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Patent # Description
US-9,588,457 Optical scanning device and image forming apparatus
An image forming lens is fixed to a protruding seat part, which protrudes from a bottom wall part of a casing, by using an adhesive. A concave portion is formed...
US-9,588,456 Scanning optical device and image forming apparatus
At image formation time, when the light amount setting value used in the image formation is equal to or larger than the light amount value Xm affected by the...
US-9,588,455 Image forming apparatus
An image forming apparatus includes exposing units, a photoconductor, developing units, a processor, and a memory storing instructions. Each exposing unit...
US-9,588,454 Method of producing an electrically conductive roller from a rubber foam tube
A rubber foam tube (5) is produced by extruding a rubber composition into a tubular body (4) and feeding the tubular body (4) in an elongated state without...
US-9,588,453 Resin-filled ferrite carrier for electrophotographic developer and electrophotographic developer using the...
There is provided a resin-filled ferrite carrier for an electrophotographic developer, in which a void of a porous ferrite particle used as a ferrite carrier...
US-9,588,452 Toner for developing electrostatic latent image and process for producing the same
The toner according to the present invention comprises a matrix phase composed of a vinyl resin, and domain phases composed of a non-crystalline polyester resin...
US-9,588,451 Toner, developer, and image forming apparatus
A toner, wherein an amount of Al detected in the toner is 0.7% to 1.3%, where the amount of Al detected is determined based on quantitative analysis of Al by...
US-9,588,450 Magnetic toner
Provided is a magnetic toner in which enhancement of initial transfer efficiency and transfer efficiency that is stable during a long-term use are achieved by...
US-9,588,449 Electrostatic printing
There is provided a method for electrostatic printing comprising providing a print substrate having a layer comprising a polymeric material, the layer...
US-9,588,448 Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method for...
An electrophotographic photosensitive member includes an undercoat layer containing a resin and a metal oxide particle whose surface has been treated with a...
US-9,588,447 Electrophotographic photosensitive member, method for manufacturing the same, and electrophotographic apparatus
A surface layer of the electrophotographic photosensitive member has a change region in which a ratio of the number of carbon atoms with respect to the sum of...
US-9,588,446 Calibration apparatus and an adjustment method for a lithography apparatus
A calibration apparatus is provided. The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned...
US-9,588,445 Projection objective for a microlithographic projection exposure apparatus
A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>-2 successive sections...
US-9,588,444 Balance mass system shared by workpiece table and mask table, and lithography machine
A balance mass system shared by a workpiece stage and a mask stage includes a balance mass and an anti-drift and compensation apparatus (16). The balance mass...
US-9,588,443 Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
A carrier apparatus positions a chuck member above a wafer mounted on a fine movement stage, relatively moves the chuck member and the fine movement stage in a...
US-9,588,442 Lithographic apparatus and device manufacturing method
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of...
US-9,588,441 Method and device for using substrate geometry to determine optimum substrate analysis sampling
A method and apparatus for process control in the processing of a substrate is disclosed in the present invention. Embodiments of the present invention utilize...
US-9,588,440 Method for monitoring focus in EUV lithography
This invention relates to a method of obtaining optimal focus for exposing a photoresist in an EUV lithography with an EUV mask containing a pattern with an...
US-9,588,439 Information matrix creation and calibration test pattern selection based on computational lithography model...
Embodiments of the present invention describe methods of selecting a subset of test patterns from an initial larger set of test patterns for calibrating a...
US-9,588,438 Optimization flows of source, mask and projection optics
Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The...
US-9,588,437 Fluid handling structure, a lithographic apparatus and a device manufacturing method
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid...
US-9,588,436 Exposure apparatus, exposure method, and device producing method
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid...
US-9,588,435 EUV microlithography projection exposure apparatus with a heat light source
The disclosure relates to an EUV microlithography projection exposure apparatus having an exposure light source for producing radiation in a first spectral...
US-9,588,434 Catoptric illumination system for microlithography tool
In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a...
US-9,588,433 Optical system, in particular of a microlithographic projection exposure apparatus
The invention relates to an optical system, in particular of a microlithographic projection exposure apparatus, with an optical system axis (OA) and a...
US-9,588,432 Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in...
An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator...
US-9,588,431 Illumination optics and projection exposure apparatus
An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of...
US-9,588,430 System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet...
Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target...
US-9,588,429 Lithographic developer composition and method of use
Lithographic printing plates are formed by imagewise exposing a single-layer or dual-layer positive-working lithographic printing plate precursor. The precursor...
US-9,588,428 Resist removing liquid, resist removal method using same and method for producing photomask
A resist removal method includes removing a resist provided on a photomask substrate by bringing a resist removing liquid into contact with the resist in...
US-9,588,427 Light exposure system comprising a plurality of moving stages and light exposure process
A light exposure system executing a light exposure process to a plurality of assembly cells, each of which includes a first substrate, a second substrate and a...
US-9,588,426 Negative photoresist and methods of preparing and using the same
Disclosed is a negative photoresist comprising 1 to 90 parts of hydroxyl-containing or carboxyl-containing film-forming resin, 1 to 99 parts of...
US-9,588,425 Positive photosensitive composition, thin film transistor, and compound
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical...
US-9,588,424 Photosensitive resin composition for screen printing, photosensitive film, and screen plate
A photosensitive resin composition is prepared by dispersing at least one of a hydrophobic polymer and a mixture of an oil-soluble photopolymerization initiator...
US-9,588,423 Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound,...
An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R.sup.1 represents a...
US-9,588,422 Imprint lithography
A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes...
US-9,588,421 Pellicle inspection apparatus
Provided with a pellicle inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography. The pellicle...
US-9,588,420 Apparatus and method for indirect surface cleaning
A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of...
US-9,588,419 Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof
Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping...
US-9,588,418 Pattern forming method
A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one...
US-9,588,417 Photomask pellicle
A method includes providing a carrier wafer, forming an indented portion on the carrier wafer, the indented portion having a sloped portion at an edge of the...
US-9,588,416 Methods and apparatus for nanofabrication using a pliable membrane mask
Apparatus for nanofabrication on an unconventional substrate including a patterned pliable membrane mechanically coupled to a membrane support structure, a...
US-9,588,415 Electron beam exposure system and methods of performing exposing and patterning processes using the same
An exposure system includes a data processing part that forms an exposure layout and an exposure part that irradiates an electron beam at a photoresist layer...
US-9,588,414 Photomask pattern and method for forming the same
Various embodiments provide photomask patterns and methods for forming the same. In an exemplary method, a to-be-etched pattern can be provided. The...
US-9,588,413 Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask,...
Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate...
US-9,588,412 X-ray film image marker
The x-ray film image marker is a device that is adapted for use with an x-ray portable cassette in order to provide the image marker capability that is used in...
US-9,588,411 Light source apparatus emitting visible light and image display apparatus using the same
A light source apparatus includes: an excitation light source including a laser light source; a first wheel that is controlled to rotate, and includes, in a...
US-9,588,410 Projection type display device and control method thereof
A projector which includes a light source, liquid crystal light valves, a dimming mechanism, an illumination optical system, a control circuit which determines...
US-9,588,409 Projector having an illumination unit and a projection unit fixed or shiftably held to a base frame
A projector includes an illumination unit which has an optical system including a light source apparatus, an image formation unit which has an optical system...
US-9,588,408 Methods and systems for projecting a target portion of an image at a higher resolution
Example embodiments may relate to methods and systems for providing a higher-resolution segment within a larger lower-resolution projection onto a projection...
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