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Patent # Description
US-1,027,4858 Image forming apparatus
An image forming apparatus includes a scanner unit configured to emit light depending on image information, the scanner unit including an optical element and an...
US-1,027,4857 Image reading apparatus and image forming apparatus
An image reading apparatus includes a sheet conveyance unit conveying a sheet through a sheet conveyance path, a cover member supported by the sheet conveyance...
US-1,027,4856 Toner for electrophotography, image forming method, and process cartridge
A toner for electrophotography, which contains a binder resin, and a release agent, wherein a maximum value of loss tangent of the toner at 95.degree. C. to...
US-1,027,4855 Ink composition with UV-curable polymeric resin
Provided in one example herein is a liquid electrophotographic ink composition. The composition comprises a charge director; a non-polar carrier fluid...
US-1,027,4854 Toner for developing electrostatic charge image and method for preparing the same
A toner for developing an electrostatic charge image, the toner including: elemental iron, wherein a content of the elemental iron is in a range of...
US-1,027,4853 Toner, developer, toner housing unit and image forming apparatus
A toner includes a binder resin; a release agent; and two or more inorganic fine particles as external additives. At least one of the inorganic fine particles...
US-1,027,4852 Coating compositions for forming toner coatings
The present invention provides coating compositions for forming a toner coating on a substrate containing a polymer comprising: (a) a N-vinyl amide monomer, (b)...
US-1,027,4851 Toner
A toner is provided, which contains a toner particle and a metal titanate particle, wherein, in a number-based particle size distribution of the metal titanate...
US-1,027,4850 Imprint apparatus and method of manufacturing article
An imprint apparatus which includes a plurality of stations in which an imprint material supplied to an imprint region on a substrate is formed using a mold and...
US-1,027,4849 Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method
A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first...
US-1,027,4848 Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method
An amplitude monitoring system, a focusing and leveling apparatus and a defocus detection method. The method includes: adjusting amplitude of a scanning mirror...
US-1,027,4847 Humidity control in EUV lithography
A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light....
US-1,027,4846 Electromagnetic drive comprising a stator and a stator holder
An electromagnetic drive includes a stator, having a stator holder and an actuating element which is movable by electromagnetic interaction with the stator. The...
US-1,027,4845 Optical module with an adjustable optical element
An optical module, in particular for microlithography, includes an optical element and a support unit. The optical element has at least one optically utilized...
US-1,027,4844 Lithography apparatus and method for protecting a reticle
A lithography apparatus is provided. The lithography apparatus includes a reticle stage. The reticle stage includes a main base, an electrostatic chuck and a...
US-1,027,4843 Exposure apparatus, exposure method and storage medium
An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units configured to emit light independently of each...
US-1,027,4842 Electrostatic clamp and a method for manufacturing the same
An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low...
US-1,027,4841 Reticle with reduced transmission regions for detecting a defocus condition in a lithography process
A reticle for a semiconductor lithography process includes a glass plate having regions with a reduced optical transmission factor. The regions may include...
US-1,027,4840 Adaptive groove focusing and leveling device and method
Disclosed is an adaptive groove focusing and leveling device for measuring the height and the inclination of the surface of a measured object (400). The...
US-1,027,4839 Two-dimensional marks
A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a...
US-1,027,4838 System and method for performing lithography process in semiconductor device fabrication
Systems and methods that include providing for measuring a first topographical height of a substrate at a first coordinate on the substrate and measuring a...
US-1,027,4837 Metrology target for combined imaging and scatterometry metrology
Metrology targets, design files, and design and production methods thereof are provided. The targets comprise two or more parallel periodic structures at...
US-1,027,4836 Determination of lithography effective dose uniformity
Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame...
US-1,027,4835 Evaluation method and device, processing method, and exposure system
Using a substrate on which a structure has been formed with a plurality of sets of processing conditions, the present disclosure provides an evaluation device...
US-1,027,4834 Methods and apparatus for obtaining diagnostic information relating to an industrial process
In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing...
US-1,027,4833 Exposing method, exposing system and laser direct imaging system
An exposing method adapted to a maskless photolithography process. The exposing method includes reading an exposure file; obtaining a plurality of coordinate...
US-1,027,4832 Lithographic apparatus and device manufacturing method involving a liquid confinement structure
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially...
US-1,027,4831 Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device...
While a wafer stage moves linearly in a Y-axis direction, surface position information of a wafer surface at a plurality of detection points set at a...
US-1,027,4830 Method and apparatus for dynamic lithographic exposure
The present disclosure relates to a dynamic lithographic exposure method, and an associated apparatus, which exposes a photosensitive material over a plurality...
US-1,027,4829 Multiple patterning decomposition and manufacturing methods for IC
A multiple patterning decomposition method for IC is provided. Features of layout of IC are decomposed into a plurality of nodes. The nodes are classified to...
US-1,027,4828 Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
A microlithography illumination system includes a first light source configured to generate pulses of light, a second light source configured to generate...
US-1,027,4827 Substrate treating apparatus and substrate treating method
A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus comprises: a process chamber; a support member...
US-1,027,4826 Method for imparting water repellency to surface of member
A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is...
US-1,027,4825 Acid generator compounds and photoresists comprising same
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and...
US-1,027,4824 Photobase generators and photoresist compositions comprising same
New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X.sub.1--R.sub.1--O--C(.dbd.O)N(R.sub.2)R.sub.3 (I)...
US-1,027,4823 Microlithographic fabrication of structures
Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures,...
US-1,027,4822 Template and method of manufacturing semiconductor device
A template for patterning processes has a first protrusion portion on a first surface with a first step portion in a first region and a second step portion in a...
US-1,027,4821 Mask and manufacturing method of mask
A mask includes a plurality of line patterns provided on a substrate, the plurality of line patterns each including a line comprising a plurality of first...
US-1,027,4820 Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same
A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The...
US-1,027,4819 EUV pellicle fabrication methods and structures thereof
A method for fabricating a pellicle for EUV lithography processes includes placing a hard mask in contact with a surface of a substrate. In some embodiments,...
US-1,027,4818 Lithography patterning with sub-resolution assistant patterns and off-axis illumination
A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system...
US-1,027,4817 Mask and photolithography system
A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are...
US-1,027,4816 Display device, projector, and display control method
A display device includes: a display unit which displays an image; a detection unit which detects positions of first and second pointers on the image; a storage...
US-1,027,4815 Projector
A projector is provided. The projector includes: a fluorescent wheel; at least one first light source that emits light toward the fluorescent wheel; and a fly...
US-1,027,4814 Accessory for portable electric/electronic device
Disclosed is an accessory for a portable electric/electronic device. The accessory includes: a base configured such that the back surface of a portable device...
US-1,027,4813 Displacement detecting apparatus, lens barrel, and image pickup apparatus
A displacement detecting apparatus includes a first electrode having a base electrode segment and a plurality of detecting electrode segments, a second...
US-1,027,4812 Camera module
A durable camera module comprises a lens holder and a lens barrel. An opening is defined in the lens holder. The opening passes through the lens holder along an...
US-1,027,4811 Edge light device for photography system
An edge light device of the present disclosure creates edge light effects, such as spectral highlight or artistic effect, on a subject. The edge light device...
US-1,027,4810 Parametric conversion of chirped femtosecond pump pulses
An apparatus for generating laser pulses by non-linear four-wave mixing, including a pump laser source to emit a pump beam of femtosecond laser pulses at a pump...
US-1,027,4809 Multiwavelength laser source
Techniques are provided for a multiwavelength laser source and a method of driving the multiwavelength laser source. The multiwavelength laser source includes:...
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