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Patent # Description
US-9,606,462 Toner and method for manufacturing toner
To provide a toner from which an image having a stable image density can be obtained with reduced occurrence of pollution of members, even when a toner...
US-9,606,461 Measuring apparatus, measuring method, lithography apparatus, and method of manufacturing article
The present invention provides a measuring apparatus for measuring a position of an alignment mark formed on a substrate and including a first mark having...
US-9,606,460 Lithography apparatus, and method of manufacturing article
The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller...
US-9,606,459 Monolithic EUV transparent membrane and support mesh and method of manufacturing same
An apparatus according to the present invention comprises a membrane layer and a supporting supportive mesh, wherein the membrane layer and the supportive mesh...
US-9,606,458 Method for calibration of an encoder scale and a lithographic apparatus
A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a...
US-9,606,457 Lithographic apparatus and device manufacturing method
A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The...
US-9,606,456 Lithography apparatus, determination method, and method of manufacturing article
The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus comprising a stage holding the substrate and being...
US-9,606,455 Scan and step exposure system
There is provided a scan and step exposure system to enable to perform the exposure on a large-sized subject to be exposed such as a film and a wafer, which was...
US-9,606,454 Substrate processing apparatus and substrate processing system
A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport...
US-9,606,453 Method and system for providing tool induced shift using a sub-sampling scheme
The present invention may include measuring tool induced shift (TIS) on at least one wafer of a lot of wafers via an omniscient sampling process, randomly...
US-9,606,452 Lithography metrology method for determining best focus and best dose and lithography monitoring method using...
A lithography metrology method is provided. Focus sensitivity data and dose sensitivity data of sample patterns to be formed on a substrate are acquired. At...
US-9,606,451 Exposure apparatus, photolithographical reticles and exposure methods thereof
An exposure apparatus is provided for performing a column scan-exposure process. The exposure apparatus includes a base for supporting the exposure apparatus;...
US-9,606,450 Image projection apparatus and method
An image projection apparatus comprises a light projector (605) which projects an image onto a surface (603) of an object. A focussing processor (609) is...
US-9,606,449 Lithographic apparatus and device manufacturing method
An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles...
US-9,606,448 Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and...
US-9,606,447 Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
A reflective mirror is provided with a base and a multilayer film including first layers and second layers laminated alternately on the base and capable of...
US-9,606,446 Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
A reflective optical element of an optical system for EUV lithography and an associated manufacturing method. The reflective optical element (20) includes a...
US-9,606,445 Lithographic apparatus and method of manufacturing a device
There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the...
US-9,606,444 Method and apparatus for locally deforming an optical element for photolithography
The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a)...
US-9,606,443 Reducing immersion projection optical system
A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved...
US-9,606,442 Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
An apparatus for measuring positions of marks on a substrate, includes an illumination arrangement for supplying radiation with a predetermined illumination...
US-9,606,441 Illumination system for microlithography
A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent...
US-9,606,440 Lithographically produced features
The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying...
US-9,606,439 Forming conductive metal patterns using water-soluble polymers
A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing,...
US-9,606,438 Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device...
Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent. ...
US-9,606,437 Fluorine-containing compound, substrate for pattern formation, photodegradable coupling agent, pattern...
A fluorine-containing compound represented by a following general formula (1) is provided. [In the general formula (1), X represents a halogen atom or an alkoxy...
US-9,606,436 Photosensitive resin composition and application thereof
A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D)...
US-9,606,435 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film...
US-9,606,434 Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing...
A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes ...
US-9,606,433 Resist composition, method of forming resist pattern, polymeric compound and compound
There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid,...
US-9,606,432 Alternating space decomposition in circuit structure fabrication
Fabrication of a circuit structure is facilitated, in which a first exposure of a multi-layer structure is performed using a first mask, which defines...
US-9,606,431 Imprinting device and imprinting method
An imprinting device to transfer the mold pattern on a die to a molding target includes a casing forming a pressure-adjusting chamber, a stage supporting the...
US-9,606,430 Method of aerosol printing a solder mask ink composition
A method of digitally printing a solder mask. The method includes providing a solder mask ink composition including: 1) a resin and 2) a solvent in an amount of...
US-9,606,429 Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to...
US-9,606,428 Illuminating optical device, projector and method of controlling an illuminating optical device
Provided is an illuminating optical device that can reduce lowering of luminance in a display mode for enhancing color reproducibility. A multiple number of...
US-9,606,427 Light source module with light combining system, fans and ducts
A light source module adapted to a projector includes a light source, a light combining system, a first cooling fan, a second cooling fan, a first guide duct...
US-9,606,426 Duct cover for an image projection apparatus
An image projection apparatus includes: a grid portion provided on a housing of the apparatus and having a plurality of grids through which air flows in or out...
US-9,606,425 Imaging optical system, optical apparatus and image projection apparatus
An imaging optical system, which images an image on one conjugate surface of an enlargement side conjugate surface and a reduction side conjugate surface onto...
US-9,606,424 Holding assembly for a camera
A holding assembly for a camera, such as a smartphone, which may be hung from a wide variety of surfaces to position the camera for taking pictures that include...
US-9,606,423 System and method for improving chroma key compositing technique in photography
Disclosed is a system for improving chroma key compositing technique in photography and/or videography. The system comprises at least a first flashlight...
US-9,606,422 Camera apparatus, camera body, interchangeable lens, and method of controlling operation of camera body
The invention speeds up operation of an interchangeable lens. The interchangeable lens, which is removably mounted on a camera body, includes a communication...
US-9,606,421 Focal-plane shutter and optical device
A focal-plane shutter includes: a board including an opening; a shutter opening and closing the opening; a drive lever provided with a drive pin and swinging; a...
US-9,606,420 Method of fabricating wavelength conversion device
Disclosed is a method for fabricating a wavelength conversion device that is capable of suppressing unintended and random polarization reversal due to heating...
US-9,606,419 Adaptive photothermal lens
An adaptive photo thermal lens comprising at least one cell, each cell provided with at least one photo absorbing particle, a thermo-optical material in thermal...
US-9,606,418 Liquid crystal grating substrate, liquid crystal grating and display device
The liquid crystal grating substrate includes a base substrate, and several bar-like signal electrodes and several bar-like common electrodes formed at an...
US-9,606,417 Optical modulation apparatus, optical transmitter and controlling method for optical modulator
An optical modulation apparatus includes an optical modulation unit that includes a plurality of ring optical modulators which are coupled in cascade to each...
US-9,606,416 Differential TWE MZM driver for silicon photonics
A differential TWE MZM includes a differential driver, first and second capacitors, and first and second terminations. The differential driver includes a first...
US-9,606,415 Super-oscillatory lens device
A super-oscillatory lens (10) having a pre-defined pattern to spatially modulate the light beam in amplitude and/or phase which has a blocking element (6)...
US-9,606,414 Apparatus and method for providing a selectively absorbing structure
An apparatus is described that selectively absorbs electromagnetic radiation. The apparatus includes a conducting surface, a dielectric layer formed on the...
US-9,606,413 Reflective display particle, reflective display device, and method for manufacturing the same
Provided is a method for manufacturing a reflective display particle, the method including: (a) preparing first and second dispersion solutions by dispersing...
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