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United States Patent D802,545
Tauchi ,   et al. November 14, 2017

Lower chamber for a plasma processing apparatus


CLAIM The ornamental design for a lower chamber for a plasma processing apparatus, as shown and described.
Inventors: Tauchi; Susumu (Tokyo, JP), Uemura; Takashi (Tokyo, JP), Sato; Kohei (Tokyo, JP)
Name City State Country Type

Hitachi High-Technologies Corporation

Minato-ku, Tokyo


Assignee: Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.: D/544,071
Filed: October 30, 2015

Foreign Application Priority Data

Jun 12, 2015 [JP] 2015-013038

Current U.S. Class: D13/182
Current International Class: 1303
Field of Search: ;D13/118,123,154,156,173,177,182,184,199 ;D8/70,90,396 ;D15/126,138,139

References Cited [Referenced By]

U.S. Patent Documents
4319432 March 1982 Day
D404369 January 1999 Kawachi
6068548 May 2000 Vote
6264540 July 2001 Fruitman
D658691 May 2012 Suzuki
D693782 November 2013 Mori
D703160 April 2014 Tanimura
D716240 October 2014 Lau
D722966 February 2015 Smith
D734377 July 2015 Hirakida
D741823 October 2015 Tateno
D770992 November 2016 Tauchi
D775710 January 2017 Kim
2004/0077167 April 2004 Willis
2005/0191947 September 2005 Chen
2007/0224864 September 2007 Burns
2012/0263569 October 2012 Priddy
Primary Examiner: Johannes; Thomas
Assistant Examiner: Gingrich; Shawn T
Attorney, Agent or Firm: Crowell & Moring LLP


FIG. 1 is a front, top and right side perspective view of a lower chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 6; and,

FIG. 10 is a partially enlarged view taken along line 10-10 of FIG. 8.

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