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Patent # Description
US-7,998,904 Evolving new molecular function
Nature evolves biological molecules such as proteins through iterated rounds of diversification, selection, and amplification. The present invention provides...
US-7,998,903 Glycerol-modified silicone spreading agent and a composition comprising the same
A spreading agent for agricultural chemicals, said spreading agent comprising at least one of the glycerol-modified silicone represented by the following...
US-7,998,902 Use of 5-benzyloxymethyl-1,2-isoxazoline derivatives as a herbicide
The present invention relates to a turf herbicide comprising, as an active ingredient, of 5-benzyloxymethyl-1,2-isoxazoline derivatives of formula (I), which...
US-7,998,901 Heat-sensitive transfer image-receiving sheet and image-forming method
A heat-sensitive transfer image-receiving sheet, having: on a support, at least one receptor layer which contains at least one silicone compound and at least...
US-7,998,900 Photothermal recording medium
A colorless or transparent composition comprises a charge-delocalization compound and a photoacid, wherein the photoacid generates an acid on irradiation or...
US-7,998,899 Catalyst with support structure
The present invention provides a catalyst carrier, catalyst and catalyst precursor comprising a refractory metal oxide and support structure comprising a wire...
US-7,998,898 Sorbent comprising activated carbon, process for making same and use thereof
A sorbent body adapted for abating toxic elements from a fluid stream, such as a carbon combustion flue gas stream or a syngas stream produced in coal...
US-7,998,897 Chromium-free water gas shift catalyst
Catalyst for use in the high temperature shift reaction comprising in its active form a mixture of zinc alumina spinel and zinc oxide in combination with an...
US-7,998,896 Exhaust gas purifying catalyst
An exhaust gas purifying catalyst having a good ignition performance is provided. The exhaust gas purifying catalyst 1 includes a catalyst substrate 3 and a...
US-7,998,895 Catalysts for olefin polymerization
Transition metal complexes of selected monoanionic phosphine ligands, which also contain a selected Group 15 or 16 (IUPAC) element and which are coordinated to...
US-7,998,894 Ligand modified Ziegler-Natta catalyst for olefin (co-)polymerization
The present invention relates to a Ziegler-Natta catalyst comprising a solid, ligand-modified catalyst component formed at least from (a) a compound of Group...
US-7,998,893 Treatment of air to a catalyst regenerator to maintain catalyst activity
The invention relates to a conversion process for making olefin(s) using a molecular sieve catalyst composition. More specifically, the invention is directed to...
US-7,998,892 TiO.sub.2-containing silica glass and optical member for lithography using the same
The present invention provides a TiO.sub.2--SiO.sub.2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is...
US-7,998,891 Optical glass containing bismuth oxide
Optical glass having a refractive index (n.sub.d) of 1.85 or greater, and an Abbe number (.nu..sub.d) falling within the range of 10 to 30, which is suited for...
US-7,998,890 Non-woven composite office panel
Provided herein is a non-stratified, or homogeneous, non-woven composite having (a) strength-imparting fibers of a relatively high denier and (b) binder fibers...
US-7,998,889 Hydroentangled integrated composite nonwoven material
An hydroentangled integrated composite nonwoven material, includes a mixture of randomized continuous filaments, and synthetic staple fibers, where there are no...
US-7,998,888 Thermoplastic starch for use in melt-extruded substrates
A melt-extruded substrate (e.g., film, nonwoven web, etc.) that contains a thermoplastic starch formed from a starch and plasticizer is provided. The starch and...
US-7,998,887 Nonwoven fabric containing ultra-fine fibers, leather-like sheet, and production methods thereof
To provide a nonwoven fabric containing ultra-fine fibers suitable as a leather-like sheet, and also a leather-like sheet with an excellent compactness. A...
US-7,998,886 Hindered amine treated textiles
A treated textile material comprises a plurality of yarns or fibers having a hindered amine or halamine compound disposed on the exterior surface of the yarns...
US-7,998,885 Fine-fiber nonwoven-supported coating structure
This invention relates to a liquid penetration-resistant water-vapor-permeable multi-layer composite material and process for making the same comprising a...
US-7,998,884 Method of forming a light emitting device with a nanocrystalline silicon embedded insulator film
A light emitting device using a silicon (Si) nanocrystalline Si insulating film is presented with an associated fabrication method. The method provides a doped...
US-7,998,883 Process for producing zirconium oxide thin films
This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses...
US-7,998,882 Particle reduction in PECVD processes for depositing low-k material by using a plasma assisted post-deposition step
When forming dielectric materials of reduced dielectric constant in sophisticated metallization systems, the creation of defect particles on the dielectric...
US-7,998,881 Method for making high stress boron-doped carbon films
Transistor architectures and fabrication processes generate channel strain without adversely impacting the efficiency of the transistor fabrication process...
US-7,998,880 Low k dielectric CVD film formation process with in-situ imbedded nanolayers to improve mechanical properties
A low k dielectric stack having an effective dielectric constant k, of about 3.0 or less, in which the mechanical properties of the stack are improved by...
US-7,998,879 Insulation structure for high temperature conditions and manufacturing method thereof
An insulation structure for high temperature conditions and a manufacturing method thereof. In the insulation structure, a substrate has a conductive pattern...
US-7,998,878 Method for selective deposition and devices
A chemical vapor deposition method such as an atomic-layer-deposition method for forming a patterned thin film includes applying a deposition inhibitor material...
US-7,998,877 Diffraction grating in conjunction with reduced thickness to increase efficiency of solar cells
This invention describes a method of making solar cells wherein the efficiency of the solar cell is enhanced by defining a diffraction grating either on top of...
US-7,998,876 Method of producing semiconductor element
A method of producing a semiconductor element includes the steps of forming a wiring portion layer on a substrate; forming an interlayer insulation layer over...
US-7,998,875 Vapor phase repair and pore sealing of low-K dielectric materials
A method of treating a nanoporous low-k dielectric material formed on a semiconductor substrate is provided. The low-k dielectric material has etched openings...
US-7,998,874 Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using...
A method for forming hard mask patterns includes, sequentially forming first, second, and third hard mask layers formed of materials having different etching...
US-7,998,873 Method for fabricating low-k dielectric and Cu interconnect
A system and method for improving the performance of an integrated circuit by lowering RC delay time is provided. A preferred embodiment comprises adding a...
US-7,998,872 Method for etching a silicon-containing ARC layer to reduce roughness and CD
A method of dry developing a multi-layer mask having a silicon-containing anti-reflective coating (ARC) layer on a substrate is described. The method comprises...
US-7,998,871 Mask forming and implanting methods using implant stopping layer
Methods of forming a mask for implanting a substrate and implanting using an implant stopping layer with a photoresist provide lower aspect ratio masks that...
US-7,998,870 Semiconductor device and method for forming using the same
A semiconductor device and a method for forming the same are disclosed. The semiconductor device includes a plurality of bit lines having a uniform width on a...
US-7,998,869 Contact patterning method with transition etch feedback
A method for forming a contact hole in a semiconductor device and related computer-readable storage medium are provided, the method and program steps of the...
US-7,998,868 Self-aligned masks using multi-temperature phase-change materials
A method of forming a pattern includes forming a first layer on a substrate, forming a second layer on the first layer, depositing a multi-temperature...
US-7,998,867 Method for manufacturing epitaxial wafer
An epitaxial wafer is provided capable of eliminating particles in a device process, particles being generated from a scratch in a boundary area between a rear...
US-7,998,866 Silicon carbide polishing method utilizing water-soluble oxidizers
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition...
US-7,998,865 Systems and methods for removing wafer edge residue and debris using a residue remover mechanism
A system (500) removes wafer edge residue from a target wafer (508). A wafer holding mechanism (502) holds and rotates the target wafer (508). A residue remover...
US-7,998,864 Noble metal cap for interconnect structures
An interconnect structure that includes a dielectric material having a dielectric constant of about 3.0 or less is provided. This low k dielectric material has...
US-7,998,863 High efficiency solar cell fabrication
A method of forming a contact structure and a contact structure so formed is described. The structure contacts an underlying layer of a semiconductor junction,...
US-7,998,862 Method for fabricating semiconductor device
A method of fabricating a semiconductor device includes forming a via hole in a semiconductor substrate, forming an isolation layer on an inner side of the via...
US-7,998,861 Method of manufacturing through-via
Disclosed is a method of manufacturing a through-via. The through-via manufacturing method includes forming a core-via hole in a wafer, forming a suction-via...
US-7,998,860 Method for fabricating semiconductor components using maskless back side alignment to conductive vias
A method for fabricating semiconductor components includes the steps of: providing a semiconductor substrate having a circuit side, a back side and conductive...
US-7,998,859 Surface preparation process for damascene copper deposition
A method is disclosed for metallizing a substrate comprising an interconnect feature in the manufacture of a microelectronic device, wherein the interconnect...
US-7,998,858 Vertical interconnect structure, memory device and associated production method
The present invention relates to a method for producing a vertical interconnect structure, a memory device and an associated production method, in which case,...
US-7,998,857 Integrated circuit and process for fabricating thereof
A process for fabricating an Integrated Circuit (IC) and the IC formed thereby is disclosed. The process comprises providing a substrate. The process further...
US-7,998,856 Interconnects with a dielectric sealant layer
Leakage, capacitance and reliability degradation of interconnects fabricated in low-k dielectric materials, particularly porous low-k dielectric material, due...
US-7,998,855 Solving via-misalignment issues in interconnect structures having air-gaps
An integrated circuit structure is provided. The integrated circuit structure includes a semiconductor substrate; and a metallization layer over the...
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