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Patent # Description
US-9,448,510 Image forming apparatus for forming image by using developer including toner and carrier
An image forming apparatus includes an image carrier, a first guide portion, a developing portion, and a second guide portion. The first guide portion forms a...
US-9,448,509 Developing device
A developing device and image forming apparatus are provided. The developing device includes a chassis; a developer carrying member; a thickness regulating...
US-9,448,508 Development device and image forming apparatus including the same
A development device includes a developer container, a developer bearing member, a mixing/transporting member, an opening/closing member, and a drive mechanism....
US-9,448,507 Nozzle receiver, powder container, and image forming apparatus
A nozzle receiver for use with a powder container includes: a shutter to open an opening of the nozzle receiver to an opening position when the shutter is...
US-9,448,506 Developer discharge structure and image forming apparatus
A developer discharge structure includes a tube-shaped container portion disposed in an apparatus body and holding developer, the container portion having an...
US-9,448,505 Developing cartridge
A developing cartridge may include multiple rotary members, at least one of the rotary members configured to be detected by an image forming apparatus. In one...
US-9,448,504 Developing roller
A roller (1) is provided, which is free from imaging failures even if being used as a developing roller, for example, in combination with a toner including...
US-9,448,503 Image forming apparatus
Disclosed is an image forming apparatus, including: n laser elements arranged in the sub-scanning direction and configured to simultaneously scan an image; a...
US-9,448,502 Charging member, process cartridge and electrophotographic apparatus
A charging member including an electro-conductive substrate, an electro-conductive elastic layer, and an electro-conductive surface layer, wherein the elastic...
US-9,448,501 Toner for developing electrostatic image, image forming apparatus, image forming method, and process cartridge
A toner for developing an electrostatic image, which contains: resin particles (C), wherein the resin particles (C) each contain a resin particle (B) and resin...
US-9,448,500 Magnetic iron oxide particles, magnetic carrier for electrophotographic developers and process for producing...
The present invention provides magnetic iron oxide particles having a high bonding property to a resin as well as a magnetic carrier for electrophotographic...
US-9,448,499 Electrophotographic toner using bioplastic and method of producing the same
An electrophotographic toner having good grindability, and excellent fixability and durability, and a method of producing the same are provided. The...
US-9,448,498 Electrophotographic printer photoconductor based on ligand-free semiconductor quantum dots
A photoconductor and method of forming a photoconductor for an electrophotographic device comprising forming a charge generation material comprising a plurality...
US-9,448,497 Overcoat formulation for long-life electrophotographic photoconductors and method for making the same
An overcoat layer and method to make an overcoated photoconductor drum of an electrophotographic image forming device using irradiation such as with electron...
US-9,448,496 Electrophotographic photosensitive member
An electrophotographic photosensitive member includes a conductive substrate and a photosensitive layer. The photosensitive layer includes a charge generating...
US-9,448,495 Resist pattern calculation method and calculation program storage medium
A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating...
US-9,448,494 Lithographic apparatus and device manufacturing method
A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in...
US-9,448,493 Exposure method, exposure apparatus, and method for producing device
An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system...
US-9,448,492 Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus
A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about...
US-9,448,491 Extreme ultraviolet lithography process and mask
A system of an extreme ultraviolet lithography (EUVL) is disclosed. an extreme ultraviolet lithography (EUVL) system includes an extreme ultraviolet (EUV)...
US-9,448,490 EUV lithography system
An EUV lithography system 1 comprises an EUV beam path and a monitor beam path 51. The EUV beam path comprises a mirror system 13, which has a base and a...
US-9,448,489 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system...
US-9,448,488 Off-axis alignment system and alignment method
An off-axis alignment system includes, sequentially along a transmission path of a light beam, an illumination module (10), an interference module (20) and a...
US-9,448,487 Method of manufacturing semiconductor and exposure system
A method of manufacturing semiconductor and an exposure system are provided. The method includes the following step. A material layer is formed on a substrate....
US-9,448,486 Photoresist pattern trimming compositions and methods
Provided are compositions and methods for trimming a photoresist pattern. The photoresist pattern trimming composition comprises: a matrix polymer comprising a...
US-9,448,485 Composition for forming fine resist pattern and pattern forming method using same
[Object] To provide a composition enabling to form a fine negative photoresist pattern free from troubles, such as, surface roughness, bridge defects, and...
US-9,448,484 Sloped electrode element for a torsional spatial light modulator
A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD-type pixel, by depositing a photoresist spacer layer upon a substrate. The...
US-9,448,483 Pattern shrink methods
Pattern shrink methods comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) providing a resist pattern over the...
US-9,448,482 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using...
There is provided a pattern forming method including (1) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing a resin...
US-9,448,481 Generalization of shot definitions for mask and wafer writing tools
Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One...
US-9,448,480 Resist underlayer film formation composition and method for forming resist pattern using the same
The present invention provides a novel resist underlayer film formation composition for lithography. A resist underlayer film formation composition for...
US-9,448,479 Photosensitive resin composition, resist laminate, and articles obtained by curing same (7)
The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a...
US-9,448,478 Chemically amplified positive-type photosensitive resin composition for thick-film application
A chemically amplified positive-type photosensitive resin composition for thick-film application capable of forming a resist pattern having a nonresist section...
US-9,448,477 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method,...
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific...
US-9,448,476 Photoresist composition and method of manufacturing a thin film transistor substrate
A photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer...
US-9,448,475 Photoresist composition, compound and process of producing photoresist pattern
A photoresist composition comprising a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0). ##STR00001##
US-9,448,474 Positive photosensitive resin composition and pattern forming method
A positive photosensitive resin composition, a pattern forming method, a thin film transistor array substrate, and a liquid crystal display device are provided....
US-9,448,473 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity...
US-9,448,472 Optical pattern transfer mask and method of fabricating the same
An optical pattern transfer mask includes a light transmissive substrate, a reflection layer pattern on a plurality of first regions of the light transmissive...
US-9,448,471 Photo-mask and method of manufacturing semiconductor structures by using the same
The present invention provides a photo-mask for manufacturing structures on a semiconductor substrate, which comprises a photo-mask substrate, a first pattern,...
US-9,448,470 Method for making a mask with a phase bar in an integrated circuit design layout
A method for making a mask includes receiving an integrated circuit (IC) design layout and identifying at least one targeted-feature-surrounding-location (TFSL)...
US-9,448,469 Reflective mask blank for EUV lithography, or reflective layer-coated substrate for EUV lithography, and...
To provide a process for producing an EUV mask blank, whereby mixing at each interface between layers constituting a Mo/Si multilayer reflective film during a...
US-9,448,468 Reflective mask blank and reflective mask, and methods for manufacturing reflective mask blank and reflective mask
A reflective mask blank, a reflective mask, and methods for manufacturing those, which suppress reflectance at a light-shielding frame. The reflective mask...
US-9,448,467 Mask shift resistance-inductance method for multiple patterning mask design and a method for performing the same
A system and method comprising providing a layout of an integrated circuit design, generating, by a processor, a plurality of multiple patterning decompositions...
US-9,448,466 Display device and drive method for display device
A display device having a simple circuit configuration and capable of lowering power consumption, and a drive method for the display device are provided....
US-9,448,465 Projection screen with gold coated projection receiving surface
A projection screen has a gold coated projection receiving surface that reflects light. The projection screen includes a support structure and an adhesive layer...
US-9,448,464 Projector and projecting lens of the projector
A projector includes an image beam generator and a projecting lens. The projecting lens includes a relay system and a projection system. The relay system has a...
US-9,448,463 Focus control in continuous shooting in digital photographing apparatus
A digital photographing apparatus includes a focus lens, a focus detection unit that detects focus in a contrast auto focusing (AF) method by moving the focus...
US-9,448,462 Pulse width modulation control of solenoid motor
A drive mechanism configured to drive a thermally isolated actuator between two positions. The drive mechanism includes a rotary actuated motor configured to...
US-9,448,461 Light conversion member and display device having the same
Disclosed are a light conversion member and a display device having the same. The display device includes a light source, and a light conversion member adjacent...
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