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Cyclic spacer etching process with improved profile control
Embodiments described herein relate to methods for patterning a substrate. Patterning processes, such as double patterning and quadruple patterning processes,...
Silicon oxide selective removal
A method of etching exposed silicon oxide on patterned heterogeneous structures is described and includes a gas phase etch using plasma effluents formed in a...
BARC-assisted process for planar recessing or removing of variable-height
The present disclosure provides a method of manufacturing an integrated circuit device in some embodiments. In the method, a semiconductor substrate is...
Method of semiconductor integrated circuit fabrication
A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes providing a substrate. A first dielectric layer is deposited...
Removable templates for directed self assembly
A sacrificial-post templating method is presented for directing block copolymer (BCP) self-assembly to form nanostructures of monolayers and bilayers of...
Apparatus and methods for shielding a plasma etcher electrode
Apparatus and methods for plasma etching are disclosed. In one embodiment, a method of etching a plurality of features on a wafer includes positioning a wafer...
Semiconductor structures having low resistance paths throughout a wafer
A semiconductor structure with low resistance conduction paths and methods of manufacture are disclosed. The method includes forming at least one low resistance...
Semiconductor device and manufacturing method thereof
A number of variations may include a method that may include depositing a first layer on a first semiconductor epi layer (epitaxial layer) in an overlying...
Fabrication of higher-k dielectrics
A method of manufacturing a semiconductor structure, and the resultant structure. The method includes forming an oxide layer above a substrate. The method...
Method for fabricating an improved GAN-based semiconductor layer
The invention relates to a post-activation method of dopants in a doped and activated GaN-base semiconductor layer, including the following successive steps:...
Method of vapor-diffusing impurities
A method of vapor-diffusing impurities into a diffusion region of a target substrate to be processed using a dummy substrate is provided. The method includes...
Methods for fabricating refined graphite-based structures and devices made
Graphite-based devices with a reduced characteristic dimension and methods for forming such devices are provided. One or more thin films are deposited onto a...
Optically tuned hardmask for multi-patterning applications
The embodiments herein provides methods for forming a PVD silicon oxide or silicon rich oxide, or PVD SiN or silicon rich SiN, or SiC or silicon rich SiC, or...
Method for depositing a group III nitride semiconductor film
A method for depositing a Group III nitride semiconductor film on a substrate is provided that comprises: providing a sapphire substrate; placing the substrate...
Sulfur-containing thin films
In some aspects, methods of forming a metal sulfide thin film are provided. According to some methods, a metal sulfide thin film is deposited on a substrate in...
Method of manufacturing semiconductor element
A method of manufacturing a semiconductor element includes a first step of epitaxially growing an AlN layer on a substrate, a second step of forming a buffer...
Method of manufacturing semiconductor device for forming film including at
least two different elements
Provided is a technique of forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes: forming a first layer by...
Semiconductor manufacturing apparatus and method of manufacturing
In one embodiment, a semiconductor manufacturing apparatus includes a belt supporting module including a first portion that is provided around a first axis, a...
Method for forming film having low resistance and shallow junction depth
A method for forming on a substrate a doped silicon oxide film with a cap film, includes: forming an arsenosilicate glass (ASG) film as an arsenic (As)-doped...
Method for hydrophobization of surface of silicon-containing film by ALD
A method is for hydrophobization of a surface of a silicon-containing film by atomic layer deposition (ALD), wherein the surface is subjected to atmospheric...
Method of manufacturing semiconductor device, substrate processing method,
substrate processing apparatus, and...
A thin film that has a predetermined composition and containing predetermined elements is formed on a substrate by performing a cycle of steps a predetermined...
Semiconductor manufacturing apparatus and method of manufacturing
In one embodiment, a semiconductor manufacturing apparatus includes a container configured to contain a wafer, and a supporter configured to support the wafer...
Method to tune TiO.sub.x stoichiometry using atomic layer deposited Ti
film to minimize contact resistance for...
Methods of depositing and tuning deposition of sub-stoichiometric titanium oxide are provided. Methods involve depositing highly pure and conformal titanium on...
Method of forming nitride film with plasma
Disclosed is a method of forming a nitride film on a substrate to be processed ("processing target substrate") in a processing container. The method includes an...
Method for coating a workpiece
In various embodiments, a method for coating a workpiece is provided. The method may include drying a workpiece, the workpiece being coated with at least one...
Systems and methods for removing particles from a substrate processing
chamber using RF plasma cycling and purging
Systems and methods for operating a substrate processing system include processing a substrate arranged on a substrate support in a processing chamber. At least...
Liquid chemical for forming protecting film
Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a ...
Lighting device with fan directed airflow and air filtering
A lighting device includes a casing having an inlet that introduces external air at one side and an outlet that discharges the introduced air at the other side....
Method to perform beam-type collision-activated dissociation in the
pre-existing ion injection pathway of a...
Described herein are methods and systems related to the use of the pre-existing ion injection pathway of a mass spectrometer to perform beam-type...
High resolution time-of-flight mass spectrometer
Mass spectrometers and related methods of making and using the same are disclosed herein that generally involve positioning a blocking or masking element in the...
Method and apparatus for a porous electrospray emitter
An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least...
Photomultiplier tube, image sensor, and an inspection system using a PMT
or image sensor
A photomultiplier tube includes a semiconductor photocathode and a photodiode. Notably, the photodiode includes a p-doped semiconductor layer, an n-doped...
Plasma source and methods for depositing thin film coatings using plasma
enhanced chemical vapor deposition
The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention...
Multi-aperture extraction system for angled ion beam
An apparatus for creating an angled ion beam for implanting into a substrate is disclosed. The apparatus includes a plasma chamber in which plasma is created....
Plasma block for remote plasma source
Provided is plasma block for a remote plasma source, and more particularly, is a plasma block that induces plasma to be generated and to flow between a remote...
System level power delivery to a plasma processing load
The present disclosure discusses a power delivery system, and methods of operation, configured to monitor characteristics of a generator, a match network, and a...
Charged particle beam exposure apparatus
Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric...
Alignment and registration targets for multiple-column charged particle
beam lithography and inspection
The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have...
Method for increased target utilization in ion beam deposition tools
In a sputter deposition tool (100) of the type in which an ion source (101) generates a beam directed at a sputtering target, the sputtering target comprises an...
Computational scanning microscopy with improved resolution
A method of imaging a specimen comprises directing a beam to irradiate a specimen; detecting radiation emanating from the specimen; scanning the beam along a...
Charged particle beam apparatus and image generation method
There is provided a charged particle beam apparatus radiating a charged particle beam to a specimen so as to acquire an image of the specimen, the charged...
Charged particle beam writing apparatus and charged particle beam writing
A charged particle beam writing apparatus includes plural conversion processing units to perform data conversion processing in parallel for writing data of each...
Integrated light optics and gas delivery in a charged particle lens
A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The...
Scanning electron microscope
The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables...
Switchable gas cluster and atomic ion gun, and method of surface
processing using the gun
A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for...
Plasma processing apparatus
A plasma processing apparatus capable of optimizing a plasma process is provided. The plasma processing apparatus includes a control unit for controlling a...
Integrated gas discharge tube and preparation method therefor
Provided is an integrated gas discharge tube. In the integrated gas discharge tube, the structure of the gas discharge tube is regulated into an upper cover and...
Field emission device having field emitter including photoelectric
material and method of manufacturing the same
Provided are a field emission device and a method of manufacturing the same. The field emission device includes an anode electrode and a cathode electrode which...
Electrode for producing a plasma, plasma chamber having said electrode,
and method for analyzing or processing...
A RF electrode for generating, plasma in a plasma chamber comprising an optical feedthrough. A plasma chamber comprising an RF electrode and a counter-electrode...
The fast switch includes: a housing; a vacuum interrupter installed in the housing, connected to a main circuit, and configured to open and close the main...