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Patent # Description
US-9,741,563 Hybrid stair-step etch
A method for forming a stair-step structure in a substrate is provided, wherein the substrate has an organic mask, comprising at least one cycle, wherein each...
US-9,741,562 Method for forming polysilicon film
Provided is a method for forming a silicon film, and more particularly, to a method for forming a polycrystalline silicon film including pretreatment process in...
US-9,741,561 Transparent nanocrystalline diamond coatings and devices
A method for coating a substrate comprises producing a plasma ball using a microwave plasma source in the presence of a mixture of gases. The plasma ball has a...
US-9,741,560 Method of growing nitride semiconductor layer
A method of growing a nitride semiconductor layer may include preparing a substrate in a reactor, growing a first nitride semiconductor on the substrate at a...
US-9,741,559 Film forming method, computer storage medium, and film forming system
The present invention is to form an organic film on a substrate having a pattern formed on a front surface thereof and configured to: apply an organic material...
US-9,741,558 Selectively lateral growth of silicon oxide thin film
Implementations disclosed herein generally relate to methods of forming silicon oxide films. The methods can include performing silylation on the surface of the...
US-9,741,557 Silicon nitride process for reduction of threshold shift
A semiconductor device has a substrate with a semiconductor material. The semiconductor device includes a field effect transistor in and on the semiconductor...
US-9,741,556 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
Technique includes forming a film containing first element, second element and carbon on a substrate by performing a cycle a predetermined number of times. The...
US-9,741,555 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
A method of manufacturing a semiconductor device, includes: supplying a first precursor and a first nitriding agent onto a substrate having a surface formed...
US-9,741,554 Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device includes a semiconductor region forming process, a cleaning process, a surface roughness uniformizing process,...
US-9,741,553 Elliptical and dual parabolic laser driven sealed beam lamps
The invention is directed to a sealed high intensity illumination device configured to receive a laser beam from a laser light source. A sealed chamber is...
US-9,741,552 Triple quadrupole mass spectrometry coupled to trapped ion mobility separation
The invention provides a method for acquiring fragment ion spectra of substances in complex substance mixtures wherein a trapped ion mobility spectrometer...
US-9,741,550 Mass spectrometer with laser spot pattern for MALDI
The invention relates to mass spectrometers with an ion source, comprising a UV laser system for mass spectrometric analyses with ionization of analyte...
US-9,741,549 Mass spectrometer vacuum interface method and apparatus
A mass spectrometer vacuum interface can include a skimmer apparatus having a skimmer aperture and an internal surface. A method of operating the mass...
US-9,741,548 Mass spectrometer
The mass spectrometer (1) provides an ionization chamber (11) therein with: a probe (15) having a sample to be measured flow path (155) for spraying a sample to...
US-9,741,547 Low-pressure plasma system with sequential control process
The low pressure plasma system includes a treatment chamber which is pumped out in a first process step by means of a pump. In a second process step a gas...
US-9,741,546 Symmetric plasma process chamber
Embodiments of the present invention provide a plasma chamber design that allows extremely symmetrical electrical, thermal, and gas flow conductance through the...
US-9,741,545 RPS assisted RF plasma source for semiconductor processing
Embodiments of the disclosure generally relate to a hybrid plasma processing system incorporating a remote plasma source (RPS) unit with a capacitively coupled...
US-9,741,544 System and method for control of high efficiency generator source impedance
Systems and methods for adjusting the source impedance of a generator are disclosed. An exemplary method includes generating a first signal and applying the...
US-9,741,543 Multi-range voltage sensor and method for a voltage controlled interface of a plasma processing system
A voltage sensor for a voltage controlled interface of a plasma processing system. The voltage sensor receives a RF signal generated by a pickup device. The RF...
US-9,741,542 Plasma generation device
A plasma generating device that improves plasma generating efficiency can further accommodate changes in plasma generating state because of changes in...
US-9,741,541 Apparatus of high frequency plasma
A high frequency plasma apparatus includes a reaction chamber, a first electrode, a second electrode, and a plurality of feed points located at one of the two...
US-9,741,540 Method for surface treatment of upper electrode, plasma processing apparatus and upper electrode
In a method for surface treatment of an upper electrode, a first step is performed to roughen a facing surface of the upper electrode facing a lower electrode...
US-9,741,539 RF power delivery regulation for processing substrates
Methods of operating a plasma enhanced substrate processing system using pulsed radio frequency (RF) power are provided herein. In some embodiments, a method of...
US-9,741,538 Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device
Linear coils, a first ceramic block, and a second ceramic block are arranged in an inductively-coupled plasma torch. A chamber has an annular shape. Plasma...
US-9,741,537 Method and apparatus for supplying ion beam in ion implantation process
A method for generating an ion beam in an ion implantation process is provided. The method includes supplying a working gas into a first portion of an arc...
US-9,741,536 High aspect ratio structure analysis
Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion...
US-9,741,535 Charged particle beam apparatus
A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam...
US-9,741,534 Monitoring device, ion implantation device, and monitoring method
A monitoring device includes a filtering section that extracts and outputs at least one of a high frequency component or a low frequency component of a beam...
US-9,741,533 Image type electron spin polarimeter
Provided is an image type electron spin polarimeter. It at least comprises a scattering target, a two-dimensional electron detector and an electron bending...
US-9,741,532 Multi-beam electron microscope for electron channeling contrast imaging of semiconductor material
A multi-beam electron microscope for ECCI is provided. The electron microscope has a platform, on which a crystalline sample is placed. At least a first...
US-9,741,531 Charged particle beam device enabling facilitated EBSD detector analysis of desired position and control method...
A charged particle beam device allowing an analysis position in a sample analyzable with an EBSD detector to be acquired beforehand, and allowing a sample to be...
US-9,741,530 Charged-particle-beam device, specimen-image acquisition method, and program recording medium
A charged-particle-beam device is provided with a data processing unit that removes, from a detector signal, the effect that scattering of a primary...
US-9,741,529 Micro-chamber for inspecting sample material
A micro-chamber for inspecting sample material can be filled with sample material immersed in a liquid without the need of applying vacuum tubing's to the...
US-9,741,528 Charged particle optical apparatus having a selectively positionable differential pressure module
Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an...
US-9,741,527 Specimen holder for a charged particle microscope
A specimen holder for a Charged Particle Microscope is disclosed. The holder has a support structure with an elongated member including a specimen mounting...
US-9,741,526 Charged particle beam apparatus and sample image acquiring method
Disclosed is a charged particle beam apparatus wherein a partitioning film capable of transmitting a charged particle beam is provided between a charged...
US-9,741,525 Charged-particle microscope with astigmatism compensation and energy-selection
A method of producing a corrected beam of charged particles for use in a charged-particle microscope, comprising the following steps: Providing a...
US-9,741,524 X-ray generating apparatus and radiography system using the same
Heat dissipation of a target is enhanced in a transmissive X-ray generating apparatus where an anode member constitutes a part of a container. An anode member...
US-9,741,523 X-ray tube
According to one embodiment, an X-ray tube includes an elongated anode target, a cathode, and a vacuum envelope. The cathode includes an electron emission...
US-9,741,522 Ceramic ion source chamber
The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material...
US-9,741,521 Vacuum electron device drift tube
Technology is described for vacuum electron device (e.g., sheet beam klystron) that includes a hollow tube structure. In one example, the hollow tube structure...
US-9,741,520 Molded case circuit breaker
The present invention relates to a molded case circuit breaker, in which a locking member is formed at an inner side of a lever and an anti-rotation member is...
US-9,741,519 Lockout relay device
This disclosure relates to various embodiments of lockout relay devices. In one embodiment, a lockout relay device may transition between a closed position and...
US-9,741,518 Latch relay
A latch relay includes a frame, a bobbin installed in the frame and having a coil wound therearound, first and second yokes provided as magnetic bodies, a...
US-9,741,517 Electromagnetic relay
An electromagnetic relay includes plural pairs of fixed terminals each including an external input/output terminal and an external output/input terminal that...
US-9,741,516 Electromagnetic relay for vehicle
In an electromagnetic relay, terminal slits into which a coil terminal connected to a coil, a fixed contact terminal to which a fixed contact is attached, and a...
US-9,741,515 Structures for representation of an operational state
Structures, devices, systems, and techniques are provided to represent an operational state of an electronic device. In one aspect, a device that can represent...
US-9,741,514 Switching arrangement
A switching arrangement has a first contact set and a second contact set which can be moved with respect to the first contact set, and an insulating nozzle...
US-9,741,513 Double-contact switch with vacuum switching chambers
A double-contact switch has first and second tubular vacuum switching chambers; a stationary electrode, between the first and second vacuum switching chamber,...
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