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Method of manufacturing thermal insulation wall body
A method of manufacturing a cylindrical thermal insulation wall body having a holding unit of a heater element formed in an inner peripheral surface includes...
Heat treatment furnace and heat treatment apparatus
A heat treatment furnace includes: a processing vessel configured to accommodate therein at least one object to be processed; a cylindrical heat insulating...
System for the heat treatment of substrates, and method for detecting
measurement data in said system
The present invention relates to a device (100) for the heat treatment of substrates and to a method for recording measurement data in said device, where said...
Treatment liquid supply apparatus and substrate treatment apparatus
including the same
A treatment liquid supply apparatus supplies a treatment liquid to a predetermined object for treatment of a substrate, and recovers the supplied treatment...
Substrate cleaning apparatus and substrate processing apparatus
A substrate cleaning apparatus which can sufficiently clean a pen-sponge in its entirety, and can prevent particles, which have been once removed, from being...
Systems and methods for drying high aspect ratio structures without
collapse using stimuli-responsive...
Systems and methods for drying a substrate including a plurality of high aspect ratio (HAR) structures is performed after at least one of wet etching and/or wet...
Organic electronic devices
A technique comprising: mounting a device substrate on a processing support, forming one or more electronic elements on the device substrate with the device...
Semiconductor device manufacturing method
A method of manufacturing a semiconductor device, includes preparing a molding die for molding a resin case for a semiconductor device, the molding die having...
Liquid composition used in etching multilayer film containing copper and
molybdenum, manufacturing method of...
The present invention provides a liquid composition used for etching a multilayer film containing copper and molybdenum, an etching method for etching a...
Etching method, and recording medium
An etching method includes a modification process of supplying a mixture gas to a surface of a silicon oxide film, modifying the silicon oxide film to generate...
Substrate processing system, gas supply unit, method of substrate
processing, computer program, and storage medium
The present invention is to provide a technique for uniformly processing a substrate surface in the process of processing a substrate by supplying a gas. The...
Methods of patterning features having differing widths
A method includes forming a layer of material above a semiconductor substrate and performing a first sidewall image transfer process to form a first plurality...
Methods of fabricating features associated with semiconductor substrates
Some embodiments include a method of fabricating features associated with a semiconductor substrate. A first region of the semiconductor substrate is altered...
Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device includes forming a second insulating layer over a first insulating layer, forming a mask over the second...
Line width roughness improvement with noble gas plasma
A method for forming lines in an etch layer on a substrate may comprise providing a ultra-violet (UV) producing gas to a vacuum chamber having a photoresist...
Method and apparatus for improving CMP planarity
Provided is a method of planarizing a semiconductor device. A dielectric layer is formed over a substrate. A plurality of openings is formed in the dielectric...
Method and apparatus for direct formation of nanometer scaled features
An apparatus and use of the apparatus to form nanometer sized features on a workpiece includes a plurality of individually biasable tips, and each tip has a...
Combinatorial methods for developing electrochromic materials and devices
A substrate having a plurality of site-isolated regions defined thereon is provided. A first electrochromic material, or a first electrochromic device stack, is...
CMOS gas sensor and method for manufacturing the same
A CMOS gas sensor comprises a membrane (13) extending over an opening (12) of a silicon substrate (1). A patch (2) of sensing material is arranged on the...
Method for fabricating a silicon-oxide-nitride-oxide-silicon (SONOS)
non-volatile memory cell
The invention provides a method for fabricating a silicon-oxide-nitride-oxide-silicon (SONOS) non-volatile memory cell, comprising: (S1) forming a pad oxide...
Spacer formation with straight sidewall
Disclosed herein is a semiconductor device comprising a first dielectric disposed over a channel region of a transistor formed in a substrate and a gate...
Chemical dielectric formation for semiconductor device fabrication
Systems and methods are provided for fabricating semiconductor devices. For example, a substrate is provided. A polymer layer is formed on the substrate. An...
Selective growth for high-aspect ration metal fill
An improved conductive feature for a semiconductor device and a technique for forming the feature are provided. In an exemplary embodiment, the semiconductor...
Sense amplifier layout for FinFET technology
A sense amplifier (SA) comprises a semiconductor substrate having an oxide definition (OD) region, a pair of SA sensing devices, a SA enabling device, and a...
Method of lateral oxidation of NFET and PFET high-K gate stacks
A method for fabricating a semiconductor circuit includes obtaining a semiconductor structure having a gate stack of material layers including a high-k...
Methods of forming a semiconductor device with a spacer etch block cap and
the resulting device
One illustrative method disclosed herein includes, among other things, forming a sacrificial gate structure above a semiconductor substrate, forming a sidewall...
Beam shapers, annealing systems employing the same, methods of heat
treating substrates and methods of...
A treatment system comprises an energy source that generates a energy beam that is emitted along an energy beam pathway. A beam section shaper is positioned...
Process for forming edge wordline implants adjacent edge wordlines
A process for forming tilted edge wordline implants is disclosed. The process includes forming a first drain implant in a substrate, forming a first tilted...
Metal-semiconductor contact structure with doped interlayer
Disclosed herein is a method of forming a metal-to-semiconductor contact with a doped metal oxide interlayer. An insulating layer is formed on a top surface of...
Photolithographic methods of producing structures in radiation-emitting
A photolithographic method which produces a structure in a radiation-emitting semiconductor component by providing a semiconductor wafer having a semiconductor...
Method for integrated circuit patterning
A method of forming a target pattern includes forming a first trench in a substrate with a cut mask; forming a first plurality of lines over the substrate with...
Conductor pattern forming method, and semiconductor device manufacturing
A conductor pattern forming method includes forming, on a conductor film, a laminated film including a first layer thinner than the conductor film, a second...
Manufacturing method of semiconductor device
A manufacturing method of a semiconductor device is provided. The manufacturing method includes the following steps. A plurality of fin structures are formed in...
Film deposition apparatus and film deposition method
A film deposition apparatus includes a turntable to rotate a substrate thereon, a process gas supply part to supply a process gas to form a thin film on the...
Electronic device and epitaxial multilayer wafer of group III nitride
semiconductor having specified...
The present invention discloses an electronic device using a group III nitride substrate fabricated via the ammonothermal method. By utilizing the high-electron...
Cleaning process for oxide
A cleaning process for oxide includes the following step. A substrate having a first area and a second area is provided. A first oxide layer is formed on the...
System and process for high-density, low-energy plasma enhanced vapor
A process for epitaxial deposition of compound semiconductor layers includes several steps. In a first step, a substrate is removably attached to a substrate...
Film forming method and film forming apparatus
A method of forming an oxide film on an object to be processed, includes: supplying a film-forming raw material gas into a processing chamber; performing at...
Method of manufacturing semiconductor device, substrate processing
apparatus, and semiconductor device
There are provided a method of manufacturing a semiconductor device, a substrate processing apparatus, and a semiconductor device. The method allows rapid...
Film-forming method for forming silicon oxide film on tungsten film or
tungsten oxide film
A film-forming method includes forming a tungsten film or a tungsten oxide film on an object to be processed, forming a seed layer on the tungsten film or the...
An ashing device that prevents the ashing rate from changing over time. The ashing device ashes organic material on a substrate including an exposed metal in a...
Triple quadrupole mass spectrometer
The present triple quadrupole mass spectrometer determines the relationship between a parameter, such as the mass-to-charge ratio of a precursor ion or that of...
Coaxial ion guide
A method of mass and/or ion mobility spectrometry is disclosed comprising: trapping ions in an annular or co-axial ion trap; and then axially ejecting at least...
An ion guide is disclosed comprising one or more layers of intermediate planar, plate or mesh electrodes. A first array of first electrodes is provided on a...
Systems and methods for using interleaving window widths in tandem mass
Systems and methods are provided for analyzing a sample using overlapping measured mass selection window widths. A mass range of a sample is divided into two or...
Systems and methods for acquiring data for mass spectrometry images
Systems and methods are provided for maximizing the data acquired from a sample in a mass spectrometry imaging experiment. An ion source device is instructed to...
Remote plasma source for controlling plasma skew
A plasma source is provided including a core element extending from a first end to a second end along a first axis. The plasma source further includes one or...
Shower head, plasma processing apparatus and plasma processing method
A shower head includes a gas injection plate and a gas supply unit. The gas supply unit has a first gas supply path provided in a region along the axis and a...
Ion implantation apparatus
An ion implantation apparatus includes: a plurality of units for accelerating an ion beam generated in an ion source; and a plurality of units for adjusting a...
Determination of semiconductor chamber operating parameters for the
optimization of critical dimension uniformity
Methods, systems, and computer programs are presented for optimizing Critical Dimension Uniformity (CDU) during the processing of a substrate. One method...