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Patent # Description
US-9,494,886 Toner, image forming apparatus, image forming method, process cartridge, and two-component developer
To provide a toner, which contains: a colorant; a resin; and a releasing agent, wherein a spin-spin relaxation time (T2s) originated from a soft component is...
US-9,494,885 Developing agent and method for producing the same
A method for producing a developing agent including preparing a dispersion liquid containing first fine particles containing a binder resin and second fine...
US-9,494,884 Imaging plate coating composite composed of fluoroelastomer and aminosilane crosslinkers
Provided is a polymer coating composition for a surface layer, comprising a product of a grafting reaction between a fluoroelastomer and at least one of an...
US-9,494,883 Electrophotographic photoreceptor and resin composition
An electrophotographic photoreceptor that satisfies excellent transparency, abrasion resistance, and electrophotographic properties (including sensitivity and...
US-9,494,882 Method of producing electrophotographic photosensitive member
The invention has a process of preparing a dispersion liquid by dispersing particles containing a charge transporting substance and a binder resin in liquid...
US-9,494,881 Triarylamine derivative and electrophotographic photosensitive member
A triarylamine derivative is represented by general formula (1) shown below. ##STR00001## In general formula (1), each R.sub.1 independently represents a...
US-9,494,880 Electrophotographic photosensitive member, method of producing electrophotographic photosensitive member,...
The present invention relates to an electrophotographic photosensitive member including an undercoat layer containing metal oxide particles, a binder resin, and...
US-9,494,879 Contamination trap for a lithographic apparatus
Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation...
US-9,494,878 Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
An EUV optical apparatus includes a number of adjustable mirrors (22x) on mirror bodies (120). Each mirror body is supported on an actuator (100x) comprising a...
US-9,494,877 Substrate processing apparatus
A substrate processing apparatus includes an indexer block, a first processing block, a second processing block, and an interface block. The indexer block...
US-9,494,876 Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
An exposure apparatus exposes an upper surface of a substrate with exposure light through liquid, and includes an optical member that has an emitting surface...
US-9,494,875 Chuck, a chuck control system, a lithography apparatus and a method of using a chuck
A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in...
US-9,494,874 Method and apparatus for design of a metrology target
A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a...
US-9,494,873 Asymmetry compensation method used in lithography overlay process
An asymmetry compensation method used in a lithography overlay process and including steps of: providing a first substrate, wherein a circuit layout is disposed...
US-9,494,872 Inspection method for lithography
The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order...
US-9,494,871 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the...
US-9,494,870 Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure...
US-9,494,869 Lithographic apparatus and device manufacturing method
An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least...
US-9,494,868 Lithographic projection objective
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as...
US-9,494,867 Rinsing liquid for lithography and pattern forming method using same
Disclosed are a rinse solution for lithography comprising water and a nonionic surfactant represented by the formula (I) (R.sub.1 and R.sub.2 may be the same as...
US-9,494,866 Resist composition and method of forming resist pattern
A method of forming a resist pattern, including forming a resist film by coating a resist composition including a base component (A) that exhibits increased...
US-9,494,865 Microscopically structured polymer monoliths and fabrication methods
Novel polymer monolith structures and methods for fabrication of the same are disclosed in a variety of embodiments. In an illustrative embodiment, a method...
US-9,494,864 Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device...
A resist overlayer film forming composition that is used for a lithography process for manufacturing semiconductor devices, and selectively transmits EUV only,...
US-9,494,863 Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process,...
A chemically amplified negative resist composition comprising a silicone structure-bearing polymer forms a film which can be readily patterned. The patterned...
US-9,494,862 Resist underlayer film forming composition containing silicon having sulfone structure and amine structure
A resist underlayer film forming composition for lithography, including: as a silane, at least one among a hydrolyzable organosilane, a hydrolysis product...
US-9,494,861 Positive photosensitive composition, thin film transistor, and compound
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical...
US-9,494,860 Resist composition, method of forming resist pattern
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator...
US-9,494,859 Photosensitive resin composition and color filter using the same
A photosensitive resin composition includes (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a...
US-9,494,858 Template and pattern forming method
A template for imprinting in which a pattern is transferred onto a first substrate applied curable resin thereon, including a second substrate having a surface...
US-9,494,857 Method for producing product having uneven microstructure on surface thereof
A method for producing a product having an uneven microstructure on a surface thereof includes: a step (I) which treats a surface of a roll mold (20) having an...
US-9,494,856 Method and system for fast inspecting defects
A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect...
US-9,494,855 Lithography-oriented photomask repair
Some embodiments of the present disclosure relate to a method for repairing a photomask pattern, comprising receiving a photomask with a first translucent...
US-9,494,854 Technique for repairing an EUV photo-mask
During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information specifying a defect associated with a...
US-9,494,853 Increasing lithographic depth of focus window using wafer topography
Various embodiments provide for topography aware optical proximity correction that can improve depth of focus during wafer lithography. The system can determine...
US-9,494,852 Mask blank and method of manufacturing phase shift mask
A mask blank suitable for fabricating a phase shift mask having a thin film pattern composed of a material enabling dry etching with a fluorine-based gas and a...
US-9,494,851 Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and...
Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean...
US-9,494,850 Projection system with a plurality of light-emitting elements
A projection system for illuminating a projection surface may include at least one light source formed from a plurality of light-emitting elements and an...
US-9,494,849 Rotationally static light emitting material with rotating optics
A system including a rotationally static light emitting material with rotating optics is provided. The system comprises: the material on a heatsink being...
US-9,494,848 Projector
A projector includes: an external housing that includes a projection opening and an exhaust port arranged on the same side as the projection opening; an...
US-9,494,847 Image display device and image adjustment method
An image display device includes: an external light measurement unit measuring the illuminance of an external light a plurality of times, and generating a...
US-9,494,846 Projection display device for setting a projection range based on a location specified by an electronic pen and...
In at least one embodiment, a projection display device comprises an image projection section, an imaging section, a location specifying section, and a display...
US-9,494,845 Camera features of an electronic device
An electronic device having a securing member for a camera module is disclosed. The securing member may include several flexible spring elements extending...
US-9,494,844 Light source for video communication device
A light source and lighting system for video communication are provided. A base capable of being removably attached to a video communication device is provided....
US-9,494,843 SMD type Fresnel LED micro flash light structure
A SMD type Fresnel LED micro flash light structure, which is adapted to a camera of a mobile phone, includes a housing, an array-type light source and a...
US-9,494,842 Electrophoretic material, electrophoresis display device, and electronic apparatus
In an electrophoretic material, first particles which are charged with a first polarity and second particles which are charged with a second polarity are...
US-9,494,841 Reflective color display
An electrophoretic reflective color display has a color filter on an electrophoretic display layer displaying black and white. A colored portion and a...
US-9,494,840 Electrochromic mirror and room mirror module for vehicle comprising the same
Provided are an electrochromic mirror and a method of manufacturing the same, the electrochromic mirror including: a first substrate and a second substrate...
US-9,494,839 Electrochemical device manufacturing
A process for manufacturing an electrochemically active device comprising the steps of: --providing a substrate (110) comprising an electrode receiving surface...
US-9,494,838 Liquid crystal display device
A liquid crystal display device includes: a first substrate including a first light blocking region where a plurality of transistors are formed and a second...
US-9,494,837 Manufacturing method of TFT array substrate, TFT array substrate and display device
Embodiments of the disclosure provide a manufacturing method of a TFT array substrate, a TFT array substrate and a display device. The method comprises steps...
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