Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Search All Patents:

  This Patent May Be For Sale or Lease. Contact Us

  Is This Your Patent? Claim This Patent Now.

Register or Login To Download This Patent As A PDF

United States Patent D804,436
Tauchi ,   et al. December 5, 2017

Upper chamber for a plasma processing apparatus


CLAIM The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.
Inventors: Tauchi; Susumu (Tokyo, JP), Uemura; Takashi (Tokyo, JP), Sato; Kohei (Tokyo, JP)
Name City State Country Type

Hitachi High-Technologies Corporation

Minato-ku, Tokyo


Assignee: Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.: D/544,068
Filed: October 30, 2015

Foreign Application Priority Data

Jun 12, 2015 [JP] 2015-013035

Current U.S. Class: D13/182; D15/138
Current International Class: 1303
Field of Search: ;D13/158-177,179,180,182,199,122,144 ;D10/104.1,108 ;D11/143,144,152 ;D14/216,240,356,509 ;D17/22 ;D23/323,328,333,335,336,337,341,352,357,370,385,386,399,400,499 ;D12/303,315 ;118/50,722,715,724,733 ;205/118,123 ;D9/500,452,454 ;D15/122,199,138 ;D8/16,19,323,399 ;D16/135,219,302 ;D7/367,404,503,523,584,586,624.1,630,640,677 ;D26/24,36,110

References Cited [Referenced By]

U.S. Patent Documents
4153907 May 1979 Kofron
D274836 July 1984 Smith
5641375 June 1997 Nitescu
D404369 January 1999 Kawachi
D448729 October 2001 Asao
D491963 June 2004 Doba
D716240 October 2014 Lau
2001/0023821 September 2001 Harris
2001/0035131 November 2001 Sakuma
2004/0069223 April 2004 Tzeng
2012/0018402 January 2012 Carducci
2013/0292254 November 2013 Kumar
2014/0097088 April 2014 Stowell
2016/0307743 October 2016 Brown
Primary Examiner: Asch; Jeffrey D
Assistant Examiner: Bell; Tracey J
Attorney, Agent or Firm: Crowell & Moring LLP


FIG. 1 is a front and top perspective view of an upper chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is a partially enlarged view taken along line 9-9 of FIG. 8.

* * * * *

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.