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Patent # Description
US-9,524,885 Apparatus for molding a semiconductor wafer and process therefor
Mold pieces (105 and 110) for molding a layer of mold compound on the interconnect side of a bumped semiconductor wafer (118) include a primary cavity (117) and...
US-9,524,884 Method of fabricating a semiconductor package
A method of fabricating a semiconductor package includes mounting a plurality of semiconductor devices on a substrate; forming a molding member that covers a...
US-9,524,883 Holding of interposers and other microelectronic workpieces in position during assembly and other processing
A workpiece (120) has protruding conductive features (140) at least on a first side. The second side is processed while the workpiece is held from the first...
US-9,524,882 Contact structure and extension formation for III-V nFET
FinFET devices including III-V fin structures and silicon-based source/drain regions are formed on a semiconductor substrate. Silicon is diffused into the III-V...
US-9,524,881 Method for fabricating specific termination angles in titanium tungsten layers
Method of forming a termination angle in a titanium tungsten layer include providing a titanium tungsten layer and applying a photo resist material to the...
US-9,524,880 Mask and method for manufacturing semiconductor device
A mask may be used in a process for manufacturing a semiconductor device. The semiconductor device may include a source line, a first drain contact terminal,...
US-9,524,879 Method for fabricating semiconductor device horizontally shifted contact plug pattern
Semiconductor devices, and methods for fabricating a semiconductor device, include forming a contact hole penetrating an interlayer insulating layer and...
US-9,524,878 Line layout and method of spacer self-aligned quadruple patterning for the same
A line layout and a spacer self-aligned quadruple patterning method thereof are provided. The line layout includes a first line, a second line, a third line,...
US-9,524,877 Silicon dry etching method
A dry etching method according to the present invention is for etching a silicon layer as a processing target in a processing room, characterized by supplying...
US-9,524,876 Plasma etching method and plasma etching apparatus
Disclosed is a plasma etching method including a deposition process and an etching process. For a processing target object including a base layer and a...
US-9,524,875 Methods of etching trenches into silicon of a semiconductor substrate
A method of etching trenches into silicon of a semiconductor substrate includes forming a mask over silicon of a semiconductor substrate, with the mask...
US-9,524,874 Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon...
An aqueous polishing composition comprising (A) abrasive ceria particles and (B) amphiphilic nonionic surfactants selected water-soluble and water-dispersible,...
US-9,524,872 Heterogeneous integrated circuits and devices thereof with a surrogate substrate and transferred semiconductor...
A heterogeneous integrated circuit and method of making the same. An integrated circuit includes a surrogate substrate including a material selected from the...
US-9,524,871 Silicon-containing resist underlayer film-forming composition having sulfone structure
A composition for forming a resist underlayer film for lithography, including: as a silane, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable...
US-9,524,870 Method of fabricating semiconductor device
A method of fabricating a semiconductor device includes forming line patterns over a first region of an etch target layer and a pre-pad pattern over second and...
US-9,524,869 Nitride-based semiconductor light-emitting device
A nitride-based semiconductor light-emitting device includes a light-emitting stack comprising a first semiconductor structure having a first conductivity, a...
US-9,524,868 Deposited material and method of formation
A system and method for manufacturing a semiconductor device is provided. An embodiment comprises forming a deposited layer using an atomic layer deposition...
US-9,524,867 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
A method of manufacturing a semiconductor device includes forming a film on a substrate by performing a cycle a predetermined number of times. The cycle...
US-9,524,866 Method for making semiconductor devices including reactant treatment of residual surface portion
A method for making semiconductor devices may include forming a phosphosilicate glass (PSG) layer on a semiconductor wafer, with the PSG layer having a...
US-9,524,865 Semiconductor device and fabrication method thereof
The present disclosure provides a method for forming a semiconductor device. The method includes providing a substrate and forming a dielectric layer on the...
US-9,524,864 Manufacturing method and fluid supply system for treating substrate
A method of manufacture and fluid supply system for treating a substrate is provided. The fluid supply system for treating a substrate may include a substrate...
US-9,524,863 Method for cleaning and drying semiconductor substrate
The present invention provides a method for cleaning and drying a semiconductor substrate in which a semiconductor substrate onto which a pattern has been...
US-9,524,861 Fast start RF induction lamp
An induction RF fluorescent lamp, comprising a vitreous envelope filled with a working gas mixture, a power coupler comprising at least one winding of an...
US-9,524,860 Systems and methods for multipole operation
A method for identifying components of a sample includes providing a sample to an ion source and generating a plurality of ions from constituent components of...
US-9,524,859 Pulsed ion beam source for electrospray mass spectrometry
Apparatus and methods for creating a pulsed ion beam. The pulsed ion beam can be used for performing mass spectrometry. A pulsed solenoid valve can provide a...
US-9,524,858 Analytical apparatus utilizing electron impact ionization
An analytical apparatus (1) for mass spectrometry comprises an electron impact ioniser including an electron emitter (22) and an ionisation target zone (18)....
US-9,524,857 Ion optics components and method of making the same
A method of making an ion optics component includes providing an electrically isolating substrate and machining away material of the substrate from at least one...
US-9,524,856 In-chamber fluid handling system and methods handling fluids using the same
A sample chamber is configured to accommodate a target such that a portion of the target is removable as a sample. A carrier gas injection system is configured...
US-9,524,855 Cascaded-signal-intensifier-based ion imaging detector for mass spectrometer
A detector system for a mass spectrometer comprises: a metal channel dynode (MCD) comprising at least one perforated metal plate configured to receive the...
US-9,524,854 Electrostatic remote plasma source system and method
This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma...
US-9,524,853 Ion implantation machine presenting increased productivity
The present invention relates to an ion implantation machine 100 that comprises: an enclosure 101 that is connected to a pump device 102; a plasma source...
US-9,524,852 Method for monitoring ion implantation
A method for monitoring ion implantation, comprising: a), providing a control piece and forming a mask layer; b), performing ion implantation process to implant...
US-9,524,851 Method of performing spectroscopy in a transmission charged-particle microscope
A method of performing spectroscopy in a Transmission Charged-Particle Microscope comprising: a specimen holder; a source, for producing a beam of charged...
US-9,524,850 Holder assembly for cooperating with an environmental cell and an electron microscope
A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an...
US-9,524,849 Method of improving ion beam quality in an implant system
A method for improving the ion beam quality in an ion implanter is disclosed. In some ion implantation systems, contaminants from the ion source are extracted...
US-9,524,848 Bright and durable field emission source derived from refractory taylor cones
A method of producing field emitters having improved brightness and durability relying on the creation of a liquid Taylor cone from electrically conductive...
US-9,524,847 Substrate processing apparatus
A substrate processing apparatus includes a chamber accommodating a wafer, a susceptor disposed inside the chamber and on which the wafer is held, an upper...
US-9,524,846 Target structure and X-ray generating apparatus
In a target structure according to the present invention, a target is provided on a central area of an insulating substrate, and a first conductive member for...
US-9,524,845 X-ray tube cathode with magnetic electron beam steering
An x-ray tube cathode with magnetic electron beam steering. In one example embodiment, an x-ray tube cathode includes a cathode head and an electron emitter....
US-9,524,844 Fuse arrangement and a method for manufacturing a fuse arrangement
A fuse arrangement, including: at least a first terminal, a second terminal, and a fuse, wherein the first terminal and the second terminal may be electrically...
US-9,524,843 Control mechanism for a circuit-breaking device and a circuit-breaking device comprising said mechanism
The present invention relates to a control mechanism for the displacement of at least one moving contact of a low-voltage circuit-breaking device. The control...
US-9,524,842 Molded case circuit breakers with a switch PCB over an internal pocket and behind a front cover
Molded case circuit breakers (MCCBs) have an MCCB body with at least one switch printed circuit board (PCB) holding between 1-4 recessed switches. The switch...
US-9,524,841 Heat detector with shape metal alloy element
A temperature sensing system comprises a conductive tube, a shape memory alloy (SMA) element, and a detector. The SMA element is disposed to create an...
US-9,524,840 High-temperature, high-pressure vacuum relay
A relay assembly includes a switch body, an adaptor sleeve, a feed-through base, and an encapsulating resin. The switch body includes a flange extending...
US-9,524,839 Switch assembly
A switch assembly includes a switch unit having first and second conductive plates, and a switch control unit having a sliding member and a locking member. The...
US-9,524,838 Method for protecting charging cable, and charging device
A driving battery of a vehicle that can be electrically driven is charged by determining a resistance value that corresponds to the size of the electrical...
US-9,524,837 Electrical contact arrangement
An electrical contact configuration includes a first contact piece with a contact socket and a second contact piece which can move relative to the first contact...
US-9,524,836 Arc-control chamber gear for two confined contact electrodes
An arc-control chamber gear for contact electrodes, the gear possessing openings in collars of an electrode centering cap so as to break the confinement of the...
US-9,524,835 Input devices and electronic device using said input devices
Input device in which a defect of a control disk is eliminated while making use of an advantage of the control disk and an electronic device using the input...
US-9,524,834 Multi-directional switch and operation input device
A sliding space is defined between a first housing and a second housing. The slider has at least a portion arranged within a sliding space, and is configured to...
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