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Mask passivation using plasma
A gas comprising hydrogen is supplied to a plasma source. Plasma comprising hydrogen plasma particles is generated from the gas. A passivation layer is...
Gas treatment method
A gas processing method is described. A workpiece is mounted on a platform in a chamber on which a silicon oxide film is formed on a surface of the workpiece;...
Wet etching of silicon containing antireflective coatings
Provided are methods for processing semiconductor substrates or, more specifically, etching silicon containing antireflective coatings (SiARCs) from the...
Method of forming a non volatile memory device using wet etching
In one embodiment, a method of forming a semiconductor device is disclosed. A high-k dielectric is deposited of over a semiconductor body, and a portion of the...
Method for etching etching target layer
Disclosed is an etching method for etching an etching target layer. The etching method includes: a first step of depositing a plasma reaction product on a mask...
Method for integrated circuit patterning
A method includes forming a resist over a substrate, resulting in a layer of resist scum between the resist and the substrate. The method further includes...
Method of manufacturing a display substrate using two etch masks
Provided are a display substrate, a display device, and a method of manufacturing the display substrate. The display substrate includes: a substrate in which a...
Use of topography to direct assembly of block copolymers in
A method is provided for forming a patterned topography on a substrate. The substrate is provided with features formed atop that constitute an existing...
Plasma-enhanced etching in an augmented plasma processing system
Methods for etching a substrate in a plasma processing chamber having at least a primary plasma generating region and a secondary plasma generating region...
Selective etch of silicon by way of metastable hydrogen termination
Methods of etching exposed silicon on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing...
Sensor component for a gas and/or liquid sensor, production method for a
sensor component for a gas and/or...
A sensor component is described for a gas and/or liquid sensor having a substrate having at least one first printed conductor and a second printed conductor,...
Methods of forming titanium-aluminum layers for gate electrodes and
related semiconductor devices
Methods of forming a semiconductor device are provided in which a first titanium-aluminum layer is formed in a recess. A first titanium layer is formed in the...
Method of manufacturing semiconductor device, substrate processing
apparatus, and non-transitory...
A halogen element-containing metal material and a nitrogen-containing material are alternately supplied to a process chamber with a flow rate of an inert gas...
Semiconductor device including buried gate, module and system, and method
An embodiment of the semiconductor device includes a recess formed in an active region, a gate buried in a lower part of the recess, a first capping insulation...
Method for forming a stacked layer structure
The present invention provides a method for forming a stacked layer structure, including: first, a recess is provided, next, an oxide layer is formed in the...
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device that sufficiently activates a deep ion injection layer and fully recovers lattice defects generated in the ion...
Method for manufacturing a semiconductor device
A wafer includes a semiconductor layer having a concentration of n-dopants. A first mask is formed on the wafer and has first openings in an active area of a...
Semiconductor device and method for forming a semiconductor device
A method includes forming an emitter at the first side of a semiconductor substrate by doping, wherein the dopant concentration is higher in the emitter than in...
Cavity structure using patterned sacrificial layer
A method includes forming a sacrificial layer over a bottom substrate. The sacrificial layer is patterned based on a desired etching distance. A top layer is...
Methods of forming patterns with a mask formed utilizing a brush layer
Some embodiments include methods of forming patterns. A first mask is formed over a material. The first mask has features extending therein and defines a first...
Lithography system and method for haze elimination
The present disclosure provides an apparatus in semiconductor manufacturing. The apparatus includes a mask, a pellicle frame attached to the mask, and a...
Selective dopant junction for a group III-V semiconductor device
An approach to providing a method of forming a dopant junction in a semiconductor device. The approach includes performing a surface modification treatment on...
Method for forming semiconductor device with SEG film active region
A semiconductor device and a method for manufacturing the same are provided. A barrier film is formed in a device separating structure, and the device...
Selenium interlayer for high-efficiency multijunction solar cell
A multi-junction solar cell is provided and includes multiple semiconducting layers and an interface layer disposed between the multiple semiconducting layers....
Method for manufacturing ordered nanowire array of NiO doped with Pt in
The present disclosure provides a method for manufacturing ordered nanowires array of NiO doped with Pt in situ, comprising: growing a Ni layer on a...
Coating liquid for forming metal oxide thin film, metal oxide thin film,
field-effect transistor, and method...
A coating liquid for forming a metal oxide thin film includes: an inorganic indium compound; an inorganic calcium compound or an inorganic strontium compound,...
Type III-V and type IV semiconductor device formation
Forming a semiconductor device is disclosed, according to embodiments of the present disclosure. Forming the semiconductor device can include forming a first...
Silicon carbide semiconductor device manufacturing method and silicon
carbide semiconductor device
Silicon-containing gas, carbon-containing gas, and chlorine-containing gas are introduced into a reacting furnace. Next, a SiC epitaxial film is grown on the...
Method for the fabrication and transfer of graphene
Provided herein are processes for transferring high quality large-area graphene layers (e.g., single-layer graphene) to a flexible substrate based on...
Electronic device and method for fabricating the same
An electronic device with improved variable resistance characteristics and a method for fabricating the same are provided. In an embodiment of the disclosed...
Semiconductor device manufacturing method and substrate treatment system
A semiconductor device manufacturing method that includes: forming a gate insulating film containing a hafnium oxide and a zirconium oxide on a workpiece having...
Polyoxometalate and heteropolyoxometalate compositions and methods for
The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one...
Methods for manufacturing semiconductor devices
The present disclosure provides a method of manufacturing a semiconductor device having silicon nitride with a tensile stress, the method comprising: c1)...
System and methods for spin-on coating of self-assembled monolayers or
periodic organosilicates on a substrate
This disclosure relates to a processing system for spin-coating a substrate with Molecular Self-assembly (MSA) chemicals to form photoresist films and/or low...
Synthetic diamond coated compound semiconductor substrates
A method of fabricating a synthetic diamond coated compound semiconductor substrate, the method comprising: loading a composite substrate into a chemical vapor...
Method of forming a dielectric film
A method for flowable oxide deposition is provided. An oxygen source gas is increased as a function of time or film depth to change the flowable oxide...
Method for precision cleaning and drying flat objects
Cleaning and drying of semiconductor wafers is carried out in a single-chamber type cleaning/drying apparatus for flat objects such as semiconductor wafer,...
Methods for bonding semiconductor wafers
A method of bonding a cap wafer to a device wafer includes heating the device wafer and the cap wafer in the chamber, cooling the device wafer and the cap wafer...
Low pressure lamp using non-mercury materials
A mercury-free low-pressure lamp having a bulb is provided. The bulb includes a non-mercury emissive material. When the bulb is in a non-operational state, the...
Characterization of petroleum saturates
A method for characterizing the saturates portion of a petroleum or hydrocarbon sample that includes compounds with boiling points of 1000.degree. F....
Methods of ion source fabrication
A method of ion source fabrication for a mass spectrometer includes simultaneously forming aligned component portions of an ion source using direct metal laser...
Ion optical system for mass spectrometer
A mass spectrometer includes: a plasma generation device for generating plasma for ionizing an introduced sample; an interface device for drawing the plasma...
Method and device for mass spectrometry
A mass spectrometry is equipped with a liquid specimen supply part which supplies a liquid specimen sandwiched between bubbles, an ion source part ionizes the...
Lock component corrections
A method of mass spectrometry is disclosed comprising initially calibrating or recalibrating a mass spectrometer at a time T.sub.0 and at the same time...
A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure,...
Plasma processing apparatus, plasma processing method and high frequency
A plasma processing apparatus includes a plasma generating device configured to generate a plasma within a processing vessel by using a high frequency wave...
Cold plasma treatment devices and associated methods
A cold plasma helmet application device for delivery of cold plasma benefits to the head of a patient. An appropriate gas is introduced into a helmet receptacle...
Asymmetrical detector design and methodology
A charged particle detection device has an active portion for configured to produce a signal in response secondary charged particles emitted from a sample...
Charged particle beam device and sample observation method
A sample observation method includes irradiating a sample with a primary charged particle beam, detecting a secondary charged particle signal obtained by the...
Focused ion beam apparatus and control method thereof
A focused ion beam apparatus has an emitter for emitting an ion beam, an ion source chamber accommodating the emitter, a cooling unit and a heating unit for...