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Patent # Description
US-1,027,6386 Signal relay board for power semiconductor modules
Signal relay board for power semiconductor modules enabling electrical connection between power semiconductor modules and a drive unit driving same. A first...
US-1,027,6385 Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light
First irradiation which causes an emission output from a flash lamp to reach its maximum value over a time period in the range of 1 to 20 milliseconds is...
US-1,027,6384 Plasma shallow doping and wet removal of depth control cap
A gas is ionized into a plasma. A compound of a dopant is mixed into the plasma, forming a mixed plasma. Using a semiconductor device fabrication system, a...
US-1,027,6383 Apparatus for processing a substrate and display device by using the same
Disclosed herein is an apparatus for processing a substrate that forms a hole in a substrate while reducing a burr in the hole so that a module device can be...
US-1,027,6382 Semiconductor device packages and stacked package assemblies including high density interconnections
A semiconductor device package includes an electronic device and a redistribution stack. The redistribution stack includes a dielectric layer disposed over an...
US-1,027,6381 Semiconductor methods and devices
In some embodiments, a method of a semiconductor process includes conformally forming a spacer layer over a plurality of mandrels that are disposed over a mask...
US-1,027,6380 Method of semiconductor device fabrication
A method of fabricating a semiconductor device is disclosed. The method includes forming a dielectric layer over a substrate, forming a hard mask (HM) layer...
US-1,027,6379 Treatment approach to improve film roughness by improving nucleation/adhesion of silicon oxide
In one implementation, a method of forming an amorphous silicon layer on a substrate in a processing chamber is provided. The method comprises depositing a...
US-1,027,6378 Method of forming funnel-like opening for semiconductor device structure
A method of forming a semiconductor device structure is provided. The method includes successively forming first and second hard mask layers over a trench...
US-1,027,6377 Method for patterning interconnects
Various patterning methods involved with manufacturing semiconductor devices are disclosed herein. A method for fabricating a semiconductor structure (for...
US-1,027,6376 Multi-patterning method and device formed by the method
A multi-patterning method includes: patterning at least two first openings in a hard mask layer over a substrate using a first mask; forming spacers within two...
US-1,027,6375 Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing
A method includes receiving an integrated circuit (IC) layout having a pattern layer. The pattern layer includes a main layout pattern. A dimension W1 of the...
US-1,027,6374 Methods for forming fins
The disclosure is directed to methods for forming a set of fins from a substrate. One embodiment of the disclosure includes: providing a stack over the...
US-1,027,6372 Method for integrated circuit patterning
A method includes patterning a resist layer formed over a substrate, resulting in a resist pattern; and transferring the resist pattern to an anti-reflection...
US-1,027,6371 Managed substrate effects for stabilized SOI FETs
Modified silicon-on-insulator (SOI) substrates having a trap rich layer, and methods for making such modifications. The modified regions eliminate or manage...
US-1,027,6370 Methods for the continuous, large-scale manufacture of functional nanostructures
A method for forming nanostructures including introducing a hollow shell into a reactor. The hollow shell has catalyst nanoparticles exposed on its interior...
US-1,027,6369 Material deposition for high aspect ratio structures
Ion species are supplied to a workpiece comprising a pattern layer over a substrate. A material layer is deposited on the pattern layer using an implantation...
US-1,027,6368 Method for producing glass substrate with through glass vias and glass substrate
A method for producing a glass substrate with through glass vias according to the present invention includes: irradiating a glass substrate (10) with a laser...
US-1,027,6367 Method for improving wafer surface uniformity
A method for improving wafer surface uniformity is disclosed. A wafer including a first region and a second region is provided. The first region and the second...
US-1,027,6366 Low interface state device and method for manufacturing the same
A method for manufacturing a low interface state device includes performing a remote plasma surface process on a III-Nitride layer on a substrate; transferring...
US-1,027,6365 Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing...
A substrate cleaning device includes a rotation holder and a cleaner. The rotation holder includes a rotator provided to be rotatable about a rotation axis, and...
US-1,027,6364 Bevel etch profile control
Implementations described herein generally relate to methods and apparatus for processing a substrate. More particularly, implementations described herein...
US-1,027,6363 Mechanisms for forming patterns using multiple lithography processes
The present disclosure provides a method for forming patterns in a semiconductor device. The method includes providing a substrate and a patterning-target layer...
US-1,027,6362 Method for processing a semiconductor region and an electronic device
According to various embodiments, a method for processing a semiconductor region, wherein the semiconductor region comprises at least one precipitate, may...
US-1,027,6361 Multi-reflection mass spectrometer
A multi-reflection mass spectrometer is provided comprising two ion-optical mirrors, each mirror elongated generally along a drift direction (Y), each mirror...
US-1,027,6360 Miniature time-of-flight mass spectrometer
A miniature time-of-flight mass spectrometer (TOF-MS) was developed for a NASA/ASTID program beginning 2008. The primary targeted application for this...
US-1,027,6359 Ion mobility spectrometer
The present disclosure provides an ion mobility spectrometer, which comprises: a power supply circuit, configured to provide a power supply voltage; a corona...
US-1,027,6358 Chemically modified ion mobility separation apparatus and method
An ion mobility spectrometry apparatus and method wherein ions are selected using an AC gate, then separated along a drift axis while providing a drift gas flow...
US-1,027,6357 Methods of ultraviolet photodissociation for mass spectrometry
A method is described that involves simplification of UVPD mass spectra and comprises selecting precursor ions for UVPD fragmentation, performing UVPD...
US-1,027,6356 Copper alloy sputtering target
A copper alloy sputtering target having a composition comprising 1.0 to 5.0 at % of Mn, 0.1 to 4.0 at % of Al, and remainder being Cu and unavoidable...
US-1,027,6355 Multi-zone reactor, system including the reactor, and method of using the same
Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include...
US-1,027,6354 Segmented focus ring assembly
Embodiments of the present invention include a focus ring segment and a focus ring assembly. In one embodiment, the focus ring segment includes an arc-shaped...
US-1,027,6353 Dual-channel showerhead for formation of film stacks
A method and apparatus for a dual-channel showerhead is provided. In one embodiment the showerhead comprises a body comprising a conductive material having a...
US-1,027,6352 Pair of electrodes for DBD plasma process
The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold...
US-1,027,6351 High-frequency power generator with enhanced pulse function
Provided is a high-frequency power generator with an enhanced pulse function, which supplies high-frequency power to a plasma load. The high-frequency power...
US-1,027,6350 Systems and methods for using computer-generated models to reduce reflected power towards an RF generator...
Systems and methods for tuning an impedance matching network in a step-wise fashion for each state transition are described. By tuning the impedance matching...
US-1,027,6349 Plasma processing device
A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma...
US-1,027,6348 Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system
A capacitively-coupled plasma (CCP) processing system having a plasma processing chamber for processing a substrate is provided. The capacitively-coupled Plasma...
US-1,027,6347 Apparatus of plural charged-particle beams
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single...
US-1,027,6346 Particle beam inspector with independently-controllable beams
A multi-beam inspection system includes one or more particle beam sources to generate two or more particle beams, a set of particle control elements configured...
US-1,027,6345 Tunable ampere phase plate for charged particle imaging systems
A phase shifting device for a charged particle imaging system includes means for passing an electric current in a direction that has a nonzero component...
US-1,027,6344 Power supply apparatus able to control output current and power supply method using the same
A power supply apparatus able to control an output current for maintaining plasma in a plasma generator includes: a switching power supply including a...
US-1,027,6343 Method for acquiring image and ion beam apparatus
A method of acquiring an image of an image acquiring region of a sample comprises a first step of irradiating and scanning an ion beam in a first scan pattern...
US-1,027,6342 Electron microscope
An electron microscope includes a monochromator, an image acquiring portion for obtaining an electron microscope image containing interference fringes of the...
US-1,027,6341 Control method and control program for focused ion beam device
The present invention is directed to a technique for correcting processing positional deviation and processing size deviation during processing by a focused ion...
US-1,027,6340 Low particle capacitively coupled components for workpiece processing
A system for implanting ions into a workpiece while minimizing the generation of particles is disclosed. The system includes an ion source having an extraction...
US-1,027,6339 Electron gun, electron tube and high-frequency circuit system
The purpose is to make it possible to autonomously suppress a reduction in an electron beam without providing a means for supervising the electron beam...
US-1,027,6338 Hollow fuse body with trench
Provided herein are protection devices, such as fuses, including a set of trenches or pockets for retention of solder therein. In some embodiments, a fuse...
US-1,027,6337 Fuses with integrated metals
Fuse assemblies are disclosed. In one implementation, a fuse assembly may be disposed that includes a first portion of the second portion. The first portion may...
US-1,027,6336 Circuit breaker assembly including a circuit breaker connector
A circuit breaker assembly includes a circuit breaker cassette having a connector receiving zone, and a housing receptive of the circuit breaker cassette. The...
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