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Patent # Description
US-1,009,5142 Brilliant toner, electrostatic charge image developer, and toner cartridge
A brilliant toner includes toner particles that contain a binder resin and a brilliant pigment which has a flake shape, wherein an average thickness of the...
US-1,009,5141 Toner containing particles having flaky shape and made of bright pigment material
A toner includes toner particles including particles having a flaky shape and made of bright pigment material and a binder resin coated on the surfaces of the...
US-1,009,5140 Styrene/acrylate and polyester resin particles
The present disclosure describes poly(styrene/acrylate)-polyester hybrid particles, wherein poly(styrene/acrylate) polymers are polymerized and entangled within...
US-1,009,5139 Electrostatic charge image developing toner, electrostatic charge image developer, and toner cartridge
An electrostatic charge image developing toner includes a toner particle, a polishing agent particle, and a fatty acid metal salt particle, wherein a rate of...
US-1,009,5138 Electrophotographic photoreceptor, process cartridge, and image forming apparatus
An electrophotographic photoreceptor includes a conductive substrate and a photosensitive layer disposed on the conductive substrate, wherein when time that...
US-1,009,5137 Electrophotographic photosensitive member, method of producing electrophotographic photosensitive member,...
Provided is an electrophotographic photosensitive member that can suppress a ghost image while keeping its sensitivity satisfactory. The electrophotographic...
US-1,009,5136 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus
An electrophotographic photosensitive member includes a support member, an undercoat layer, and a photosensitive layer adjacent to the undercoat layer in this...
US-1,009,5135 Phthalocyanine crystal, and electrophotographic photoreceptor, electrophotographic photoreceptor cartridge and...
Provided is an excellent phthalocyanine crystal having high sensitivity and little fluctuation in sensitivity for a humidity change in a use environment and...
US-1,009,5134 Image forming apparatus and image forming method
An image forming apparatus includes an electrophotographic photoreceptor which includes an electroconductive substrate, an undercoat layer which is provided on...
US-1,009,5133 Electrophotographic photoreceptor, process cartridge, and image forming apparatus
An electrophotographic photoreceptor includes a conductive support in which (i) a recessed portion having an opening diameter of greater than 400 .mu.m and (ii)...
US-1,009,5132 Mask transmission device and transmission method
A reticle transfer apparatus includes a reticle, a reticle stage (4) and a robot (2). The robot (2) is configured to support, transport and transfer the reticle...
US-1,009,5131 Alignment modeling and a lithographic apparatus and exposure method using the same
A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model,...
US-1,009,5130 Lithographic apparatus and method in a lithographic process
An apparatus has a first component with a first surface and a second component with a second surface, wherein the first and second components can undergo...
US-1,009,5129 Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus
A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure...
US-1,009,5128 Thermal conditioning method
A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the...
US-1,009,5127 Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and...
A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space on an object disposed opposite to an emitting...
US-1,009,5126 Moveably mounted component of projection exposure system, as well as device and method for movement limitation...
The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement...
US-1,009,5125 Measurement apparatus, lithography apparatus, and method of manufacturing article
The present invention provides a measurement apparatus for measuring a position of an object, comprising a reflecting portion provided on the object and having...
US-1,009,5124 Detection apparatus, lithography apparatus, method of manufacturing article, and detection method
The present invention provides a detection apparatus which detects a position of a mark on a substrate, the apparatus comprising an image capturing unit having...
US-1,009,5123 Control system, positioning system, lithographic apparatus, control method, device manufacturing method and...
A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A...
US-1,009,5122 Systems and methods for fabricating metrology targets with sub-resolution features
A lithography system includes an illumination source, a pattern mask, and an optical element configured to expose a sample with an image of the pattern mask for...
US-1,009,5121 Optimizing the utilization of metrology tools
Methods and corresponding metrology modules and systems, which measure metrology parameter(s) of a previous layer of a metrology target and/or an alignment...
US-1,009,5120 Vibration-compensated optical system, lithography apparatus and method
A vibration-compensated optical system for a lithography apparatus includes an optical element, a carrying element, an actuator for actuating the optical...
US-1,009,5119 Radiation source and method for lithography
A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an...
US-1,009,5118 Lithography optics adjustment and monitoring
Methods and apparatus for in situ compensation for damage or misalignment of optical elements are disclosed. Also disclosed are methods and apparatus for...
US-1,009,5117 Imprint apparatus
An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a...
US-1,009,5116 Lithography system and lithography method for improving image contrast
Systems and methods are disclosed herein for enhancing lithography printability, and in particular, for enhancing image contrast. An exemplary method includes...
US-1,009,5115 Forming edge etch protection using dual layer of positive-negative tone resists
Methods of forming edge etch protection using dual layers of positive-negative tone resists. According to a method, a wafer substrate is provided. A first type...
US-1,009,5114 Process chamber for field guided exposure and method for implementing the process chamber
A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography...
US-1,009,5113 Photoresist and method
Shrinkage and mass losses are reduced in photoresist exposure and post exposure baking by utilizing a small group which will decompose. Alternatively a bulky...
US-1,009,5112 Multiple trigger photoresist compositions and methods
The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile...
US-1,009,5111 Pattern forming method, method for manufacturing electronic device, and electronic device
There is provided a pattern forming method including (1) a step of forming a film with an active-light-sensitive or radiation-sensitive resin composition...
US-1,009,5110 Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern
The present invention provides a photosensitive resin composition including: an alkali-soluble resin (A) having more than 30% by mass and less than 70% by mass...
US-1,009,5109 Acid-cleavable monomer and polymers including the same
A monomer having formula (I): ##STR00001## wherein in formula (I), groups and variables are the same as described in the specification.
US-1,009,5108 Photosensitive composition and pattern formation method
According to one embodiment, a photosensitive composition includes a great number of photosensitive core-shell type nano-particles each including a core and a...
US-1,009,5107 Composition and fabricating method thereof, and infrared ray sensor
A composition, a method fabricating the infrared ray transmitting filter, and an infrared ray sensor are provided. When the composition forms a film with a...
US-1,009,5106 Removing substrate pretreatment compositions in nanoimprint lithography
A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a...
US-1,009,5105 Method for manufacturing master, transfer copy, and replica master
There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer...
US-1,009,5104 Spacer and manufacturing device for the same
A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting...
US-1,009,5103 Photomask and method of forming fine pattern using the same
A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the...
US-1,009,5102 Photomask having a plurality of shielding layers
In some embodiments, a patterned photomask has a plurality of shielding layers. In some embodiments, a photomask for mask patterning is described. The photomask...
US-1,009,5101 Critical dimension variation correction in extreme ultraviolet lithography
A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure...
US-1,009,5100 Panoramic viewing system and method thereof
The present invention provides a panoramic viewing system, which includes a panoramic reflection mirror, formed in an elliptical conical status, and the conical...
US-1,009,5099 Multilayered screens for scanning beam display systems
A display screen includes a filter layer, a fluorescent layer having parallel fluorescent stripes, and an attachment layer between an excitation side of the...
US-1,009,5098 Board for projector
A board 2 for a projector includes a movable arm 5 for moving a projector 1 to a use position in front of a projection board 3 and to a storage position above...
US-1,009,5097 Projection-type optical module
A projection-type optical module is provided. More particularly, the projection-type optical module is configured to have a plurality of reflective mirrors and...
US-1,009,5096 Projector, light source controller, and light source control method
A projector, a light source controller, and a light source control method are provided. The projector includes a light source, a wavelength conversion device,...
US-1,009,5095 Light source system employing two light emitting devices and related projection system employing two spatial...
A light source system comprises: a light-emitting device for emitting a first light and a second light in sequence; a beam splitting system with which the first...
US-1,009,5094 Solid-state light source device
A solid-state light source device 1 includes a plurality of light source cells 10, a light combining device 20 combining light emitted from the plurality of...
US-1,009,5093 Projection display device and electrooptical device
An electrooptical device of a projection display device includes a first driving element and a second driving element. The first driving element switches a...
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