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Patent # Description
US-9,513,567 Exposure apparatus and exposure method
To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1...
US-9,513,566 Lithographic apparatus
A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected...
US-9,513,565 Using wafer geometry to improve scanner correction effectiveness for overlay control
Systems and methods for providing improved scanner corrections are disclosed. Scanner corrections provided in accordance with the present disclosure may be...
US-9,513,564 Exposure method, exposure apparatus, and device manufacturing method
Provided is an exposure method that includes setting a first exposure condition so as to calculate a coefficient for predicting the fluctuation in the imaging...
US-9,513,563 Exposure head and exposure device
An exposure head according to the invention includes: a transparent substrate; a plurality of exposure light sources which is formed in the transparent...
US-9,513,562 Projection exposure apparatus for microlithography for the production of semiconductor components
A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one...
US-9,513,561 Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a...
US-9,513,560 Illumination optical assembly, exposure apparatus, and device manufacturing method
An illumination optical system can form a pupil intensity distribution with a desired beam profile. The illumination optical system for illuminating an...
US-9,513,559 High numerical aperture objective lens system
An objective lens system having a high numerical aperture, a large working distance, and low optical aberrations over a wide spectral band of wavelengths is...
US-9,513,558 Exposure apparatus, exposure method, and method for producing device
An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a...
US-9,513,557 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask
According to one embodiment, a method for manufacturing a reflective mask includes: forming a reflection layer on a major surface of a substrate; forming a...
US-9,513,556 Method and system of process chemical temperature control using an injection nozzle
A method of process chemical temperature control for resist stripping of a substrate in a resist stripping system includes selecting at least two temperature...
US-9,513,555 Method for manufacturing a suspended single carbon nanowire and piled nano-electrode pairs
The present invention provides a method for manufacturing a suspended single carbon nanowire and piled nano-electrode pairs, and a suspended single carbon...
US-9,513,554 Lithographically defined microporous carbon-composite structures
A microporous carbon scaffold is produced by lithographically patterning a carbon-containing photoresist, followed by pyrolysis of the developed resist...
US-9,513,553 Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device...
A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on...
US-9,513,552 Multiple-patterning photolithographic mask and method
A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed....
US-9,513,551 Process for producing a photomask on a photopolymeric surface
A process is provided for printing a high resolution pattern on a photopolymeric surface.
US-9,513,550 Positive resist composition and pattern forming process
A positive resist composition comprising an organosiloxane-modified novolak resin, a photosensitive agent, and an organic solvent is provided, the resin...
US-9,513,549 Compound, resin, photoresist composition, and method for producing photoresist pattern
A compound represented by formula (I): ##STR00001## wherein R.sup.1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group which may have a...
US-9,513,548 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to...
US-9,513,547 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for...
The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which...
US-9,513,546 Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask...
Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming...
US-9,513,545 Homoadamantane derivatives, process for preparing same, and photoresist compositions
A compound represented by the following formula (I), wherein R.sup.1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group. ##STR00001##
US-9,513,544 Colored photo-sensitive composition, color filter, and method for manufacturing color filter
Provided is a colored photo-sensitive composition having a high sensitivity and a good developablity, even if the ratio of content of a pigment, relative to the...
US-9,513,543 Method for forming a non-deformable patterned template
A method for forming a non-deformable patterned template includes providing a stable mesh, wherein the stable mesh is resistant to deformation; providing a...
US-9,513,542 Lithography mask and method of forming a lithography mask
A first embodiment is a lithography mask comprising a transparent substrate and a first molybdenum silicon nitride (Mo.sub.xSi.sub.yN.sub.z) layer. The first...
US-9,513,541 Curved back-projection screen
A curved back-projection screen having an angle of curvature greater than 180.degree. is described such as a wrap-around cylindrical or dome screen. The screen...
US-9,513,540 Laser projection display and method for aligning color of the same
There is disclosed a laser projection display including a light source unit for emitting light laser light; a light resolution unit for resolving the laser...
US-9,513,539 Light source unit having a microlens array for converting excitation light into plural light ray bundles and...
To provide a projector which enables a stable projection for a long period of time, there is provided a projector comprising a light source unit, a display...
US-9,513,538 Projector, support plate and projection method of projector
There is provided a projector comprising: a polyhedral main body portion made up of a plurality of surfaces which includes a projection unit; and a support...
US-9,513,537 Portable studio unit
A portable studio unit includes a first main body portion configured to define any one plane among three axes planes constructing a three dimensional figure, a...
US-9,513,536 Camera rig
A device comprising a harness, an arm, and an extendable string. The arm may include a first portion being fixed in relation to the harness and a second portion...
US-9,513,535 Camera mount for sports board
A camera system is configured to detachably couple to a camera mount, which in turn can be attached to an apparatus such as a sports board. The camera mount...
US-9,513,534 Mobil device and optical imaging lens having four lens elements thereof
An optical imaging lens for a mobile device comprising four lens elements positioned sequentially from an object side to an image side. By controlling the...
US-9,513,533 Focal plane shutter and optical apparatus provided with same
A focal plane shutter includes: a board including an opening; a leading blade and a trailing blade opening and closing the opening; a trailing blade actuator...
US-9,513,532 Optical parametric oscillator and second harmonic generator using monoclinic phase Ga.sub.2S.sub.3 crystal
This disclosure provides a second harmonic generator and an optical parametric oscillator, the second harmonic generator and the optical parametric oscillator...
US-9,513,531 Optical semiconductor element, method of controlling the same and method of manufacturing the same
An optical semiconductor element includes a ring modulator, and a light absorbing material provided at a position apart from a path for a modulated light which...
US-9,513,530 Optical semiconductor element, method of controlling the same and method of manufacturing the same
An optical semiconductor element includes a ring modulator, and a light absorbing material provided at a position apart from a path for a modulated light which...
US-9,513,529 Display apparatus including MEMS devices
Embodiments of the present disclosure provide techniques and configurations for a display apparatus. In one embodiment, the apparatus may include one or more...
US-9,513,528 Display device and method of fabricating the same
A constitution of the display device of the invention is shown in the following. The display device includes a pixel unit including TFTs of which the active...
US-9,513,527 Color display device
The present invention provides a full color display device in which each pixel can display multiple high-quality color states. More specifically, an...
US-9,513,526 Fine electret particles and process for producing same
The present invention provides uniformly electrified electret fine particles having excellent electrophoretic properties. Specifically, the present invention...
US-9,513,525 Electrochromic window fabrication methods
Methods of manufacturing electrochromic windows are described. An electrochromic device is fabricated to substantially cover a glass sheet, for example float...
US-9,513,524 Wide band variable transmittance optical device
We describe a wide band variable transmission optical device having an electronically active cell comprising a guest-host mixture of a liquid crystal host and a...
US-9,513,523 Thin film transistor array substrate and method of fabricating same
A thin film transistor (TFT) array substrate includes a first substrate, a plurality of TFTs formed on the first substrate, a color filter layer covered on the...
US-9,513,522 Liquid crystal display panel and liquid crystal display device including same
There is provided a liquid crystal display panel that improves the reliability of thin film transistors while suppressing a degradation in display quality. A G...
US-9,513,521 Display device
A display device including: a substrate including a display area in which pixels are positioned and a peripheral area around the display area; a common...
US-9,513,519 Liquid crystal display device
A liquid crystal display device having a uniform gap between a TFT substrate and a CF substrate even in cases where a sealant is to be applied to a slim frame...
US-9,513,518 Display device
A display device includes a first substrate, a gate driver on array (GOA) circuit, a plurality of peripheral conductive wires, a second substrate, a sealant and...
US-9,513,517 Liquid crystal panel, display device, and manufacturing method and driving methods thereof
A liquid crystal panel, a display device, and a manufacturing method and a driving method thereof are provided. The liquid crystal panel comprises an array...
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