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Patent # Description
US-9,390,923 Methods of removing residual polymers formed during a boron-doped amorphous carbon layer etch process
Methods for removing residual polymers formed during etching of a boron-doped amorphous carbon layer are provided herein. In some embodiments, a method of...
US-9,390,922 Process for forming wide and narrow conductive lines
Sidewall spacers formed on sides of mandrels are separated by first gaps in a first region and separated by wider second gaps in a second region. The second...
US-9,390,921 Adhesion layer for solution-processed transition metal oxides on inert metal contacts
An ammonium thio-transition metal complex is used as an adhesion promoter for immobilizing temperature-stable transition metal oxide layers on an inert metal...
US-9,390,920 Composition including material, methods of depositing material, articles including same and systems for...
Methods for depositing nanomaterial onto a substrate are disclosed. Also disclosed are compositions useful for depositing nanomaterial, methods of making...
US-9,390,919 Method of forming semiconductor film and photovoltaic device including the film
A method of depositing a kesterite film which includes a compound of the formula: Cu.sub.2-xZn.sub.1+ySn(S.sub.1-zSe.sub.z).sub.4+q, wherein ...
US-9,390,918 Manufacturing method of semiconductor device
Disclosed is a semiconductor device using an oxide semiconductor, with stable electric characteristics and high reliability. In a process for manufacturing a...
US-9,390,917 Closed-space sublimation process for production of CZTS thin-films
In one embodiment, a method includes depositing a CZT(S, Se) precursor layer onto a substrate, introducing a source-material layer comprising Sn(S, Se) into...
US-9,390,916 Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory...
A method of manufacturing a semiconductor device can enhance controllability of the diameters of grains of a film containing a predetermined element such as a...
US-9,390,915 Methods and systems for improved uniformity of SiGe thickness
A process is used to form a protective layer to cover a divot between two regions of a semiconductor material. During etching processes, the protective layer...
US-9,390,914 Wet oxidation process performed on a dielectric material formed from a flowable CVD process
Methods of performing a wet oxidation process on a silicon containing dielectric material filling within trenches or vias defined within a substrate are...
US-9,390,913 Semiconductor dielectric interface and gate stack
A semiconductor/dielectric interface having reduced interface trap density and a method of manufacturing the interface are disclosed. In an exemplary...
US-9,390,912 Film forming method
A film forming method for forming a thin film composed of a SiOCN layer containing at least silicon (Si), oxygen (O), carbon (C) and nitrogen (N) on a surface...
US-9,390,911 Method of manufacturing semiconductor device
A method includes: forming a thin film on a substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a source gas to...
US-9,390,910 Gas flow profile modulated control of overlay in plasma CVD films
Methods for modulating local stress and overlay error of one or more patterning films may include modulating a gas flow profile of gases introduced into a...
US-9,390,909 Soft landing nanolaminates for advanced patterning
Methods for depositing nanolaminate protective layers over a core layer to enable deposition of high quality conformal films over the core layer for use in...
US-9,390,908 Method and device for manufacturing a barrier layer on a flexible substrate
The invention provides a method for manufacturing a barrier layer on a substrate, the method comprising: providing a substrate with an inorganic oxide layer...
US-9,390,907 Film forming method of SiCN film
A method of forming an SiCN film on a surface to be processed of an object, the method including: supplying an Si source gas containing an Si source into a...
US-9,390,906 Method for creating asymmetrical wafer
The present invention consists of a method for imparting asymmetry to a truncated annular wafer by either rounding one corner of the orientation flat, or...
US-9,390,905 Method for manufacturing silicon substrate and silicon substrate
A method for manufacturing a silicon substrate, including: performing a rapid heat treatment to a silicon substrate with a rapid-heating and rapid-cooling...
US-9,390,904 Substrate processing apparatus and substrate processing method
A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, and a chamber. The substrate rotating mechanism incudes an...
US-9,390,903 Method and apparatus for wafer backgrinding and edge trimming on one machine
A workpiece processing apparatus is provided. The apparatus includes a rotary turntable having one or more spindles thereon, the turntable being configured to...
US-9,390,902 Method and system for controlling convective flow in a light-sustained plasma
A system for controlling convective flow in a light-sustained plasma includes an illumination source configured to generate illumination, a plasma cell...
US-9,390,901 System and method for liquid extraction electrospray-assisted sample transfer to solution for chemical analysis
A system for sampling a surface includes a surface sampling probe comprising a solvent liquid supply conduit and a distal end, and a sample collector for...
US-9,390,900 Mass spectrometer
A mass spectrometer of ionizing a sample by a dielectric barrier discharge under a reduced pressure. An ionization with inconsiderable fragmentation can be...
US-9,390,899 Apparatus and method for sampling of confined spaces
In various embodiments of the invention, a cargo container can be monitored at appropriate time intervals to determine that no controlled substances have been...
US-9,390,898 System and method for fusing chemical detectors
Two complementary approaches to the science of IMS technology, IMS and differential IMS (DIMS), are combined into a single instrument to provide improvements in...
US-9,390,897 Mass spectrometry
A method of searching for potentially unknown metabolites of pharmaceutical compounds is disclosed. The accurate mass of a pharmaceutical compound will...
US-9,390,896 Data directed acquisition of imaging mass
A method of ion imaging is disclosed comprising scanning a sample at a first resolution and acquiring first mass spectral data related to a first pixel...
US-9,390,895 Gas injector particle removal process and apparatus
A sonic cleaning tool having a component retaining fixture, a sonic bath, and a cleaning fluid circulating system. The sonic bath has a sound field transducer...
US-9,390,894 Modular microplasma microchannel reactor devices, miniature reactor modules and ozone generation devices
A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and...
US-9,390,893 Sub-pulsing during a state
A method for achieving sub-pulsing during a state is described. The method includes receiving a clock signal from a clock source, the clock signal having two...
US-9,390,892 Laser sustained plasma light source with electrically induced gas flow
A laser sustained plasma light source includes a plasma bulb containing a working gas flow driven by an electric current sustained within the plasma bulb....
US-9,390,891 Apparatus for charged particle lithography system
An apparatus for use in a charged particle multi-beam lithography system is disclosed. The apparatus includes a plurality of charged particle doublets each...
US-9,390,890 High-energy ion implanter
A high-energy ion implanter includes a high-energy multi-stage linear acceleration unit that accelerates an ion beam so as to generate a high-energy ion beam, a...
US-9,390,889 Ion implanter and method of ion beam tuning
An energy analysis slit of an ion implanter is configured to enable switching between a standard slit opening used for implantation processing performed under a...
US-9,390,888 Apparatus and method of applying small-angle electron scattering to characterize nanostructures on opaque substrate
An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an...
US-9,390,887 Non-invasive charged particle beam monitor
An electromagnetic wakefield detector placed in close proximity to a design trajectory of a non-relativistic charged particle beam produces an optical signal in...
US-9,390,886 Electro-optical inspection apparatus using electron beam
An electron beam apparatus for capturing images by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by...
US-9,390,885 Superposition measuring apparatus, superposition measuring method, and superposition measuring system
When a scanning electron microscope is used to measure a superposition error between upper-layer and lower-layer patterns, an SN of the lower-layer pattern may...
US-9,390,884 Method of inspecting a semiconductor substrate
A semiconductor substrate inspection system includes an e-beam inspection system configured to deliver electrons to a specimen semiconductor substrate. A sensor...
US-9,390,883 Implantation apparatus with ion beam directing unit, semiconductor device and method of manufacturing
An ion implantation apparatus includes an ion beam directing unit, a substrate support, and a controller. The controller is configured to effect a relative...
US-9,390,882 Apparatus having a magnetic lens configured to diverge an electron beam
Apparatus having a magnetic lens configured to diverge an electron beam are useful in three-dimensional imaging using an electron microscope. The magnetic lens...
US-9,390,881 X-ray sources using linear accumulation
A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions...
US-9,390,880 Method for driving multi electric field emission devices and multi electric field emission system
Provided is a method of driving multi electrical field emission devices. The method includes: respectively connecting first current control circuit devices for...
US-9,390,879 Magnetron power supply
A power supply for a magnetron has a PFC DC voltage source and an HV (High Voltage) converter. The voltage source is mains driven and supplies DC voltage above...
US-9,390,878 Electron emission source
An electron emission source includes a first electrode, a semiconductor layer, an insulating layer, and a second electrode stacked in that sequence, wherein an...
US-9,390,877 RF MEMS based large scale cross point electrical switch
This disclosure provides systems, methods, and apparatus for providing a crosspoint switch used in an optical fiber data network. The crosspoint switch can...
US-9,390,876 Laminate-type actuator
A laminate-type actuator including a laminate wherein an electrostrictive material layer is wound and laminated in a form of a tube together with first and...
US-9,390,875 Electromagnetic opposing field actuators
Electromagnetic actuators capable of generating a symmetrical bidirectional force are disclosed. The electromagnetic actuators include a housing made of a...
US-9,390,874 Device for detecting and signaling a change in the state of a push button
A device for detecting and signalling a change of state of a push-button, for example of emergency stop type. The device is in a form of an attachment that can...
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