLY WITH IMPROVED FIELD UNIFORMITY AND METHODS OF MAKING AND USING SAME
An opposed dipole magnet assembly is provided that exhibits higher magnetic field uniformity than traditional magnet assemblies, such as H-shaped magnet...
2019/0115201 APPARATUS FOR MASS ANALYSIS OF ANALYTES BY SIMULTANEOUS POSITIVE AND NEGATIVE IONIZATION
Among other things, we describe methods and apparatus for the ionization of target molecular analytes of interest, e.g., for use in mass spectrometry. In some...
2019/0115200 MASS SPECTROMETER
An aperture member including an opening having a predetermined shape and an image forming optical system having a short focal length are disposed at...
2019/0115199 LUMINESCENCE BASED FIBER OPTIC PROBE FOR THE DETECTION OF RARE EARTH ELEMENTS
The disclosure relates to an apparatus, method and process for detecting rare earth elements. The system includes an LED powered by a first power source and a...
2019/0115198 INFORMATION MANAGEMENT DEVICE FOR MASS SPECTROMETER
An imager 13 takes an image of a sample-placement surface of a sample plate 5. A plate identifier 103 decodes a barcode on the image to acquire a plate ID,...
2019/0115197 SPECIFIC SUBSTANCE MONITORING SYSTEM USING MASS SPECTROMETER
A sample introduction unit 2 regularly collects a sample from a sample passage 1. A measurement unit 3 performs an LC/MS analysis for the collected sample. A...
2019/0115196 Ti-Nb ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREOF
Provided is a Ti--Nb alloy sputtering target containing 0.1 to 30 at % of Nb, the remainder of Ti and unavoidable impurities; and the Ti--Nb alloy sputtering...
2019/0115195 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Disclosed is a substrate processing apparatus including a chamber having a processing space inside, a support unit that supports a substrate in the processing...
2019/0115194 SUBSTRATE SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME
The present invention relates to a substrate supporting member and a substrate processing method. A gas flow path supplying a heat transfer gas to a rear...
2019/0115193 PLASMA PROCESSING APPARATUS AND METHOD
To improve processing uniformity by improving a working characteristic in an edge exclusion region. Provided is a plasma processing apparatus for processing a...
2019/0115192 PLASMA ETCHING APPARATUS AND METHOD
A plasma etching apparatus includes a second electrode configured to support a target substrate thereon, a second RF power supply unit configured to apply a...
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